JP4252447B2 - 対物レンズ - Google Patents

対物レンズ Download PDF

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Publication number
JP4252447B2
JP4252447B2 JP2003507611A JP2003507611A JP4252447B2 JP 4252447 B2 JP4252447 B2 JP 4252447B2 JP 2003507611 A JP2003507611 A JP 2003507611A JP 2003507611 A JP2003507611 A JP 2003507611A JP 4252447 B2 JP4252447 B2 JP 4252447B2
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JP
Japan
Prior art keywords
objective lens
optical
optical group
grating
group
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Expired - Fee Related
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JP2003507611A
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English (en)
Japanese (ja)
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JP2004530937A5 (enExample
JP2004530937A (ja
Inventor
ブルンナー、ロベルト
ハーゲ、クヌート
ドブシャル、ハンス−ユルゲン
ルドルフ、クラウス
シュタイナー、ラインハルト
Original Assignee
カール ツァイス イェナ ゲーエムベーハー
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Publication of JP2004530937A5 publication Critical patent/JP2004530937A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2003507611A 2001-06-22 2002-06-19 対物レンズ Expired - Fee Related JP4252447B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10130212A DE10130212A1 (de) 2001-06-22 2001-06-22 Objektiv
PCT/EP2002/006798 WO2003001272A2 (de) 2001-06-22 2002-06-19 Objektiv

Publications (3)

Publication Number Publication Date
JP2004530937A JP2004530937A (ja) 2004-10-07
JP2004530937A5 JP2004530937A5 (enExample) 2008-12-04
JP4252447B2 true JP4252447B2 (ja) 2009-04-08

Family

ID=7689120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003507611A Expired - Fee Related JP4252447B2 (ja) 2001-06-22 2002-06-19 対物レンズ

Country Status (6)

Country Link
US (1) US20040174607A1 (enExample)
EP (1) EP1397716A2 (enExample)
JP (1) JP4252447B2 (enExample)
DE (1) DE10130212A1 (enExample)
TW (1) TWI226938B (enExample)
WO (1) WO2003001272A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021090720A1 (enExample) * 2019-11-06 2021-05-14
JPWO2022153736A1 (enExample) * 2021-01-14 2022-07-21

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10318560A1 (de) 2003-04-24 2004-11-11 Carl Zeiss Sms Gmbh Anordnung zur Inspektion von Objekten, insbesondere von Masken in der Mikrolithographie
DE10319269A1 (de) 2003-04-25 2004-11-25 Carl Zeiss Sms Gmbh Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop
DE102004009212B4 (de) * 2004-02-25 2015-08-20 Carl Zeiss Meditec Ag Kontaktelement für Laserbearbeitung und Laserbearbeitungsvorrichtung
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
DE102005062237A1 (de) * 2005-12-22 2007-07-05 Carl Zeiss Jena Gmbh Verfahren und Vorrichtung zur Untersuchung des Abbildungsverhaltens einer Abbildungsoptik
JP5068271B2 (ja) 2006-02-17 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ照明システム、及びこの種の照明システムを含む投影露光装置
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
DE102007043896A1 (de) 2007-09-14 2009-04-02 Carl Zeiss Smt Ag Mikrooptik zur Messung der Position eines Luftbildes
WO2011158778A1 (ja) * 2010-06-16 2011-12-22 株式会社ニコン 顕微鏡対物レンズ
CN102959451B (zh) * 2010-08-25 2015-06-24 株式会社尼康 显微镜光学系统以及显微镜系统
DE102019124919B4 (de) 2019-09-17 2021-08-26 Ri Research Instruments Gmbh Mikroskopisches System zur Prüfung von Strukturen und Defekten auf EUV-Lithographie-Photomasken

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4032259A1 (de) * 1990-10-11 1992-04-16 Jenoptik Jena Gmbh Mikroskopobjektiv
JPH04361201A (ja) * 1991-06-10 1992-12-14 Olympus Optical Co Ltd フレネルゾーンプレートを用いた光学系
US5349471A (en) * 1993-02-16 1994-09-20 The University Of Rochester Hybrid refractive/diffractive achromatic lens for optical data storage systems
JPH08286113A (ja) * 1995-04-17 1996-11-01 Olympus Optical Co Ltd 対物レンズ
JPH09197283A (ja) * 1996-01-12 1997-07-31 Olympus Optical Co Ltd 対物レンズ
US5995286A (en) * 1997-03-07 1999-11-30 Minolta Co., Ltd. Diffractive optical element, an optical system having a diffractive optical element, and a method for manufacturing a diffractive optical element
JP3746894B2 (ja) * 1998-02-05 2006-02-15 ペンタックス株式会社 色消しレンズ系
JP4097781B2 (ja) * 1998-05-13 2008-06-11 オリンパス株式会社 対物レンズ
JP3950571B2 (ja) * 1999-03-10 2007-08-01 キヤノン株式会社 撮影光学系
JP2001100017A (ja) * 1999-09-29 2001-04-13 Canon Inc 光学素子

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021090720A1 (enExample) * 2019-11-06 2021-05-14
WO2021090720A1 (ja) * 2019-11-06 2021-05-14 ソニー株式会社 光学測定装置及びレンズ構造体
JP7505502B2 (ja) 2019-11-06 2024-06-25 ソニーグループ株式会社 光学測定装置及びレンズ構造体
JPWO2022153736A1 (enExample) * 2021-01-14 2022-07-21
WO2022153736A1 (ja) * 2021-01-14 2022-07-21 ソニーグループ株式会社 粒子分析装置、粒子分析方法及び光学測定装置
US12379304B2 (en) 2021-01-14 2025-08-05 Sony Group Corporation Particle analyzer, particle analysis method, and optical measurement device

Also Published As

Publication number Publication date
EP1397716A2 (de) 2004-03-17
WO2003001272A2 (de) 2003-01-03
JP2004530937A (ja) 2004-10-07
DE10130212A1 (de) 2003-01-02
WO2003001272A3 (de) 2003-11-20
US20040174607A1 (en) 2004-09-09
TWI226938B (en) 2005-01-21

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