JP4213907B2 - リソグラフィーシステムのフォーカス精度を向上させるための方法およびシステム - Google Patents

リソグラフィーシステムのフォーカス精度を向上させるための方法およびシステム Download PDF

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Publication number
JP4213907B2
JP4213907B2 JP2002125047A JP2002125047A JP4213907B2 JP 4213907 B2 JP4213907 B2 JP 4213907B2 JP 2002125047 A JP2002125047 A JP 2002125047A JP 2002125047 A JP2002125047 A JP 2002125047A JP 4213907 B2 JP4213907 B2 JP 4213907B2
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Japan
Prior art keywords
control sensor
sensor
area
specific area
focus
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Expired - Fee Related
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JP2002125047A
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English (en)
Japanese (ja)
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JP2003031493A5 (enExample
JP2003031493A (ja
Inventor
エル． ネルソン マイケル
エル． クレウザー ジャスティン
エル． フィロシ ピーター
ジェイ． メイソン クリストファー
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ASML Holding NV
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ASML Holding NV
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • D—TEXTILES; PAPER
    • D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
    • D21H—PULP COMPOSITIONS; PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D; IMPREGNATING OR COATING OF PAPER; TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G; PAPER NOT OTHERWISE PROVIDED FOR
    • D21H23/00—Processes or apparatus for adding material to the pulp or to the paper
    • D21H23/02—Processes or apparatus for adding material to the pulp or to the paper characterised by the manner in which substances are added
    • D21H23/22—Addition to the formed paper
    • D21H23/32—Addition to the formed paper by contacting paper with an excess of material, e.g. from a reservoir or in a manner necessitating removal of applied excess material from the paper
    • D21H23/34—Knife or blade type coaters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N21/00—Selective content distribution, e.g. interactive television or video on demand [VOD]
    • H04N21/40—Client devices specifically adapted for the reception of or interaction with content, e.g. set-top-box [STB]; Operations thereof
    • H04N21/41—Structure of client; Structure of client peripherals
    • H04N21/414—Specialised client platforms, e.g. receiver in car or embedded in a mobile appliance
    • H04N21/41415—Specialised client platforms, e.g. receiver in car or embedded in a mobile appliance involving a public display, viewable by several users in a public space outside their home, e.g. movie theatre, information kiosk

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
JP2002125047A 2001-04-25 2002-04-25 リソグラフィーシステムのフォーカス精度を向上させるための方法およびシステム Expired - Fee Related JP4213907B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/841,187 US6859260B2 (en) 2001-04-25 2001-04-25 Method and system for improving focus accuracy in a lithography system
US09/841,187 2001-04-25

Publications (3)

Publication Number Publication Date
JP2003031493A JP2003031493A (ja) 2003-01-31
JP2003031493A5 JP2003031493A5 (enExample) 2005-09-29
JP4213907B2 true JP4213907B2 (ja) 2009-01-28

Family

ID=25284253

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002125047A Expired - Fee Related JP4213907B2 (ja) 2001-04-25 2002-04-25 リソグラフィーシステムのフォーカス精度を向上させるための方法およびシステム

Country Status (5)

Country Link
US (3) US6859260B2 (enExample)
EP (1) EP1253471A3 (enExample)
JP (1) JP4213907B2 (enExample)
KR (1) KR100719975B1 (enExample)
TW (1) TW541593B (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6859260B2 (en) * 2001-04-25 2005-02-22 Asml Holding N.V. Method and system for improving focus accuracy in a lithography system
JP2003031474A (ja) * 2001-07-16 2003-01-31 Oki Electric Ind Co Ltd 露光装置および露光方法
US7289230B2 (en) 2002-02-06 2007-10-30 Cyberoptics Semiconductors, Inc. Wireless substrate-like sensor
AU2003266613A1 (en) * 2002-10-10 2004-05-04 Sony Corporation Method of producing optical disk-use original and method of producing optical disk
US6781103B1 (en) * 2003-04-02 2004-08-24 Candela Instruments Method of automatically focusing an optical beam on transparent or reflective thin film wafers or disks
US7068349B2 (en) * 2003-04-24 2006-06-27 Asml Netherlands B.V. Method of and preventing focal plane anomalies in the focal plane of a projection system
US20050134816A1 (en) * 2003-12-22 2005-06-23 Asml Netherlands B.V. Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby
US7126668B2 (en) * 2004-04-28 2006-10-24 Litel Instruments Apparatus and process for determination of dynamic scan field curvature
US7265364B2 (en) * 2004-06-10 2007-09-04 Asml Netherlands B.V. Level sensor for lithographic apparatus
US7835017B2 (en) * 2004-12-22 2010-11-16 Asml Netherlands B.V. Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby
US7504833B1 (en) * 2005-04-01 2009-03-17 Cypress Semiconductor Corporation Automatically balanced sensing device and method for multiple capacitive sensors
US7369214B2 (en) * 2005-08-11 2008-05-06 Asml Holding N.V. Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors
US7502096B2 (en) * 2006-02-07 2009-03-10 Asml Netherlands B.V. Lithographic apparatus, calibration method, device manufacturing method and computer program product
US7893697B2 (en) 2006-02-21 2011-02-22 Cyberoptics Semiconductor, Inc. Capacitive distance sensing in semiconductor processing tools
CN101410690B (zh) * 2006-02-21 2011-11-23 赛博光学半导体公司 半导体加工工具中的电容性距离感测
JP5092298B2 (ja) * 2006-07-21 2012-12-05 富士通セミコンダクター株式会社 フォトマスク、焦点計測装置及び方法
KR101388304B1 (ko) 2006-09-29 2014-04-22 싸이버옵틱스 쎄미콘덕터 인코퍼레이티드 기판형 입자 센서
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
JPWO2009028157A1 (ja) * 2007-08-24 2010-11-25 株式会社ニコン 移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置
US7940374B2 (en) * 2008-06-30 2011-05-10 Asml Holding N.V. Parallel process focus compensation
US20110261344A1 (en) * 2009-12-31 2011-10-27 Mapper Lithography Ip B.V. Exposure method
US10274838B2 (en) 2013-03-14 2019-04-30 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for performing lithography process in semiconductor device fabrication
US10576603B2 (en) 2014-04-22 2020-03-03 Kla-Tencor Corporation Patterned wafer geometry measurements for semiconductor process controls
WO2015199801A1 (en) * 2014-06-24 2015-12-30 Kla-Tencor Corporation Patterned wafer geometry measurements for semiconductor process controls
JP2018138990A (ja) 2016-12-08 2018-09-06 ウルトラテック インク 再構成ウェハーのリソグラフィ処理のための焦点制御のための走査方法
CN111183501B (zh) 2017-10-04 2022-11-25 Asml荷兰有限公司 干涉测量台定位装置
KR102693518B1 (ko) 2018-09-06 2024-08-08 삼성전자주식회사 Opc 방법, 및 그 opc 방법을 이용한 마스크 제조방법
TW202211074A (zh) * 2020-04-24 2022-03-16 美商科文特股份有限公司 用於在虛擬工廠環境中執行局部cdu建模和控制的系統及方法
KR102526522B1 (ko) * 2022-11-02 2023-04-27 (주)오로스테크놀로지 포커스를 제어하는 오버레이 계측 장치 및 방법과 이를 위한 프로그램

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61196532A (ja) * 1985-02-26 1986-08-30 Canon Inc 露光装置
US5883703A (en) 1996-02-08 1999-03-16 Megapanel Corporation Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
AU5067898A (en) * 1996-11-28 1998-06-22 Nikon Corporation Aligner and method for exposure
US6208407B1 (en) * 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
EP1037117A3 (en) * 1999-03-08 2003-11-12 ASML Netherlands B.V. Off-axis levelling in lithographic projection apparatus
JP2001160530A (ja) * 1999-12-01 2001-06-12 Nikon Corp ステージ装置及び露光装置
US6859260B2 (en) * 2001-04-25 2005-02-22 Asml Holding N.V. Method and system for improving focus accuracy in a lithography system

Also Published As

Publication number Publication date
EP1253471A2 (en) 2002-10-30
KR100719975B1 (ko) 2007-05-21
US6859260B2 (en) 2005-02-22
US7053984B2 (en) 2006-05-30
US20020158185A1 (en) 2002-10-31
US20060187436A1 (en) 2006-08-24
US20050128456A1 (en) 2005-06-16
US7248336B2 (en) 2007-07-24
TW541593B (en) 2003-07-11
EP1253471A3 (en) 2005-11-02
KR20020092175A (ko) 2002-12-11
JP2003031493A (ja) 2003-01-31

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