JP4244410B2 - エタロンフィルタおよびその製造方法 - Google Patents

エタロンフィルタおよびその製造方法 Download PDF

Info

Publication number
JP4244410B2
JP4244410B2 JP25226998A JP25226998A JP4244410B2 JP 4244410 B2 JP4244410 B2 JP 4244410B2 JP 25226998 A JP25226998 A JP 25226998A JP 25226998 A JP25226998 A JP 25226998A JP 4244410 B2 JP4244410 B2 JP 4244410B2
Authority
JP
Japan
Prior art keywords
substrate
etalon filter
manufacturing
etching
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP25226998A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000081512A (ja
JP2000081512A5 (enExample
Inventor
和之 中仙道
哲 門馬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Miyazaki Epson Corp
Original Assignee
Epson Toyocom Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Epson Toyocom Corp filed Critical Epson Toyocom Corp
Priority to JP25226998A priority Critical patent/JP4244410B2/ja
Publication of JP2000081512A publication Critical patent/JP2000081512A/ja
Publication of JP2000081512A5 publication Critical patent/JP2000081512A5/ja
Application granted granted Critical
Publication of JP4244410B2 publication Critical patent/JP4244410B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Optical Filters (AREA)
JP25226998A 1998-09-07 1998-09-07 エタロンフィルタおよびその製造方法 Expired - Fee Related JP4244410B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25226998A JP4244410B2 (ja) 1998-09-07 1998-09-07 エタロンフィルタおよびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25226998A JP4244410B2 (ja) 1998-09-07 1998-09-07 エタロンフィルタおよびその製造方法

Publications (3)

Publication Number Publication Date
JP2000081512A JP2000081512A (ja) 2000-03-21
JP2000081512A5 JP2000081512A5 (enExample) 2007-11-15
JP4244410B2 true JP4244410B2 (ja) 2009-03-25

Family

ID=17234897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25226998A Expired - Fee Related JP4244410B2 (ja) 1998-09-07 1998-09-07 エタロンフィルタおよびその製造方法

Country Status (1)

Country Link
JP (1) JP4244410B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103857994A (zh) * 2011-10-04 2014-06-11 浜松光子学株式会社 分光传感器的制造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006032047A1 (de) * 2006-07-10 2008-01-24 Schott Ag Verfahren zur Herstellung optoelektronischer Bauelemente und damit hergestellte Erzeugnisse
JP5707107B2 (ja) 2010-11-22 2015-04-22 浜松ホトニクス株式会社 分光センサ
JP5634836B2 (ja) * 2010-11-22 2014-12-03 浜松ホトニクス株式会社 分光センサの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103857994A (zh) * 2011-10-04 2014-06-11 浜松光子学株式会社 分光传感器的制造方法
CN103857994B (zh) * 2011-10-04 2016-01-20 浜松光子学株式会社 分光传感器的制造方法

Also Published As

Publication number Publication date
JP2000081512A (ja) 2000-03-21

Similar Documents

Publication Publication Date Title
JP4244410B2 (ja) エタロンフィルタおよびその製造方法
JPH1186251A (ja) 磁気ヘッドの製造方法
US6865308B1 (en) Backside deposition for relieving stress and decreasing warping in optical waveguide production
JP2011523596A (ja) マイクロスケール光学構造を作製する方法
CN118131381A (zh) 基于Fabry-Perot谐振腔的高光谱滤光片阵列及其制作方法
CN106568540B (zh) 斜抛光纤压力传感器及其制备方法
JPH0243380A (ja) 光ディスク基板成形用金型及びその製造方法
JP2003195031A (ja) エアギャップ型エタロンフィルタとその製造方法
US6972049B2 (en) Method for fabricating a diamond film having low surface roughness
CN109177644A (zh) 壳体制备方法及壳体
JP4532324B2 (ja) 被加工物の製造方法
JP2009010071A (ja) ウエハの研磨方法
JP3058514B2 (ja) 金属箔を加工した探針部品の製造方法
JP4639514B2 (ja) 光学素子の製造方法
JPH11352350A (ja) 光導波路素子の製造方法
JP2000081512A5 (enExample)
JPH09117859A (ja) 被研磨基板の研磨方法
JP4375921B2 (ja) 減衰量可変光ファイバグレーティングフィルタ
CN116657083A (zh) 一种镀膜厚度直接式光学监控测量方法
JP4133410B2 (ja) 光ファイバアレイの製造方法
CN118954975A (zh) 高精度波片组件加工工艺
JPH10170742A (ja) 光導波路素子及びその製造方法
JPH10319264A (ja) 光導波路素子の製造方法
CN120386146A (zh) 一种反射式金属码盘的制作方法
CN116540345A (zh) 一种宽光谱半透过半反射的标准具、制备方法及其应用

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050905

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070928

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20070928

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080911

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080924

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081119

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20081119

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20081216

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20081229

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120116

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120116

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120116

Year of fee payment: 3

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120116

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120116

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120116

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130116

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130116

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140116

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees