JP4222086B2 - 熱処理装置 - Google Patents
熱処理装置 Download PDFInfo
- Publication number
- JP4222086B2 JP4222086B2 JP2003103458A JP2003103458A JP4222086B2 JP 4222086 B2 JP4222086 B2 JP 4222086B2 JP 2003103458 A JP2003103458 A JP 2003103458A JP 2003103458 A JP2003103458 A JP 2003103458A JP 4222086 B2 JP4222086 B2 JP 4222086B2
- Authority
- JP
- Japan
- Prior art keywords
- cover member
- mounting table
- heat treatment
- opaque
- treatment apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Chemical Vapour Deposition (AREA)
- Furnace Charging Or Discharging (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003103458A JP4222086B2 (ja) | 2003-04-07 | 2003-04-07 | 熱処理装置 |
CNB2004800092949A CN100477087C (zh) | 2003-04-07 | 2004-04-07 | 放置台结构以及具有该放置台结构的热处理装置 |
PCT/JP2004/005036 WO2004090960A1 (ja) | 2003-04-07 | 2004-04-07 | 載置台構造及びこの載置台構造を有する熱処理装置 |
EP04726281A EP1612854A4 (en) | 2003-04-07 | 2004-04-07 | LOADING TABLE AND HEAT TREATMENT DEVICE WITH LOADING TABLE |
US10/552,267 US7718930B2 (en) | 2003-04-07 | 2004-04-07 | Loading table and heat treating apparatus having the loading table |
KR1020057019032A KR100744860B1 (ko) | 2003-04-07 | 2004-04-07 | 탑재대 구조체 및 이 탑재대 구조체를 갖는 열처리 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003103458A JP4222086B2 (ja) | 2003-04-07 | 2003-04-07 | 熱処理装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004307939A JP2004307939A (ja) | 2004-11-04 |
JP2004307939A5 JP2004307939A5 (zh) | 2005-10-13 |
JP4222086B2 true JP4222086B2 (ja) | 2009-02-12 |
Family
ID=33466553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003103458A Expired - Fee Related JP4222086B2 (ja) | 2003-04-07 | 2003-04-07 | 熱処理装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4222086B2 (zh) |
CN (1) | CN100477087C (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110266274A1 (en) * | 2006-11-27 | 2011-11-03 | Toshiki Ebata | Quartz encapsulated heater assembly |
JP5029435B2 (ja) * | 2008-03-11 | 2012-09-19 | 東京エレクトロン株式会社 | 載置台構造及び熱処理装置 |
JP4450106B1 (ja) * | 2008-03-11 | 2010-04-14 | 東京エレクトロン株式会社 | 載置台構造及び処理装置 |
JP2009242835A (ja) * | 2008-03-28 | 2009-10-22 | Tokyo Electron Ltd | 成膜方法及び成膜装置 |
JP5439771B2 (ja) | 2008-09-05 | 2014-03-12 | 東京エレクトロン株式会社 | 成膜装置 |
KR101122719B1 (ko) | 2009-05-27 | 2012-03-23 | (주)티티에스 | 기판 가열 장치 및 이의 제조 방법 그리고, 이를 포함하는 기판 처리 장치 |
JP2011054838A (ja) * | 2009-09-03 | 2011-03-17 | Tokyo Electron Ltd | 載置台構造及び処理装置 |
JP2011061040A (ja) * | 2009-09-10 | 2011-03-24 | Tokyo Electron Ltd | 載置台構造及び処理装置 |
JP2012028428A (ja) * | 2010-07-21 | 2012-02-09 | Tokyo Electron Ltd | 載置台構造及び処理装置 |
US9719169B2 (en) * | 2010-12-20 | 2017-08-01 | Novellus Systems, Inc. | System and apparatus for flowable deposition in semiconductor fabrication |
JP5942380B2 (ja) * | 2011-10-20 | 2016-06-29 | 住友電気工業株式会社 | 半導体製造装置用ウエハ保持体 |
CN104600000A (zh) * | 2013-10-30 | 2015-05-06 | 沈阳芯源微电子设备有限公司 | 一种基板周边吸附烘烤结构 |
JP6396818B2 (ja) * | 2015-01-29 | 2018-09-26 | 京セラ株式会社 | 試料保持具 |
CN104911544B (zh) * | 2015-06-25 | 2017-08-11 | 沈阳拓荆科技有限公司 | 控温盘 |
US10388546B2 (en) | 2015-11-16 | 2019-08-20 | Lam Research Corporation | Apparatus for UV flowable dielectric |
WO2018100903A1 (ja) | 2016-11-29 | 2018-06-07 | 住友電気工業株式会社 | ウエハ保持体 |
US20230130756A1 (en) * | 2021-10-22 | 2023-04-27 | Applied Materials, Inc. | Bottom cover plate to reduce wafer planar nonuniformity |
-
2003
- 2003-04-07 JP JP2003103458A patent/JP4222086B2/ja not_active Expired - Fee Related
-
2004
- 2004-04-07 CN CNB2004800092949A patent/CN100477087C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1833312A (zh) | 2006-09-13 |
JP2004307939A (ja) | 2004-11-04 |
CN100477087C (zh) | 2009-04-08 |
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