DE602004023668D1 - Positiv arbeitende Resistzusammensetzung - Google Patents

Positiv arbeitende Resistzusammensetzung

Info

Publication number
DE602004023668D1
DE602004023668D1 DE602004023668T DE602004023668T DE602004023668D1 DE 602004023668 D1 DE602004023668 D1 DE 602004023668D1 DE 602004023668 T DE602004023668 T DE 602004023668T DE 602004023668 T DE602004023668 T DE 602004023668T DE 602004023668 D1 DE602004023668 D1 DE 602004023668D1
Authority
DE
Germany
Prior art keywords
resist composition
positive resist
acid
apositive
solubility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004023668T
Other languages
English (en)
Inventor
Kazuyoshi Mizutani
Shoichiro Yasunami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of DE602004023668D1 publication Critical patent/DE602004023668D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602004023668T 2003-03-31 2004-03-30 Positiv arbeitende Resistzusammensetzung Expired - Lifetime DE602004023668D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003096390 2003-03-31

Publications (1)

Publication Number Publication Date
DE602004023668D1 true DE602004023668D1 (de) 2009-12-03

Family

ID=32844646

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004023668T Expired - Lifetime DE602004023668D1 (de) 2003-03-31 2004-03-30 Positiv arbeitende Resistzusammensetzung

Country Status (5)

Country Link
US (1) US7232640B1 (de)
EP (1) EP1465010B1 (de)
KR (1) KR101057347B1 (de)
AT (1) ATE446530T1 (de)
DE (1) DE602004023668D1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4190538B2 (ja) * 2003-12-22 2008-12-03 ライオン株式会社 ハイパーブランチポリマー、ハイパーブランチポリマーの製造方法、およびレジスト組成物
US20050221222A1 (en) * 2004-03-22 2005-10-06 Canon Kabushiki Kaisha Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method
KR101400824B1 (ko) * 2006-09-25 2014-05-29 후지필름 가부시키가이샤 레지스트 조성물, 이 레지스트 조성물에 사용되는 수지, 이수지의 합성에 사용되는 화합물, 및 상기 레지스트조성물을 사용한 패턴형성방법
US8039194B2 (en) 2008-01-08 2011-10-18 Internatinal Business Machines Corporation Photoacid generators for extreme ultraviolet lithography
JP5639772B2 (ja) * 2010-03-10 2014-12-10 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、それを用いたレジスト膜及びパターン形成方法
JP5793489B2 (ja) * 2011-11-30 2015-10-14 富士フイルム株式会社 感活性光線性又は感放射線性組成物、それを用いたレジスト膜、パターン形成方法、及び電子デバイスの製造方法
KR102432661B1 (ko) * 2015-07-07 2022-08-17 삼성전자주식회사 극자외선용 포토레지스트 조성물 및 이를 이용하는 포토레지스트 패턴의 형성 방법

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817012A1 (de) 1988-05-19 1989-11-30 Basf Ag Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern
DE4007924A1 (de) * 1990-03-13 1991-09-19 Basf Ag Strahlungsempfindliches gemisch
US5899504A (en) * 1995-01-23 1999-05-04 Laser Substrates, Inc. Multi-part non-impact printer airbill form
US5573277B2 (en) * 1994-03-04 2000-04-25 Glenn Petkovsek Mailpiece and/or shipping item for special mailing and a method for assembling a mailpiece and/or shipping item requiring special services
US5558971A (en) * 1994-09-02 1996-09-24 Wako Pure Chemical Industries, Ltd. Resist material
US5860904A (en) * 1995-03-06 1999-01-19 Petkovsek; Glenn Special service mailpiece having an integral document section and a method for forming same
US5643669A (en) * 1996-02-08 1997-07-01 Minnesota Mining And Manufacturing Company Curable water-based coating compositions and cured products thereof
JP3587325B2 (ja) * 1996-03-08 2004-11-10 富士写真フイルム株式会社 ポジ型感光性組成物
US5862978A (en) * 1997-12-18 1999-01-26 Moore U.S.A. Inc. Certified mailer envelope assembly
JP4161358B2 (ja) * 1998-12-22 2008-10-08 Ｊｓｒ株式会社 感放射線性樹脂組成物
US6179202B1 (en) * 1999-08-04 2001-01-30 Moore North America, Inc. Single side imaged special services mailer
JP3963624B2 (ja) * 1999-12-22 2007-08-22 富士フイルム株式会社 遠紫外線露光用ポジ型フォトレジスト組成物
JP4190138B2 (ja) * 2000-08-02 2008-12-03 富士フイルム株式会社 ポジ型フォトレジスト組成物
JP3992993B2 (ja) 2001-02-21 2007-10-17 富士フイルム株式会社 ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物
JP2004519734A (ja) * 2001-04-04 2004-07-02 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド ケイ素含有アセタール保護ポリマーおよびそのフォトレジスト組成物
JP3894001B2 (ja) * 2001-09-06 2007-03-14 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP4025102B2 (ja) * 2002-03-18 2007-12-19 富士フイルム株式会社 ポジ型レジスト組成物

Also Published As

Publication number Publication date
ATE446530T1 (de) 2009-11-15
US20070128547A1 (en) 2007-06-07
KR20040086793A (ko) 2004-10-12
KR101057347B1 (ko) 2011-08-17
US7232640B1 (en) 2007-06-19
EP1465010B1 (de) 2009-10-21
EP1465010A1 (de) 2004-10-06

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Legal Events

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