JP4189354B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4189354B2
JP4189354B2 JP2004163729A JP2004163729A JP4189354B2 JP 4189354 B2 JP4189354 B2 JP 4189354B2 JP 2004163729 A JP2004163729 A JP 2004163729A JP 2004163729 A JP2004163729 A JP 2004163729A JP 4189354 B2 JP4189354 B2 JP 4189354B2
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JP
Japan
Prior art keywords
air
concave mirror
concave
mirror
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004163729A
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English (en)
Japanese (ja)
Other versions
JP2005345645A (ja
Inventor
昌彦 船山
伊勢　　勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP2004163729A priority Critical patent/JP4189354B2/ja
Priority to TW94103601A priority patent/TW200540576A/zh
Priority to CN 200510073458 priority patent/CN1704848B/zh
Publication of JP2005345645A publication Critical patent/JP2005345645A/ja
Application granted granted Critical
Publication of JP4189354B2 publication Critical patent/JP4189354B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004163729A 2004-06-01 2004-06-01 露光装置 Expired - Fee Related JP4189354B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004163729A JP4189354B2 (ja) 2004-06-01 2004-06-01 露光装置
TW94103601A TW200540576A (en) 2004-06-01 2005-02-04 Exposure device
CN 200510073458 CN1704848B (zh) 2004-06-01 2005-05-30 曝光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004163729A JP4189354B2 (ja) 2004-06-01 2004-06-01 露光装置

Publications (2)

Publication Number Publication Date
JP2005345645A JP2005345645A (ja) 2005-12-15
JP4189354B2 true JP4189354B2 (ja) 2008-12-03

Family

ID=35498105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004163729A Expired - Fee Related JP4189354B2 (ja) 2004-06-01 2004-06-01 露光装置

Country Status (3)

Country Link
JP (1) JP4189354B2 (zh)
CN (1) CN1704848B (zh)
TW (1) TW200540576A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101876784B (zh) * 2009-04-29 2012-05-16 翊晖科技股份有限公司 曝光机及其曝光方法
CN102495537A (zh) * 2011-12-31 2012-06-13 上海飞为自动化系统有限公司 一种用于印刷电路板制作的装置
CN104423176A (zh) * 2013-08-30 2015-03-18 深南电路有限公司 光学系统及曝光机
CN105988296B (zh) * 2015-01-28 2017-12-29 南通大学 一种净化曝光装置
CN104749874A (zh) * 2015-03-26 2015-07-01 京东方科技集团股份有限公司 一种掩膜板、掩膜曝光设备及掩膜曝光方法
CN113176713A (zh) * 2021-04-25 2021-07-27 上海图双精密装备有限公司 一种光刻机运动台系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3448670B2 (ja) * 1993-09-02 2003-09-22 株式会社ニコン 露光装置及び素子製造方法
JP4234964B2 (ja) * 2002-09-10 2009-03-04 株式会社オーク製作所 露光装置

Also Published As

Publication number Publication date
CN1704848A (zh) 2005-12-07
JP2005345645A (ja) 2005-12-15
TWI327681B (zh) 2010-07-21
CN1704848B (zh) 2010-10-13
TW200540576A (en) 2005-12-16

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