JP2003015297A5 - - Google Patents
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- Publication number
- JP2003015297A5 JP2003015297A5 JP2001202240A JP2001202240A JP2003015297A5 JP 2003015297 A5 JP2003015297 A5 JP 2003015297A5 JP 2001202240 A JP2001202240 A JP 2001202240A JP 2001202240 A JP2001202240 A JP 2001202240A JP 2003015297 A5 JP2003015297 A5 JP 2003015297A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- alkyl group
- hydrogen atom
- different
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000000217 alkyl group Chemical group 0.000 description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 14
- 125000001424 substituent group Chemical group 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 10
- 125000000753 cycloalkyl group Chemical group 0.000 description 9
- 125000005843 halogen group Chemical group 0.000 description 8
- 125000003710 aryl alkyl group Chemical group 0.000 description 7
- 125000004093 cyano group Chemical group *C#N 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 125000000547 substituted alkyl group Chemical group 0.000 description 5
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001202240A JP4190166B2 (ja) | 2001-07-03 | 2001-07-03 | ポジ型レジスト組成物 |
| KR1020020036404A KR100863984B1 (ko) | 2001-07-03 | 2002-06-27 | 포지티브 레지스트 조성물 |
| EP02014079.4A EP1273969B1 (en) | 2001-07-03 | 2002-07-01 | Positive resist composition |
| TW091114501A TWI269117B (en) | 2001-07-03 | 2002-07-01 | Positive resist composition |
| US10/187,291 US6878502B2 (en) | 2001-07-03 | 2002-07-02 | Positive resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001202240A JP4190166B2 (ja) | 2001-07-03 | 2001-07-03 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003015297A JP2003015297A (ja) | 2003-01-15 |
| JP2003015297A5 true JP2003015297A5 (https=) | 2006-01-19 |
| JP4190166B2 JP4190166B2 (ja) | 2008-12-03 |
Family
ID=19039081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001202240A Expired - Fee Related JP4190166B2 (ja) | 2001-07-03 | 2001-07-03 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4190166B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008053697A1 (fr) | 2006-10-31 | 2008-05-08 | Tokyo Ohka Kogyo Co., Ltd. | Composition à résistance positive et procédé de formation de modèle de résistance |
| JP4818882B2 (ja) * | 2006-10-31 | 2011-11-16 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP5165227B2 (ja) | 2006-10-31 | 2013-03-21 | 東京応化工業株式会社 | 化合物および高分子化合物 |
| JP5655754B2 (ja) * | 2011-10-03 | 2015-01-21 | 信越化学工業株式会社 | ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
| JP6748495B2 (ja) * | 2015-07-14 | 2020-09-02 | 住友化学株式会社 | レジスト組成物 |
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2001
- 2001-07-03 JP JP2001202240A patent/JP4190166B2/ja not_active Expired - Fee Related