JP4190166B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4190166B2
JP4190166B2 JP2001202240A JP2001202240A JP4190166B2 JP 4190166 B2 JP4190166 B2 JP 4190166B2 JP 2001202240 A JP2001202240 A JP 2001202240A JP 2001202240 A JP2001202240 A JP 2001202240A JP 4190166 B2 JP4190166 B2 JP 4190166B2
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JP
Japan
Prior art keywords
group
substituent
hydrogen atom
alkyl group
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001202240A
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English (en)
Japanese (ja)
Other versions
JP2003015297A5 (https=
JP2003015297A (ja
Inventor
一良 水谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2001202240A priority Critical patent/JP4190166B2/ja
Priority to KR1020020036404A priority patent/KR100863984B1/ko
Priority to EP02014079.4A priority patent/EP1273969B1/en
Priority to TW091114501A priority patent/TWI269117B/zh
Priority to US10/187,291 priority patent/US6878502B2/en
Publication of JP2003015297A publication Critical patent/JP2003015297A/ja
Publication of JP2003015297A5 publication Critical patent/JP2003015297A5/ja
Application granted granted Critical
Publication of JP4190166B2 publication Critical patent/JP4190166B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2001202240A 2001-07-03 2001-07-03 ポジ型レジスト組成物 Expired - Fee Related JP4190166B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001202240A JP4190166B2 (ja) 2001-07-03 2001-07-03 ポジ型レジスト組成物
KR1020020036404A KR100863984B1 (ko) 2001-07-03 2002-06-27 포지티브 레지스트 조성물
EP02014079.4A EP1273969B1 (en) 2001-07-03 2002-07-01 Positive resist composition
TW091114501A TWI269117B (en) 2001-07-03 2002-07-01 Positive resist composition
US10/187,291 US6878502B2 (en) 2001-07-03 2002-07-02 Positive resist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001202240A JP4190166B2 (ja) 2001-07-03 2001-07-03 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003015297A JP2003015297A (ja) 2003-01-15
JP2003015297A5 JP2003015297A5 (https=) 2006-01-19
JP4190166B2 true JP4190166B2 (ja) 2008-12-03

Family

ID=19039081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001202240A Expired - Fee Related JP4190166B2 (ja) 2001-07-03 2001-07-03 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4190166B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008053697A1 (fr) 2006-10-31 2008-05-08 Tokyo Ohka Kogyo Co., Ltd. Composition à résistance positive et procédé de formation de modèle de résistance
JP4818882B2 (ja) * 2006-10-31 2011-11-16 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP5165227B2 (ja) 2006-10-31 2013-03-21 東京応化工業株式会社 化合物および高分子化合物
JP5655754B2 (ja) * 2011-10-03 2015-01-21 信越化学工業株式会社 ポジ型レジスト材料並びにこれを用いたパターン形成方法
JP6748495B2 (ja) * 2015-07-14 2020-09-02 住友化学株式会社 レジスト組成物

Also Published As

Publication number Publication date
JP2003015297A (ja) 2003-01-15

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