BR9814828A - Placa de impressão compósita, e, processo para preparação da mesma - Google Patents
Placa de impressão compósita, e, processo para preparação da mesmaInfo
- Publication number
- BR9814828A BR9814828A BR9814828-1A BR9814828A BR9814828A BR 9814828 A BR9814828 A BR 9814828A BR 9814828 A BR9814828 A BR 9814828A BR 9814828 A BR9814828 A BR 9814828A
- Authority
- BR
- Brazil
- Prior art keywords
- elements
- composite printing
- preparing
- printing plate
- photocurable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3078—Processing different kinds of plates, e.g. negative and positive plates, in the same machine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Methods (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/957,165 US6312871B1 (en) | 1996-07-08 | 1997-10-24 | Composite relief image printing plates |
| PCT/US1998/022536 WO1999022273A1 (en) | 1997-10-24 | 1998-10-23 | Composite relief image printing plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9814828A true BR9814828A (pt) | 2000-10-03 |
Family
ID=25499171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9814828-1A BR9814828A (pt) | 1997-10-24 | 1998-10-23 | Placa de impressão compósita, e, processo para preparação da mesma |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP1025464B1 (de) |
| JP (1) | JP4169476B2 (de) |
| KR (1) | KR20010031271A (de) |
| CN (1) | CN1214289C (de) |
| AT (1) | ATE332519T1 (de) |
| AU (1) | AU1119499A (de) |
| BR (1) | BR9814828A (de) |
| CA (1) | CA2308757C (de) |
| DE (1) | DE69835160T2 (de) |
| ES (1) | ES2268796T3 (de) |
| WO (1) | WO1999022273A1 (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6312872B1 (en) * | 1997-10-24 | 2001-11-06 | Macdermid Graphic Arts | Composite relief image printing plates |
| JP2006113310A (ja) * | 2004-10-15 | 2006-04-27 | Union Chemicar Co Ltd | フレキソ印刷用刷版および製版方法 |
| JP5463649B2 (ja) * | 2008-10-27 | 2014-04-09 | 独立行政法人 国立印刷局 | グラデーション樹脂版面及びグラデーション樹脂版面を用いた印刷物 |
| JP5119191B2 (ja) * | 2009-03-31 | 2013-01-16 | 富士フイルム株式会社 | 印刷版取り付け装置及び印刷版取り付け方法 |
| US9375916B2 (en) * | 2010-06-18 | 2016-06-28 | Esko-Graphics Imaging Gmbh | Non-printing registration marks on a printing plate |
| US9618847B2 (en) * | 2014-02-20 | 2017-04-11 | E I Du Pont De Nemours And Company | Composite printing form precursor and method for preparing a printing form precursor for treatment |
| US11694047B2 (en) | 2020-07-31 | 2023-07-04 | Digimarc Corporation | Encoding signals on flexographic printing plates to enable tracking and management |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2111914A (en) * | 1935-05-03 | 1938-03-22 | Hearst Entpr Inc | Registering device for use in making printing plates |
| CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
| US4265986A (en) * | 1979-11-21 | 1981-05-05 | Uniroyal, Inc. | Photopolymerizable composition containing chlorosulfonated polyethylene |
| JP2542501B2 (ja) * | 1986-10-27 | 1996-10-09 | キヤノン株式会社 | 製版方法 |
| DE3736180A1 (de) * | 1987-10-26 | 1989-05-03 | Basf Ag | Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten |
| TR24835A (tr) * | 1990-07-07 | 1992-05-01 | Thomson Brandt Gmbh | Televizyon aktarma sistemi |
| DE4117127A1 (de) * | 1991-05-25 | 1992-11-26 | Basf Ag | Lichtempfindliche aufzeichnungselemente, verfahren zu ihrer herstellung und weiterverarbeitung sowie geraete fuer die durchfuehrung dieser verfahren |
| JPH05230408A (ja) * | 1992-02-25 | 1993-09-07 | Seiko Epson Corp | 水性記録用インク組成物、及びそれを用いた記録方法 |
| JP2837028B2 (ja) * | 1992-06-26 | 1998-12-14 | 富士写真フイルム株式会社 | 自動焼付方法 |
| JPH06250372A (ja) * | 1993-03-01 | 1994-09-09 | Miura Insatsu Kk | 手帳版下編集装置 |
| GB2281250B (en) * | 1993-08-28 | 1997-10-08 | Flexographic Services Limited | A method of mounting a printing plate on a mounting sheet |
| AU1571997A (en) * | 1996-01-05 | 1997-08-01 | Polyfibron Technologies, Inc. | Methods and apparatus for preparing relief image printing plates |
| US5846691A (en) * | 1996-07-08 | 1998-12-08 | Polyfibron Technologies, Inc. | Composite relief image printing plates and methods for preparing same |
-
1998
- 1998-10-23 EP EP98953954A patent/EP1025464B1/de not_active Expired - Lifetime
- 1998-10-23 WO PCT/US1998/022536 patent/WO1999022273A1/en active IP Right Grant
- 1998-10-23 DE DE69835160T patent/DE69835160T2/de not_active Expired - Lifetime
- 1998-10-23 AU AU11194/99A patent/AU1119499A/en not_active Abandoned
- 1998-10-23 BR BR9814828-1A patent/BR9814828A/pt not_active Application Discontinuation
- 1998-10-23 KR KR1020007004258A patent/KR20010031271A/ko not_active Application Discontinuation
- 1998-10-23 ES ES98953954T patent/ES2268796T3/es not_active Expired - Lifetime
- 1998-10-23 CA CA002308757A patent/CA2308757C/en not_active Expired - Fee Related
- 1998-10-23 JP JP2000518307A patent/JP4169476B2/ja not_active Expired - Fee Related
- 1998-10-23 AT AT98953954T patent/ATE332519T1/de not_active IP Right Cessation
- 1998-10-23 CN CNB988104830A patent/CN1214289C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE69835160D1 (de) | 2006-08-17 |
| CN1277681A (zh) | 2000-12-20 |
| KR20010031271A (ko) | 2001-04-16 |
| CN1214289C (zh) | 2005-08-10 |
| EP1025464A4 (de) | 2003-02-05 |
| AU1119499A (en) | 1999-05-17 |
| CA2308757C (en) | 2008-01-08 |
| CA2308757A1 (en) | 1999-05-06 |
| WO1999022273A1 (en) | 1999-05-06 |
| ATE332519T1 (de) | 2006-07-15 |
| DE69835160T2 (de) | 2007-07-12 |
| ES2268796T3 (es) | 2007-03-16 |
| JP4169476B2 (ja) | 2008-10-22 |
| JP2001521208A (ja) | 2001-11-06 |
| EP1025464B1 (de) | 2006-07-05 |
| EP1025464A1 (de) | 2000-08-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |