DE69835160D1 - Komposit-reliefdruckplatten - Google Patents

Komposit-reliefdruckplatten

Info

Publication number
DE69835160D1
DE69835160D1 DE69835160T DE69835160T DE69835160D1 DE 69835160 D1 DE69835160 D1 DE 69835160D1 DE 69835160 T DE69835160 T DE 69835160T DE 69835160 T DE69835160 T DE 69835160T DE 69835160 D1 DE69835160 D1 DE 69835160D1
Authority
DE
Germany
Prior art keywords
elements
printing plates
relief printing
photocurable
composite relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69835160T
Other languages
English (en)
Other versions
DE69835160T2 (de
Inventor
George Cusdin
Joseph Crowell
Edward Murphy
David Recchia
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Graphics Solutions LLC
Original Assignee
Polyfibron Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/957,165 external-priority patent/US6312871B1/en
Application filed by Polyfibron Technologies Inc filed Critical Polyfibron Technologies Inc
Publication of DE69835160D1 publication Critical patent/DE69835160D1/de
Application granted granted Critical
Publication of DE69835160T2 publication Critical patent/DE69835160T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3078—Processing different kinds of plates, e.g. negative and positive plates, in the same machine
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Printing Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
DE69835160T 1997-10-24 1998-10-23 Komposit-reliefdruckplatten Expired - Lifetime DE69835160T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/957,165 US6312871B1 (en) 1996-07-08 1997-10-24 Composite relief image printing plates
US957165 1997-10-24
PCT/US1998/022536 WO1999022273A1 (en) 1997-10-24 1998-10-23 Composite relief image printing plates

Publications (2)

Publication Number Publication Date
DE69835160D1 true DE69835160D1 (de) 2006-08-17
DE69835160T2 DE69835160T2 (de) 2007-07-12

Family

ID=25499171

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69835160T Expired - Lifetime DE69835160T2 (de) 1997-10-24 1998-10-23 Komposit-reliefdruckplatten

Country Status (11)

Country Link
EP (1) EP1025464B1 (de)
JP (1) JP4169476B2 (de)
KR (1) KR20010031271A (de)
CN (1) CN1214289C (de)
AT (1) ATE332519T1 (de)
AU (1) AU1119499A (de)
BR (1) BR9814828A (de)
CA (1) CA2308757C (de)
DE (1) DE69835160T2 (de)
ES (1) ES2268796T3 (de)
WO (1) WO1999022273A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6312872B1 (en) * 1997-10-24 2001-11-06 Macdermid Graphic Arts Composite relief image printing plates
JP2006113310A (ja) * 2004-10-15 2006-04-27 Union Chemicar Co Ltd フレキソ印刷用刷版および製版方法
JP5463649B2 (ja) * 2008-10-27 2014-04-09 独立行政法人 国立印刷局 グラデーション樹脂版面及びグラデーション樹脂版面を用いた印刷物
JP5119191B2 (ja) * 2009-03-31 2013-01-16 富士フイルム株式会社 印刷版取り付け装置及び印刷版取り付け方法
US9375916B2 (en) * 2010-06-18 2016-06-28 Esko-Graphics Imaging Gmbh Non-printing registration marks on a printing plate
US9618847B2 (en) * 2014-02-20 2017-04-11 E I Du Pont De Nemours And Company Composite printing form precursor and method for preparing a printing form precursor for treatment
WO2022026847A1 (en) * 2020-07-31 2022-02-03 Digimarc Corporation Encoding signals on flexographic printing plates to enable tracking and management

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2111914A (en) * 1935-05-03 1938-03-22 Hearst Entpr Inc Registering device for use in making printing plates
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US4265986A (en) * 1979-11-21 1981-05-05 Uniroyal, Inc. Photopolymerizable composition containing chlorosulfonated polyethylene
JP2542501B2 (ja) * 1986-10-27 1996-10-09 キヤノン株式会社 製版方法
DE3736180A1 (de) * 1987-10-26 1989-05-03 Basf Ag Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten
TR24835A (tr) * 1990-07-07 1992-05-01 Thomson Brandt Gmbh Televizyon aktarma sistemi
DE4117127A1 (de) * 1991-05-25 1992-11-26 Basf Ag Lichtempfindliche aufzeichnungselemente, verfahren zu ihrer herstellung und weiterverarbeitung sowie geraete fuer die durchfuehrung dieser verfahren
JPH05230408A (ja) * 1992-02-25 1993-09-07 Seiko Epson Corp 水性記録用インク組成物、及びそれを用いた記録方法
JP2837028B2 (ja) * 1992-06-26 1998-12-14 富士写真フイルム株式会社 自動焼付方法
JPH06250372A (ja) * 1993-03-01 1994-09-09 Miura Insatsu Kk 手帳版下編集装置
GB2281250B (en) * 1993-08-28 1997-10-08 Flexographic Services Limited A method of mounting a printing plate on a mounting sheet
WO1997025206A1 (en) * 1996-01-05 1997-07-17 Polyfibron Technologies, Inc. Methods and apparatus for preparing relief image printing plates
US5846691A (en) * 1996-07-08 1998-12-08 Polyfibron Technologies, Inc. Composite relief image printing plates and methods for preparing same

Also Published As

Publication number Publication date
ATE332519T1 (de) 2006-07-15
KR20010031271A (ko) 2001-04-16
CN1277681A (zh) 2000-12-20
JP2001521208A (ja) 2001-11-06
EP1025464A4 (de) 2003-02-05
AU1119499A (en) 1999-05-17
CN1214289C (zh) 2005-08-10
EP1025464A1 (de) 2000-08-09
CA2308757A1 (en) 1999-05-06
ES2268796T3 (es) 2007-03-16
CA2308757C (en) 2008-01-08
BR9814828A (pt) 2000-10-03
DE69835160T2 (de) 2007-07-12
JP4169476B2 (ja) 2008-10-22
EP1025464B1 (de) 2006-07-05
WO1999022273A1 (en) 1999-05-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: 2K PATENTANWAELTE BLASBERG KEWITZ & REICHEL, PARTN