JP4212753B2 - 縦型熱処理装置 - Google Patents
縦型熱処理装置 Download PDFInfo
- Publication number
- JP4212753B2 JP4212753B2 JP2000047353A JP2000047353A JP4212753B2 JP 4212753 B2 JP4212753 B2 JP 4212753B2 JP 2000047353 A JP2000047353 A JP 2000047353A JP 2000047353 A JP2000047353 A JP 2000047353A JP 4212753 B2 JP4212753 B2 JP 4212753B2
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- vertical heat
- closing member
- manifold
- treatment apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010438 heat treatment Methods 0.000 title claims description 43
- 239000010453 quartz Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000007789 gas Substances 0.000 description 42
- 235000012431 wafers Nutrition 0.000 description 30
- 238000011109 contamination Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 8
- 238000011144 upstream manufacturing Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
Images
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000047353A JP4212753B2 (ja) | 2000-02-24 | 2000-02-24 | 縦型熱処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000047353A JP4212753B2 (ja) | 2000-02-24 | 2000-02-24 | 縦型熱処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001237238A JP2001237238A (ja) | 2001-08-31 |
| JP2001237238A5 JP2001237238A5 (enExample) | 2006-10-12 |
| JP4212753B2 true JP4212753B2 (ja) | 2009-01-21 |
Family
ID=18569612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000047353A Expired - Fee Related JP4212753B2 (ja) | 2000-02-24 | 2000-02-24 | 縦型熱処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4212753B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7351057B2 (en) * | 2005-04-27 | 2008-04-01 | Asm International N.V. | Door plate for furnace |
| US7762809B2 (en) | 2006-10-13 | 2010-07-27 | Tokyo Electron Limited | Heat treatment apparatus |
| JP5560556B2 (ja) | 2008-11-17 | 2014-07-30 | 東京エレクトロン株式会社 | 処理装置 |
-
2000
- 2000-02-24 JP JP2000047353A patent/JP4212753B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001237238A (ja) | 2001-08-31 |
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