JP4159556B2 - 半導体装置の製造方法及び接着剤 - Google Patents
半導体装置の製造方法及び接着剤 Download PDFInfo
- Publication number
- JP4159556B2 JP4159556B2 JP2005024152A JP2005024152A JP4159556B2 JP 4159556 B2 JP4159556 B2 JP 4159556B2 JP 2005024152 A JP2005024152 A JP 2005024152A JP 2005024152 A JP2005024152 A JP 2005024152A JP 4159556 B2 JP4159556 B2 JP 4159556B2
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- JP
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- Prior art keywords
- adhesive
- solder
- circuit board
- curing
- semiconductor device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83194—Lateral distribution of the layer connectors
Description
(第1実施の形態)
図1は、第1実施の形態に係る半導体装置の製造方法の工程を示す図であり、図1(a)は接着剤塗布工程を表し、図1(b)は接合工程を表し、図1(c)は後硬化工程を表している。
図2は、第2実施の形態に係る半導体装置の製造方法の工程を示す図であり、図2(a)は接着剤塗布工程を表し、図2(b)は接合工程を表し、図2(c)は後硬化工程を表している。
(実施例1)
実施例1は、上述した第1実施の形態に即したものである。第1接着剤8a及び第2接着剤8bに用いた材料は、エポキシ主剤であるEXA830LVP(ビスフェノールF型エポキシ:大日本インキ化学工業(株))、酸無水物系硬化剤であるKRM291−5(メチルテトラヒドロフラル酸無水物(MTHPA))、イミダゾール系硬化剤であるC11Z(四国化成(株))、硬化促進剤である1M2EZ(四国化成(株))、カップリング剤であるKBM403(信越化学工業(株))を含んでおり、シリカフィラとしては平均粒径1.5μmのものを使用した。第1接着剤8a及び第2接着剤8bの具体的な組成を下記表1に示す。第1接着剤8aは硬化速度が遅い樹脂組成(組成1)を有し、第2接着剤8bは硬化速度が速い樹脂組成(組成2)を有する。
組成2を有する接着剤を回路基板の全域に塗布する以外は、実施例1と同様の条件にて、比較例としての20個の接合サンプルを作製した。
実施例2は、上述した第2実施の形態に即したものである。使用した接着剤18の具体的な樹脂組成(組成3)を下記表2に示す。
2 はんだ
3 回路基板
4 電極
5 バンプ
6 半導体素子
7 ボンディング用ヘッド
8a 第1接着剤
8b 第2接着剤
9 はんだレジスト
10a 第1硬化剤
10b 第2硬化剤
18 接着剤
Claims (3)
- 電極にはんだが形成された回路基板に接着剤を塗布し、電極にバンプが設けられた半導体素子を、前記接着剤が塗布された前記回路基板に被せ、前記はんだと前記バンプとを接合させることにより前記回路基板と前記半導体素子とを電気的に接続させて半導体装置を製造する方法において、前記はんだの形成領域に接する近傍領域に第1接着剤を塗布し、前記はんだが形成されていない回路基板上の他の領域に前記第1接着剤より硬化速度が速い第2接着剤を塗布し、接合後に、前記はんだの形成領域近傍の前記第1接着剤が未硬化であって、前記他の領域の前記第2接着剤が硬化している状態を得、その後、前記はんだと前記バンプとを接合させた際の温度よりも低い温度で前記第1接着剤を硬化させることを特徴とする半導体装置の製造方法。
- 電極にはんだが形成された回路基板に接着剤を塗布し、電極にバンプが設けられた半導体素子を、前記接着剤が塗布された前記回路基板に被せ、前記はんだと前記バンプとを接合させることにより前記回路基板と前記半導体素子とを電気的に接続させて半導体装置を製造する方法において、前記はんだが形成されていない前記回路基板上にはんだレジストを設けてあり、前記接着剤として、硬化速度が異なる複数種の硬化剤を含有した接着剤を使用し、硬化速度が速い方の硬化剤の粒径は、硬化速度が遅い方の硬化剤の粒径より大きく、硬化速度が速い方の硬化剤の粒径は、前記はんだレジスト及び前記半導体素子の間隔より大きく、前記回路基板及び前記半導体素子の間隔より小さいことを特徴とする半導体装置の製造方法。
- 請求項2記載の半導体装置の製造方法に使用する接着剤であって、固形硬化剤をマイクロカプセルで被覆しているものを含むことを特徴とする接着剤。
Priority Applications (1)
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JP2005024152A JP4159556B2 (ja) | 2005-01-31 | 2005-01-31 | 半導体装置の製造方法及び接着剤 |
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JP2005024152A JP4159556B2 (ja) | 2005-01-31 | 2005-01-31 | 半導体装置の製造方法及び接着剤 |
Publications (2)
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JP2006210842A JP2006210842A (ja) | 2006-08-10 |
JP4159556B2 true JP4159556B2 (ja) | 2008-10-01 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4768546B2 (ja) * | 2006-08-16 | 2011-09-07 | 富士通株式会社 | 半導体装置の製造方法 |
JP4790587B2 (ja) * | 2006-12-20 | 2011-10-12 | 日本メクトロン株式会社 | ノーフローアンダーフィルによるフリップチップ実装方法 |
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