JP4160439B2 - Laser drilling method - Google Patents

Laser drilling method Download PDF

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Publication number
JP4160439B2
JP4160439B2 JP2003116982A JP2003116982A JP4160439B2 JP 4160439 B2 JP4160439 B2 JP 4160439B2 JP 2003116982 A JP2003116982 A JP 2003116982A JP 2003116982 A JP2003116982 A JP 2003116982A JP 4160439 B2 JP4160439 B2 JP 4160439B2
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JP
Japan
Prior art keywords
window
metal layer
front side
diameter
insulating resin
Prior art date
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Expired - Fee Related
Application number
JP2003116982A
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Japanese (ja)
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JP2004327532A (en
Inventor
邦夫 荒井
広重 外園
修 久世
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Via Mechanics Ltd
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Hitachi Via Mechanics Ltd
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Publication date
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Priority to JP2003116982A priority Critical patent/JP4160439B2/en
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Description

【0001】
【発明の属する技術分野】
本発明はプリント基板のレーザによる穴あけ加工方法に関するものである。
【0002】
【従来の技術】
携帯電話等で半導体ICの高密度実装に用いられるプリント配線基板(以下、プリント基板という。)の実装配線密度は年々急激に増大し、現在プリント基板に要求される穴の口径は100μmφ以下になってきている。
【0003】
このような微小径の穴をあける方法として、炭酸ガスレーザを用いたレーザ加工方法が採用されてきているが、炭酸ガスレーザの波長(9.3〜10.6μm)に対する外層の金属層の反射率が高いため、予め他の方法(ドリル、化学エッチング等)で部分的に除去してウインドウを形成し、絶縁樹脂層にレーザを直接照射して加工する、いわゆるコンフォーマルマスク法を使用する。
【0004】
しかしながら、絶縁樹脂層の表側と裏側に金属層を有する基板の両側金属層にウインドウを開け、表側よりレーザ光を照射して絶縁樹脂層に貫通孔を加工する場合には、表側と裏側に設けるウインドウの位置を正確に一致させることができなく、そのままレーザ光を照射しても、図3に示すように開口不良になるという問題がある。
【0005】
図3において、(a)はレーザ光を照射する前、(b)はレーザ光照射後のそれぞれの断面図を示す。1は表側金属層(銅箔)、2は裏側金属層(銅箔)、3は絶縁樹脂層、4aは表側ウインドウ、4bは裏側ウインドウである。このように表側と裏側のウインドウ4a、4bの間に位置ずれがあると、(b)に示すようにレーザ照射後の穴の一部、ひどい場合には全部が裏側金属層2に覆われてしまい、開口不良となってしまう。
【0006】
このようなウインドウの位置ずれによる開口不良を改善するために、通常はレーザ光が入射する表側のウインドウを裏側のウインドウより広くして開口不良をなくす方法が取られる(例えば、特許文献1参照。)。
【特許文献1】
特開2000−277911号公報(段落29、図1)
【0007】
【発明が解決しようとする課題】
図2に、表側のウインドウを広くした例を示す。(a)はレーザ光を照射する前、(b)はレーザ光照射後、(c)はめっき膜形成後のそれぞれの断面図を示す。1は表側金属層(銅箔)、2は裏側金属層(銅箔)、3は絶縁樹脂層、4aは表側ウインドウ、4bは裏側ウインドウ、5はめっき層である。(b)及び(c)からわかるように、このように表側ウインドウ4aを広くして加工すると、裏側金属層2が剥き出しになりめっき層5が広く接触でき、電気の導通には有利であるが、穴の径は広くした表側ウインドウ4aの口径に合わされてしまい広くなってしまう。従って、プリント基板の配線幅や電極パッドの径はこの広い表側ウインドウ4aの口径に合わせて設計せざるを得なく、これが実装密度向上の妨げになっている。
【0008】
本発明は、上記従来技術の問題点を解決することを課題とする。
【0009】
【課題を解決するための手段】
絶縁樹脂層の表側と裏側に金属層を有する基板の両側金属層にウインドウを開け、表側よりレーザ光を照射して絶縁樹脂層に貫通孔を加工するレーザ穴あけ加工方法において、裏側の金属層に開けるウインドウの口径を表側の金属層に開ける口径よりも製造公差分程度だけ大きくすることを特徴とするレーザ穴あけ加工方法を用いると良い。
【0010】
従来の方法と逆に裏側のウインドウを広くすることにより、形成される穴径が小さくなり、プリント基板の実装密度を向上させることができる。
【0011】
【発明の実施の形態】
以下、図面を使って本発明の実施の形態を説明する。図1は、本発明に係るレーザ穴あけ加工方法を示す。(a)はレーザ光を照射する前、(b)はレーザ光照射後、(c)はめっき膜形成後のそれぞれの断面図を示す。1は表側金属層(銅箔等)、2は裏側金属層(銅箔等)、3は絶縁樹脂層(ガラス繊維入りエポキシ樹脂等)、4aは表側ウインドウ、4bは裏側ウインドウ、5はめっき層である。
【0012】
プリント基板における一般的な厚さは、銅箔の厚さ18μm、絶縁樹脂層は100μmである。レーザ光としては、炭酸ガスレーザ光(9.3〜10.6μm)を用いたが、可視光などのように金属層をアブレーション加工できない波長のレーザ光に対して同様に適用できる。
【0013】
裏側ウインドウ4bの口径は、表側ウインドウ4aの口径より、表と裏でのウインドウの中心位置のずれ(製造公差)分程度大きくする。本例においては、ウインドウの製造公差はおよそ60μm程度であるので、表側ウインドウ4aの口径60μmφに対して裏側ウインドウ4bの口径を125μmφとした。これにより、表側からレーザ光を照射しても表側ウインドウ4aの口径の小さな貫通孔が形成され、またその穴が裏側金属層2に塞がれることはない。
【0014】
さらに、(c)からわかるように、その後のめっき工程によりめっき層5が形成されると、裏側には金属層2の厚さ分の段差が発生するが、加工された穴径(=表側ウインドウ4aの口径)はほぼ設計通りに加工される。これは、穴径を小さくできることであるから、プリント基板の配線密度を向上させることができる。
【0015】
ここで、裏側にできる金属層2の厚さ分の段差を小さくしたい場合には、めっき工程の前に、エッチング工程を入れて金属層の厚さを少し薄くてからめっきすると良い。
【0016】
【発明の効果】
本発明により、絶縁樹脂層の表側と裏側に金属層を有する基板の両側金属層にウインドウを開け、表側よりレーザ光を照射して絶縁樹脂層に貫通孔を加工するレーザ穴あけ加工方法において、形成される穴径を小さくできるので、プリント基板の実装密度を向上させることができる。
【図面の簡単な説明】
【図1】本発明に係るレーザ穴あけ加工方法を示す断面図。
【図2】従来の一般的なレーザ穴あけ加工方法を示す断面図。
【図3】表側と裏側のウインドウの位置ずれによる開口不良を示す断面図。
【符号の説明】
1・・・表側金属層
2・・・裏側金属層
3・・・絶縁樹脂層
4a・・・表側ウインドウ
4b・・・裏側ウインドウ
5・・・めっき層
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a laser drilling method for a printed circuit board.
[0002]
[Prior art]
The mounting wiring density of printed circuit boards (hereinafter referred to as “printed circuit boards”) used for high-density mounting of semiconductor ICs in cellular phones and the like has increased rapidly year by year, and the hole diameter required for printed circuit boards is now less than 100 μmφ. It is coming.
[0003]
A laser processing method using a carbon dioxide laser has been adopted as a method for making such a small-diameter hole, but because the reflectance of the outer metal layer with respect to the wavelength of the carbon dioxide laser (9.3 to 10.6 μm) is high, A so-called conformal mask method is used in which a window is formed by partial removal by other methods (drilling, chemical etching, etc.) in advance, and the insulating resin layer is directly irradiated with a laser to process it.
[0004]
However, when opening a window in both metal layers of a substrate having a metal layer on the front side and the back side of the insulating resin layer and processing a through hole in the insulating resin layer by irradiating laser light from the front side, it is provided on the front side and the back side. There is a problem that the position of the window cannot be accurately matched, and even if the laser beam is irradiated as it is, an opening defect occurs as shown in FIG.
[0005]
3A is a cross-sectional view before irradiation with laser light, and FIG. 3B is a cross-sectional view after irradiation with laser light. 1 is a front side metal layer (copper foil), 2 is a back side metal layer (copper foil), 3 is an insulating resin layer, 4a is a front side window, and 4b is a back side window. Thus, if there is a displacement between the front and back windows 4a and 4b, as shown in (b), a part of the hole after laser irradiation, or in the worst case, the whole is covered with the back metal layer 2. As a result, the opening becomes defective.
[0006]
In order to improve such an opening defect due to the window misalignment, a method of eliminating the opening defect by making the front-side window into which the laser beam is incident wider than the back-side window is generally used (see, for example, Patent Document 1). ).
[Patent Document 1]
JP 2000-277911 (paragraph 29, FIG. 1)
[0007]
[Problems to be solved by the invention]
FIG. 2 shows an example in which the front side window is widened. (A) is a cross-sectional view before irradiating a laser beam, (b) is after irradiating the laser beam, and (c) is a cross-sectional view after the plating film is formed. 1 is a front side metal layer (copper foil), 2 is a back side metal layer (copper foil), 3 is an insulating resin layer, 4a is a front side window, 4b is a back side window, and 5 is a plating layer. As can be seen from (b) and (c), when the front window 4a is made wide in this way, the back metal layer 2 is exposed and the plating layer 5 can be widely contacted, which is advantageous for electrical conduction. The diameter of the hole is matched with the diameter of the wide front side window 4a and becomes wide. Accordingly, the wiring width of the printed circuit board and the diameter of the electrode pad must be designed in accordance with the diameter of the wide front side window 4a, which hinders improvement in mounting density.
[0008]
An object of the present invention is to solve the above-described problems of the prior art.
[0009]
[Means for Solving the Problems]
In a laser drilling method in which a window is opened in both metal layers of a substrate having a metal layer on the front side and the back side of the insulating resin layer, and a through hole is formed in the insulating resin layer by irradiating laser light from the front side, the metal layer on the back side It is preferable to use a laser drilling method characterized in that the aperture of the window to be opened is made larger by a manufacturing tolerance than the aperture of the front metal layer.
[0010]
In contrast to the conventional method, by widening the window on the back side, the hole diameter to be formed can be reduced, and the mounting density of the printed circuit board can be improved.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows a laser drilling method according to the present invention. (A) is a cross-sectional view before irradiating a laser beam, (b) is after irradiating the laser beam, and (c) is a cross-sectional view after the plating film is formed. 1 is a front metal layer (copper foil, etc.), 2 is a back metal layer (copper foil, etc.), 3 is an insulating resin layer (epoxy resin with glass fiber, etc.), 4a is a front side window, 4b is a back side window, 5 is a plating layer It is.
[0012]
The general thickness of the printed circuit board is 18 μm for the copper foil and 100 μm for the insulating resin layer. As the laser light, carbon dioxide laser light (9.3 to 10.6 μm) was used, but it can be similarly applied to laser light having a wavelength such as visible light where the metal layer cannot be ablated.
[0013]
The diameter of the back side window 4b is set to be larger than the diameter of the front side window 4a by a deviation (manufacturing tolerance) of the center position of the front and back windows. In this example, since the manufacturing tolerance of the window is about 60 μm, the diameter of the back window 4b is set to 125 μm with respect to the diameter of the front window 4a of 60 μm. Thereby, even if the laser beam is irradiated from the front side, a through hole having a small diameter of the front side window 4 a is formed, and the hole is not blocked by the back side metal layer 2.
[0014]
Further, as can be seen from (c), when the plating layer 5 is formed in the subsequent plating step, a step corresponding to the thickness of the metal layer 2 occurs on the back side, but the processed hole diameter (= front side window) The diameter of 4a is processed almost as designed. This is because the hole diameter can be reduced, so that the wiring density of the printed circuit board can be improved.
[0015]
Here, when it is desired to reduce the level difference corresponding to the thickness of the metal layer 2 that can be formed on the back side, it is preferable to perform an etching process before the plating process and then perform the plating after making the metal layer slightly thinner.
[0016]
【The invention's effect】
In the laser drilling method according to the present invention, a window is formed in both side metal layers of a substrate having a metal layer on the front side and back side of the insulating resin layer, and a through hole is formed in the insulating resin layer by irradiating laser light from the front side. Since the hole diameter can be reduced, the mounting density of the printed circuit board can be improved.
[Brief description of the drawings]
FIG. 1 is a sectional view showing a laser drilling method according to the present invention.
FIG. 2 is a sectional view showing a conventional general laser drilling method.
FIG. 3 is a cross-sectional view showing a defective opening due to a positional shift between front and back windows.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Front side metal layer 2 ... Back side metal layer 3 ... Insulating resin layer 4a ... Front side window 4b ... Back side window 5 ... Plating layer

Claims (1)

絶縁樹脂層の表側と裏側に金属層を有する基板の両側金属層にウインドウを開け、表側よりレーザ光を照射して絶縁樹脂層に貫通孔を加工するレーザ穴あけ加工方法において、裏側の金属層に開けるウインドウの口径を表側の金属層に開ける口径よりも製造公差分程度だけ大きくすることを特徴とするレーザ穴あけ加工方法。In the laser drilling method in which a window is opened on both metal layers of a substrate having a metal layer on the front side and the back side of the insulating resin layer, and through holes are formed in the insulating resin layer by irradiating laser light from the front side, A laser drilling method characterized in that a diameter of a window to be opened is made larger by a manufacturing tolerance than a diameter to be opened in a front metal layer.
JP2003116982A 2003-04-22 2003-04-22 Laser drilling method Expired - Fee Related JP4160439B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003116982A JP4160439B2 (en) 2003-04-22 2003-04-22 Laser drilling method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003116982A JP4160439B2 (en) 2003-04-22 2003-04-22 Laser drilling method

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JP2004327532A JP2004327532A (en) 2004-11-18
JP4160439B2 true JP4160439B2 (en) 2008-10-01

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101107067B1 (en) * 2009-10-27 2012-01-30 삼성전기주식회사 Method for processing cavity of core substrate
TWI418272B (en) 2009-08-25 2013-12-01 Samsung Electro Mech Method of processing a cavity of core substrate
JP6711229B2 (en) 2016-09-30 2020-06-17 日亜化学工業株式会社 Printed circuit board manufacturing method and light emitting device manufacturing method
JP7054021B2 (en) * 2020-05-28 2022-04-13 日亜化学工業株式会社 Printed circuit boards and light emitting devices and their manufacturing methods

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