JP4169476B2 - 画像の凸版印刷を行なうための複合印刷版 - Google Patents

画像の凸版印刷を行なうための複合印刷版 Download PDF

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Publication number
JP4169476B2
JP4169476B2 JP2000518307A JP2000518307A JP4169476B2 JP 4169476 B2 JP4169476 B2 JP 4169476B2 JP 2000518307 A JP2000518307 A JP 2000518307A JP 2000518307 A JP2000518307 A JP 2000518307A JP 4169476 B2 JP4169476 B2 JP 4169476B2
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Japan
Prior art keywords
photocurable
carrier sheet
ink
actinic radiation
wavelength region
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Expired - Fee Related
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JP2000518307A
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English (en)
Japanese (ja)
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JP2001521208A5 (enExample
JP2001521208A (ja
Inventor
カスデイン，ジヨージ
クロウエル，ジヨセフ
マーフイー，エドワード
レチア，デイビツド
Original Assignee
ポリフアイブロン・テクノロジーズ・インコーポレーテツド
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Publication date
Priority claimed from US08/957,165 external-priority patent/US6312871B1/en
Application filed by ポリフアイブロン・テクノロジーズ・インコーポレーテツド filed Critical ポリフアイブロン・テクノロジーズ・インコーポレーテツド
Publication of JP2001521208A publication Critical patent/JP2001521208A/ja
Publication of JP2001521208A5 publication Critical patent/JP2001521208A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3078—Processing different kinds of plates, e.g. negative and positive plates, in the same machine
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Methods (AREA)
  • Laminated Bodies (AREA)
JP2000518307A 1997-10-24 1998-10-23 画像の凸版印刷を行なうための複合印刷版 Expired - Fee Related JP4169476B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/957,165 1997-10-24
US08/957,165 US6312871B1 (en) 1996-07-08 1997-10-24 Composite relief image printing plates
PCT/US1998/022536 WO1999022273A1 (en) 1997-10-24 1998-10-23 Composite relief image printing plates

Publications (3)

Publication Number Publication Date
JP2001521208A JP2001521208A (ja) 2001-11-06
JP2001521208A5 JP2001521208A5 (enExample) 2006-01-05
JP4169476B2 true JP4169476B2 (ja) 2008-10-22

Family

ID=25499171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000518307A Expired - Fee Related JP4169476B2 (ja) 1997-10-24 1998-10-23 画像の凸版印刷を行なうための複合印刷版

Country Status (11)

Country Link
EP (1) EP1025464B1 (enExample)
JP (1) JP4169476B2 (enExample)
KR (1) KR20010031271A (enExample)
CN (1) CN1214289C (enExample)
AT (1) ATE332519T1 (enExample)
AU (1) AU1119499A (enExample)
BR (1) BR9814828A (enExample)
CA (1) CA2308757C (enExample)
DE (1) DE69835160T2 (enExample)
ES (1) ES2268796T3 (enExample)
WO (1) WO1999022273A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6312872B1 (en) * 1997-10-24 2001-11-06 Macdermid Graphic Arts Composite relief image printing plates
JP2006113310A (ja) * 2004-10-15 2006-04-27 Union Chemicar Co Ltd フレキソ印刷用刷版および製版方法
JP5463649B2 (ja) * 2008-10-27 2014-04-09 独立行政法人 国立印刷局 グラデーション樹脂版面及びグラデーション樹脂版面を用いた印刷物
JP5119191B2 (ja) * 2009-03-31 2013-01-16 富士フイルム株式会社 印刷版取り付け装置及び印刷版取り付け方法
US9375916B2 (en) * 2010-06-18 2016-06-28 Esko-Graphics Imaging Gmbh Non-printing registration marks on a printing plate
US9618847B2 (en) * 2014-02-20 2017-04-11 E I Du Pont De Nemours And Company Composite printing form precursor and method for preparing a printing form precursor for treatment
TW202222557A (zh) 2020-07-31 2022-06-16 美商數字標識公司 柔版印刷板上致能追踪及管理的編碼信號

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2111914A (en) * 1935-05-03 1938-03-22 Hearst Entpr Inc Registering device for use in making printing plates
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US4265986A (en) * 1979-11-21 1981-05-05 Uniroyal, Inc. Photopolymerizable composition containing chlorosulfonated polyethylene
JP2542501B2 (ja) * 1986-10-27 1996-10-09 キヤノン株式会社 製版方法
DE3736180A1 (de) * 1987-10-26 1989-05-03 Basf Ag Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten
TR24835A (tr) * 1990-07-07 1992-05-01 Thomson Brandt Gmbh Televizyon aktarma sistemi
DE4117127A1 (de) * 1991-05-25 1992-11-26 Basf Ag Lichtempfindliche aufzeichnungselemente, verfahren zu ihrer herstellung und weiterverarbeitung sowie geraete fuer die durchfuehrung dieser verfahren
JPH05230408A (ja) * 1992-02-25 1993-09-07 Seiko Epson Corp 水性記録用インク組成物、及びそれを用いた記録方法
JP2837028B2 (ja) * 1992-06-26 1998-12-14 富士写真フイルム株式会社 自動焼付方法
JPH06250372A (ja) * 1993-03-01 1994-09-09 Miura Insatsu Kk 手帳版下編集装置
GB2281250B (en) * 1993-08-28 1997-10-08 Flexographic Services Limited A method of mounting a printing plate on a mounting sheet
WO1997025206A1 (en) * 1996-01-05 1997-07-17 Polyfibron Technologies, Inc. Methods and apparatus for preparing relief image printing plates
US5846691A (en) * 1996-07-08 1998-12-08 Polyfibron Technologies, Inc. Composite relief image printing plates and methods for preparing same

Also Published As

Publication number Publication date
DE69835160D1 (de) 2006-08-17
CN1277681A (zh) 2000-12-20
WO1999022273A1 (en) 1999-05-06
ES2268796T3 (es) 2007-03-16
DE69835160T2 (de) 2007-07-12
ATE332519T1 (de) 2006-07-15
EP1025464A1 (en) 2000-08-09
BR9814828A (pt) 2000-10-03
AU1119499A (en) 1999-05-17
CA2308757A1 (en) 1999-05-06
CA2308757C (en) 2008-01-08
KR20010031271A (ko) 2001-04-16
EP1025464B1 (en) 2006-07-05
JP2001521208A (ja) 2001-11-06
EP1025464A4 (en) 2003-02-05
CN1214289C (zh) 2005-08-10

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