DE69835160T2 - Komposit-reliefdruckplatten - Google Patents
Komposit-reliefdruckplatten Download PDFInfo
- Publication number
- DE69835160T2 DE69835160T2 DE69835160T DE69835160T DE69835160T2 DE 69835160 T2 DE69835160 T2 DE 69835160T2 DE 69835160 T DE69835160 T DE 69835160T DE 69835160 T DE69835160 T DE 69835160T DE 69835160 T2 DE69835160 T2 DE 69835160T2
- Authority
- DE
- Germany
- Prior art keywords
- curable
- under light
- light irradiation
- carrier layer
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 title claims abstract description 57
- 239000002131 composite material Substances 0.000 title claims abstract description 35
- 239000010410 layer Substances 0.000 claims description 78
- 239000000463 material Substances 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 50
- 230000005855 radiation Effects 0.000 claims description 46
- 239000000976 ink Substances 0.000 claims description 35
- -1 unsaturated ethylene compound Chemical class 0.000 claims description 7
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- 239000011241 protective layer Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical group C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 3
- 239000005977 Ethylene Substances 0.000 claims description 3
- 239000002390 adhesive tape Substances 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 230000000704 physical effect Effects 0.000 claims description 3
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims 2
- 239000012790 adhesive layer Substances 0.000 claims 1
- 229920006267 polyester film Polymers 0.000 claims 1
- 239000000470 constituent Substances 0.000 abstract 1
- 230000008569 process Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000000975 dye Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 5
- 239000000123 paper Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- YGUMVDWOQQJBGA-VAWYXSNFSA-N 5-[(4-anilino-6-morpholin-4-yl-1,3,5-triazin-2-yl)amino]-2-[(e)-2-[4-[(4-anilino-6-morpholin-4-yl-1,3,5-triazin-2-yl)amino]-2-sulfophenyl]ethenyl]benzenesulfonic acid Chemical compound C=1C=C(\C=C\C=2C(=CC(NC=3N=C(N=C(NC=4C=CC=CC=4)N=3)N3CCOCC3)=CC=2)S(O)(=O)=O)C(S(=O)(=O)O)=CC=1NC(N=C(N=1)N2CCOCC2)=NC=1NC1=CC=CC=C1 YGUMVDWOQQJBGA-VAWYXSNFSA-N 0.000 description 1
- FMRHJJZUHUTGKE-UHFFFAOYSA-N Ethylhexyl salicylate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1O FMRHJJZUHUTGKE-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 230000009365 direct transmission Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HXHCOXPZCUFAJI-UHFFFAOYSA-N prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1 HXHCOXPZCUFAJI-UHFFFAOYSA-N 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000012791 sliding layer Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3078—Processing different kinds of plates, e.g. negative and positive plates, in the same machine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Methods (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US957165 | 1997-10-24 | ||
| US08/957,165 US6312871B1 (en) | 1996-07-08 | 1997-10-24 | Composite relief image printing plates |
| PCT/US1998/022536 WO1999022273A1 (en) | 1997-10-24 | 1998-10-23 | Composite relief image printing plates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69835160D1 DE69835160D1 (de) | 2006-08-17 |
| DE69835160T2 true DE69835160T2 (de) | 2007-07-12 |
Family
ID=25499171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69835160T Expired - Lifetime DE69835160T2 (de) | 1997-10-24 | 1998-10-23 | Komposit-reliefdruckplatten |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP1025464B1 (enExample) |
| JP (1) | JP4169476B2 (enExample) |
| KR (1) | KR20010031271A (enExample) |
| CN (1) | CN1214289C (enExample) |
| AT (1) | ATE332519T1 (enExample) |
| AU (1) | AU1119499A (enExample) |
| BR (1) | BR9814828A (enExample) |
| CA (1) | CA2308757C (enExample) |
| DE (1) | DE69835160T2 (enExample) |
| ES (1) | ES2268796T3 (enExample) |
| WO (1) | WO1999022273A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6312872B1 (en) * | 1997-10-24 | 2001-11-06 | Macdermid Graphic Arts | Composite relief image printing plates |
| JP2006113310A (ja) * | 2004-10-15 | 2006-04-27 | Union Chemicar Co Ltd | フレキソ印刷用刷版および製版方法 |
| JP5463649B2 (ja) * | 2008-10-27 | 2014-04-09 | 独立行政法人 国立印刷局 | グラデーション樹脂版面及びグラデーション樹脂版面を用いた印刷物 |
| JP5119191B2 (ja) * | 2009-03-31 | 2013-01-16 | 富士フイルム株式会社 | 印刷版取り付け装置及び印刷版取り付け方法 |
| US9375916B2 (en) * | 2010-06-18 | 2016-06-28 | Esko-Graphics Imaging Gmbh | Non-printing registration marks on a printing plate |
| US9618847B2 (en) * | 2014-02-20 | 2017-04-11 | E I Du Pont De Nemours And Company | Composite printing form precursor and method for preparing a printing form precursor for treatment |
| TW202222557A (zh) | 2020-07-31 | 2022-06-16 | 美商數字標識公司 | 柔版印刷板上致能追踪及管理的編碼信號 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2111914A (en) * | 1935-05-03 | 1938-03-22 | Hearst Entpr Inc | Registering device for use in making printing plates |
| CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
| US4265986A (en) * | 1979-11-21 | 1981-05-05 | Uniroyal, Inc. | Photopolymerizable composition containing chlorosulfonated polyethylene |
| JP2542501B2 (ja) * | 1986-10-27 | 1996-10-09 | キヤノン株式会社 | 製版方法 |
| DE3736180A1 (de) * | 1987-10-26 | 1989-05-03 | Basf Ag | Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten |
| TR24835A (tr) * | 1990-07-07 | 1992-05-01 | Thomson Brandt Gmbh | Televizyon aktarma sistemi |
| DE4117127A1 (de) * | 1991-05-25 | 1992-11-26 | Basf Ag | Lichtempfindliche aufzeichnungselemente, verfahren zu ihrer herstellung und weiterverarbeitung sowie geraete fuer die durchfuehrung dieser verfahren |
| JPH05230408A (ja) * | 1992-02-25 | 1993-09-07 | Seiko Epson Corp | 水性記録用インク組成物、及びそれを用いた記録方法 |
| JP2837028B2 (ja) * | 1992-06-26 | 1998-12-14 | 富士写真フイルム株式会社 | 自動焼付方法 |
| JPH06250372A (ja) * | 1993-03-01 | 1994-09-09 | Miura Insatsu Kk | 手帳版下編集装置 |
| GB2281250B (en) * | 1993-08-28 | 1997-10-08 | Flexographic Services Limited | A method of mounting a printing plate on a mounting sheet |
| WO1997025206A1 (en) * | 1996-01-05 | 1997-07-17 | Polyfibron Technologies, Inc. | Methods and apparatus for preparing relief image printing plates |
| US5846691A (en) * | 1996-07-08 | 1998-12-08 | Polyfibron Technologies, Inc. | Composite relief image printing plates and methods for preparing same |
-
1998
- 1998-10-23 JP JP2000518307A patent/JP4169476B2/ja not_active Expired - Fee Related
- 1998-10-23 BR BR9814828-1A patent/BR9814828A/pt not_active Application Discontinuation
- 1998-10-23 EP EP98953954A patent/EP1025464B1/en not_active Expired - Lifetime
- 1998-10-23 WO PCT/US1998/022536 patent/WO1999022273A1/en not_active Ceased
- 1998-10-23 DE DE69835160T patent/DE69835160T2/de not_active Expired - Lifetime
- 1998-10-23 CA CA002308757A patent/CA2308757C/en not_active Expired - Fee Related
- 1998-10-23 AU AU11194/99A patent/AU1119499A/en not_active Abandoned
- 1998-10-23 ES ES98953954T patent/ES2268796T3/es not_active Expired - Lifetime
- 1998-10-23 KR KR1020007004258A patent/KR20010031271A/ko not_active Withdrawn
- 1998-10-23 CN CNB988104830A patent/CN1214289C/zh not_active Expired - Fee Related
- 1998-10-23 AT AT98953954T patent/ATE332519T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE69835160D1 (de) | 2006-08-17 |
| CN1277681A (zh) | 2000-12-20 |
| WO1999022273A1 (en) | 1999-05-06 |
| JP4169476B2 (ja) | 2008-10-22 |
| ES2268796T3 (es) | 2007-03-16 |
| ATE332519T1 (de) | 2006-07-15 |
| EP1025464A1 (en) | 2000-08-09 |
| BR9814828A (pt) | 2000-10-03 |
| AU1119499A (en) | 1999-05-17 |
| CA2308757A1 (en) | 1999-05-06 |
| CA2308757C (en) | 2008-01-08 |
| KR20010031271A (ko) | 2001-04-16 |
| EP1025464B1 (en) | 2006-07-05 |
| JP2001521208A (ja) | 2001-11-06 |
| EP1025464A4 (en) | 2003-02-05 |
| CN1214289C (zh) | 2005-08-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8328 | Change in the person/name/address of the agent |
Representative=s name: 2K PATENTANWAELTE BLASBERG KEWITZ & REICHEL, PARTN |