JP2002323768A5 - - Google Patents
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- JP2002323768A5 JP2002323768A5 JP2002043492A JP2002043492A JP2002323768A5 JP 2002323768 A5 JP2002323768 A5 JP 2002323768A5 JP 2002043492 A JP2002043492 A JP 2002043492A JP 2002043492 A JP2002043492 A JP 2002043492A JP 2002323768 A5 JP2002323768 A5 JP 2002323768A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002043492A JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001045214 | 2001-02-21 | ||
| JP2001-45214 | 2001-02-21 | ||
| JP2002043492A JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002323768A JP2002323768A (ja) | 2002-11-08 |
| JP2002323768A5 true JP2002323768A5 (https=) | 2005-04-07 |
| JP3992993B2 JP3992993B2 (ja) | 2007-10-17 |
Family
ID=26609825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002043492A Expired - Lifetime JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3992993B2 (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7666569B2 (en) | 2002-12-26 | 2010-02-23 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method for forming resist pattern |
| JP4121396B2 (ja) | 2003-03-05 | 2008-07-23 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4115322B2 (ja) | 2003-03-31 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| DE602004023668D1 (de) | 2003-03-31 | 2009-12-03 | Fujifilm Corp | Positiv arbeitende Resistzusammensetzung |
| JP4149306B2 (ja) | 2003-04-30 | 2008-09-10 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP2004333548A (ja) | 2003-04-30 | 2004-11-25 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物およびレジストパターン形成方法 |
| JP3981830B2 (ja) | 2003-05-26 | 2007-09-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| US7250246B2 (en) | 2004-01-26 | 2007-07-31 | Fujifilm Corporation | Positive resist composition and pattern formation method using the same |
| KR101129515B1 (ko) | 2004-02-20 | 2012-03-30 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 및 그것을 사용한 패턴형성방법 |
| US7504193B2 (en) | 2004-09-02 | 2009-03-17 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
| JP4368282B2 (ja) | 2004-09-24 | 2009-11-18 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| KR20080026066A (ko) | 2006-09-19 | 2008-03-24 | 후지필름 가부시키가이샤 | 감광성 조성물, 감광성 조성물에 사용하는 화합물 및감광성 조성물을 사용한 패턴형성방법 |
| EP2450746A1 (en) | 2007-08-10 | 2012-05-09 | Fujifilm Corporation | Positive resist composition and pattern forming method using the composition |
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2002
- 2002-02-20 JP JP2002043492A patent/JP3992993B2/ja not_active Expired - Lifetime