JP4141257B2 - 触媒 - Google Patents
触媒 Download PDFInfo
- Publication number
- JP4141257B2 JP4141257B2 JP2002565710A JP2002565710A JP4141257B2 JP 4141257 B2 JP4141257 B2 JP 4141257B2 JP 2002565710 A JP2002565710 A JP 2002565710A JP 2002565710 A JP2002565710 A JP 2002565710A JP 4141257 B2 JP4141257 B2 JP 4141257B2
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- JP
- Japan
- Prior art keywords
- reaction
- organofunctional
- ligand
- silica
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000003054 catalyst Substances 0.000 title claims abstract description 43
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 183
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 90
- 239000003446 ligand Substances 0.000 claims abstract description 81
- 125000000524 functional group Chemical group 0.000 claims abstract description 61
- -1 alkyl silicate Chemical compound 0.000 claims abstract description 38
- 238000006243 chemical reaction Methods 0.000 claims abstract description 37
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910000077 silane Inorganic materials 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 23
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 22
- 238000006460 hydrolysis reaction Methods 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 15
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 239000011148 porous material Substances 0.000 claims description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- 150000008064 anhydrides Chemical group 0.000 claims description 10
- 150000002825 nitriles Chemical group 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 150000001408 amides Chemical class 0.000 claims description 8
- 150000004820 halides Chemical group 0.000 claims description 8
- 150000003949 imides Chemical class 0.000 claims description 8
- 150000002466 imines Chemical class 0.000 claims description 8
- 125000005641 methacryl group Chemical group 0.000 claims description 8
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical group [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 claims description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 8
- 229920002554 vinyl polymer Chemical group 0.000 claims description 8
- 150000001412 amines Chemical class 0.000 claims description 7
- 125000000732 arylene group Chemical group 0.000 claims description 7
- 238000005984 hydrogenation reaction Methods 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- 229910052703 rhodium Inorganic materials 0.000 claims description 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 5
- RSPCKAHMRANGJZ-UHFFFAOYSA-N thiohydroxylamine Chemical compound SN RSPCKAHMRANGJZ-UHFFFAOYSA-N 0.000 claims description 5
- 238000010485 C−C bond formation reaction Methods 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 238000006735 epoxidation reaction Methods 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 125000005842 heteroatom Chemical group 0.000 claims description 4
- 150000002736 metal compounds Chemical class 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 4
- 239000011574 phosphorus Chemical group 0.000 claims description 4
- 238000006722 reduction reaction Methods 0.000 claims description 4
- 238000007142 ring opening reaction Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 229910052717 sulfur Chemical group 0.000 claims description 4
- 239000011593 sulfur Chemical group 0.000 claims description 4
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 3
- 238000005821 Claisen rearrangement reaction Methods 0.000 claims description 3
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 238000006352 cycloaddition reaction Methods 0.000 claims description 3
- 238000005906 dihydroxylation reaction Methods 0.000 claims description 3
- 238000006077 hetero Diels-Alder cycloaddition reaction Methods 0.000 claims description 3
- 238000005913 hydroamination reaction Methods 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 238000005649 metathesis reaction Methods 0.000 claims description 3
- SPIGUVVOJXSWNX-UHFFFAOYSA-N n-(oxomethylidene)thiohydroxylamine Chemical compound SN=C=O SPIGUVVOJXSWNX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 238000006462 rearrangement reaction Methods 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 238000006596 Alder-ene reaction Methods 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- 229910052706 scandium Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052713 technetium Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 150000002118 epoxides Chemical group 0.000 claims 4
- 150000002367 halogens Chemical class 0.000 claims 3
- 238000005935 nucleophilic addition reaction Methods 0.000 claims 2
- 239000011541 reaction mixture Substances 0.000 abstract description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 30
- 239000000203 mixture Substances 0.000 description 30
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- 239000007787 solid Substances 0.000 description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 150000004756 silanes Chemical class 0.000 description 17
- 239000002904 solvent Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 7
- 239000010948 rhodium Substances 0.000 description 7
- 150000002924 oxiranes Chemical group 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 239000002815 homogeneous catalyst Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 4
- 238000007341 Heck reaction Methods 0.000 description 4
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 4
- 239000012038 nucleophile Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000000638 solvent extraction Methods 0.000 description 4
- VGIURMCNTDVGJM-UHFFFAOYSA-N 4-triethoxysilylbutanenitrile Chemical compound CCO[Si](OCC)(OCC)CCCC#N VGIURMCNTDVGJM-UHFFFAOYSA-N 0.000 description 3
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 3
- 0 CC1C2(C)*1C2C1(C2)C3C2CCCC13 Chemical compound CC1C2(C)*1C2C1(C2)C3C2CCCC13 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 230000003100 immobilizing effect Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 3
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 3
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 3
- BDNKZNFMNDZQMI-UHFFFAOYSA-N 1,3-diisopropylcarbodiimide Chemical compound CC(C)N=C=NC(C)C BDNKZNFMNDZQMI-UHFFFAOYSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical group CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 2
- GBQYMXVQHATSCC-UHFFFAOYSA-N 3-triethoxysilylpropanenitrile Chemical compound CCO[Si](OCC)(OCC)CCC#N GBQYMXVQHATSCC-UHFFFAOYSA-N 0.000 description 2
- WBIZZNFQJPOKDK-UHFFFAOYSA-N 4-hydroxy-2-methoxybenzaldehyde Chemical compound COC1=CC(O)=CC=C1C=O WBIZZNFQJPOKDK-UHFFFAOYSA-N 0.000 description 2
- OMPGKWICGUBROA-UHFFFAOYSA-N 4-sulfamoylbutanoic acid Chemical compound NS(=O)(=O)CCCC(O)=O OMPGKWICGUBROA-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001343 alkyl silanes Chemical class 0.000 description 2
- 238000010640 amide synthesis reaction Methods 0.000 description 2
- 229920000469 amphiphilic block copolymer Polymers 0.000 description 2
- PFKFTWBEEFSNDU-UHFFFAOYSA-N carbonyldiimidazole Chemical compound C1=CN=CN1C(=O)N1C=CN=C1 PFKFTWBEEFSNDU-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- BGRWYRAHAFMIBJ-UHFFFAOYSA-N diisopropylcarbodiimide Natural products CC(C)NC(=O)NC(C)C BGRWYRAHAFMIBJ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000006713 insertion reaction Methods 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 229920001983 poloxamer Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 150000003335 secondary amines Chemical group 0.000 description 2
- 239000011877 solvent mixture Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- LYXHWHHENVLYCN-QMDOQEJBSA-N (1z,5z)-cycloocta-1,5-diene;rhodium;tetrafluoroborate Chemical compound [Rh].F[B-](F)(F)F.C\1C\C=C/CC\C=C/1.C\1C\C=C/CC\C=C/1 LYXHWHHENVLYCN-QMDOQEJBSA-N 0.000 description 1
- QEHRETCJMLQPCR-UHFFFAOYSA-N (2,4-dimethoxyphenyl)-(4-hydroxyphenyl)methanone Chemical compound COC1=CC(OC)=CC=C1C(=O)C1=CC=C(O)C=C1 QEHRETCJMLQPCR-UHFFFAOYSA-N 0.000 description 1
- WZEYZMKZKQPXSX-UHFFFAOYSA-N 1,3,5-trimethylbenzene Chemical group CC1=CC(C)=CC(C)=C1.CC1=CC(C)=CC(C)=C1 WZEYZMKZKQPXSX-UHFFFAOYSA-N 0.000 description 1
- WYECURVXVYPVAT-UHFFFAOYSA-N 1-(4-bromophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Br)C=C1 WYECURVXVYPVAT-UHFFFAOYSA-N 0.000 description 1
- IGSGJMNWNNQRFJ-BQYQJAHWSA-N 1-[4-[(e)-2-phenylethenyl]phenyl]ethanone Chemical compound C1=CC(C(=O)C)=CC=C1\C=C\C1=CC=CC=C1 IGSGJMNWNNQRFJ-BQYQJAHWSA-N 0.000 description 1
- IMMCAKJISYGPDQ-UHFFFAOYSA-N 1-chloro-9,10-bis(phenylethynyl)anthracene Chemical compound C12=CC=CC=C2C(C#CC=2C=CC=CC=2)=C2C(Cl)=CC=CC2=C1C#CC1=CC=CC=C1 IMMCAKJISYGPDQ-UHFFFAOYSA-N 0.000 description 1
- ZUUGBTJTGRTIFK-UHFFFAOYSA-N 2-(3-formylindol-1-yl)acetic acid Chemical compound C1=CC=C2N(CC(=O)O)C=C(C=O)C2=C1 ZUUGBTJTGRTIFK-UHFFFAOYSA-N 0.000 description 1
- VEUMANXWQDHAJV-UHFFFAOYSA-N 2-[2-[(2-hydroxyphenyl)methylideneamino]ethyliminomethyl]phenol Chemical compound OC1=CC=CC=C1C=NCCN=CC1=CC=CC=C1O VEUMANXWQDHAJV-UHFFFAOYSA-N 0.000 description 1
- SQLRCYTWVMDUBW-UHFFFAOYSA-N 2-[4-(2-bromopropanoyl)phenoxy]acetic acid Chemical compound CC(Br)C(=O)C1=CC=C(OCC(O)=O)C=C1 SQLRCYTWVMDUBW-UHFFFAOYSA-N 0.000 description 1
- VUCNQOPCYRJCGQ-UHFFFAOYSA-N 2-[4-(hydroxymethyl)phenoxy]acetic acid Chemical compound OCC1=CC=C(OCC(O)=O)C=C1 VUCNQOPCYRJCGQ-UHFFFAOYSA-N 0.000 description 1
- XCJHDJAODLKGLG-UHFFFAOYSA-N 3-Hydroxyxanthone Natural products C1=CC=C2C(=O)C3=CC=C(O)C=C3OC2=C1 XCJHDJAODLKGLG-UHFFFAOYSA-N 0.000 description 1
- HVFRAEFTEATQMD-UHFFFAOYSA-N 3-hydroxyxanthen-9-one Chemical compound OC=1C=CC=2C(C3=CC=CC=C3OC2C1)=O.OC=1C=CC=2C(C3=CC=CC=C3OC2C1)=O HVFRAEFTEATQMD-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- MYBBGZZXDFIZGU-UHFFFAOYSA-N 355017-64-0 Chemical compound COC1=CC(CO)=C([N+]([O-])=O)C=C1OCCCC(O)=O MYBBGZZXDFIZGU-UHFFFAOYSA-N 0.000 description 1
- RHQAFYIBBWZTOI-UHFFFAOYSA-N 4-(4-formyl-3-methoxyphenoxy)butanoic acid Chemical compound COC1=CC(OCCCC(O)=O)=CC=C1C=O RHQAFYIBBWZTOI-UHFFFAOYSA-N 0.000 description 1
- DUIJUTBRRZCWRD-UHFFFAOYSA-N 4-[4-(1-hydroxyethyl)-2-methoxy-5-nitrophenoxy]butanoic acid Chemical compound COC1=CC(C(C)O)=C([N+]([O-])=O)C=C1OCCCC(O)=O DUIJUTBRRZCWRD-UHFFFAOYSA-N 0.000 description 1
- REZPKIYULADRRP-UHFFFAOYSA-N 4-[4-(2,4-dimethoxybenzoyl)phenoxy]butanoic acid Chemical compound COC1=CC(OC)=CC=C1C(=O)C1=CC=C(OCCCC(O)=O)C=C1 REZPKIYULADRRP-UHFFFAOYSA-N 0.000 description 1
- HXOYWJCDYVODON-UHFFFAOYSA-N 4-[4-(hydroxymethyl)-3-methoxyphenoxy]butanoic acid Chemical compound COC1=CC(OCCCC(O)=O)=CC=C1CO HXOYWJCDYVODON-UHFFFAOYSA-N 0.000 description 1
- HZWPJAZIRZFCGX-UHFFFAOYSA-N 4-hydroxy-2,6-dimethoxybenzaldehyde Chemical compound COC1=CC(O)=CC(OC)=C1C=O HZWPJAZIRZFCGX-UHFFFAOYSA-N 0.000 description 1
- HBAQYPYDRFILMT-UHFFFAOYSA-N 8-[3-(1-cyclopropylpyrazol-4-yl)-1H-pyrazolo[4,3-d]pyrimidin-5-yl]-3-methyl-3,8-diazabicyclo[3.2.1]octan-2-one Chemical class C1(CC1)N1N=CC(=C1)C1=NNC2=C1N=C(N=C2)N1C2C(N(CC1CC2)C)=O HBAQYPYDRFILMT-UHFFFAOYSA-N 0.000 description 1
- RWQUWTMOHXGTNN-UHFFFAOYSA-N 9-n,10-n-bis(4-butylphenyl)-9-n,10-n-bis(4-methylphenyl)phenanthrene-9,10-diamine Chemical compound C1=CC(CCCC)=CC=C1N(C=1C2=CC=CC=C2C2=CC=CC=C2C=1N(C=1C=CC(C)=CC=1)C=1C=CC(CCCC)=CC=1)C1=CC=C(C)C=C1 RWQUWTMOHXGTNN-UHFFFAOYSA-N 0.000 description 1
- IWBGLTBRMXKFPO-UHFFFAOYSA-N COC(C(=C)CC(=O)OC)=O.COC(C(=C)CC(=O)OC)=O Chemical compound COC(C(=C)CC(=O)OC)=O.COC(C(=C)CC(=O)OC)=O IWBGLTBRMXKFPO-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000006969 Curtius rearrangement reaction Methods 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000002262 Schiff base Substances 0.000 description 1
- 150000004753 Schiff bases Chemical class 0.000 description 1
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- 238000009876 asymmetric hydrogenation reaction Methods 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
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- 229920001400 block copolymer Polymers 0.000 description 1
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- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012018 catalyst precursor Substances 0.000 description 1
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- SXPWTBGAZSPLHA-UHFFFAOYSA-M cetalkonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 SXPWTBGAZSPLHA-UHFFFAOYSA-M 0.000 description 1
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- 150000003983 crown ethers Chemical class 0.000 description 1
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- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 description 1
- ZWWQRMFIZFPUAA-UHFFFAOYSA-N dimethyl 2-methylidenebutanedioate Chemical compound COC(=O)CC(=C)C(=O)OC ZWWQRMFIZFPUAA-UHFFFAOYSA-N 0.000 description 1
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- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
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- WJLUBOLDZCQZEV-UHFFFAOYSA-M hexadecyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CCCCCCCCCCCCCCCC[N+](C)(C)C WJLUBOLDZCQZEV-UHFFFAOYSA-M 0.000 description 1
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
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- 238000007254 oxidation reaction Methods 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 239000012450 pharmaceutical intermediate Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
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- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000007420 reactivation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
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- 238000000926 separation method Methods 0.000 description 1
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
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- COBXDAOIDYGHGK-UHFFFAOYSA-N syringaldehyde Natural products COC1=CC=C(C=O)C(OC)=C1O COBXDAOIDYGHGK-UHFFFAOYSA-N 0.000 description 1
- 229940095070 tetrapropyl orthosilicate Drugs 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- FBEVECUEMUUFKM-UHFFFAOYSA-M tetrapropylazanium;chloride Chemical compound [Cl-].CCC[N+](CCC)(CCC)CCC FBEVECUEMUUFKM-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- JLLXKXPQWWPOMA-UHFFFAOYSA-N trichloro(decan-4-yl)silane Chemical compound CCCCCCC([Si](Cl)(Cl)Cl)CCC JLLXKXPQWWPOMA-UHFFFAOYSA-N 0.000 description 1
- BNCXNUWGWUZTCN-UHFFFAOYSA-N trichloro(dodecyl)silane Chemical compound CCCCCCCCCCCC[Si](Cl)(Cl)Cl BNCXNUWGWUZTCN-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
Classifications
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- B01J2231/42—Catalytic cross-coupling, i.e. connection of previously not connected C-atoms or C- and X-atoms without rearrangement
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Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
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- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明によれば、有機官能シリカとこの有機官能シリカと反応できる官能基を有する配位子との反応生成物を含む繋がれた配位子が提供され、ここで前記有機官能シリカはケイ酸アルキルと有機官能シランから調製される。
a) 選択的に鋳型化合物の存在下で、ケイ酸アルキル、有機官能シランおよび水の反応によって有機官能シリカを生成させ、
b) 存在する場合、前記鋳型化合物を除去し、そして
c) 前記有機官能シリカと反応できる官能基を有する配位子と前記有機官能シリカを反応させる、
以上の工程を含む、繋がれた配位子を調製する方法が提供される。
a) 選択的に鋳型化合物の存在下で、ケイ酸アルキル、有機官能シランおよび水の反応によって有機官能シリカを生成させ、
b) 存在する場合、前記鋳型化合物を除去し、
c) 前記有機官能シリカと反応できる官能基を有する配位子と前記有機官能シリカを反応させて、繋がれた配位子を調製し、そして
d) 金属化合物と前記繋がれた配位子との間の化学反応を実施する、
以上の工程を含む、担持された触媒の調製方法が提供される。
Yはハロゲンまたは1〜3個の炭素原子を有するアルコキシ基であり、
Zはアルキレン、アリーレンまたはアルキル−アリーレン基であって、任意に酸素、窒素、リンまたは硫黄から選択される少なくとも1種のヘテロ原子を含有し、
Xはハロゲン化物、ヒドロキシル、カルボニル、カルボキシル、無水物、カルベン、メタクリル、エポキシド、ビニル、ニトリル、メルカプト、アミン、イミン、アミドおよびイミドから選択される官能基であり、
a=3または2、b=1または2、そしてa+b=4である。
選択的に、例えば、シリカ物質上の官能基の表面濃度を減少させ、そして配位子の固定を改善するために、官能基含有配位子と反応できる官能基を持たないシランが、上述のような有機官能シランと組み合わされて使用されてもよい。このような非官能化シランも、多孔度または細孔寸法のような、生成シリカ物質の他の特性を改良するために使用できる。他の非官能化シランも使用できるが、典型的には、アルキルシランのようなシランが使用できる。使用される官能化シランおよび非官能化シランの分子比率は、官能基を有する配位子を繋ぐ十分な数の反応部位を生成有機官能シリカに与えて、最終触媒中に有用なレベルの触媒活性を形成できる分子比率であれば、どのようなものでもよい。分子比率は、与えられたシラン対に対して、1:99〜99:1、好ましくは、1:9〜9:1の範囲であってもよい。
(a)メソ多孔性(Mesoporous)カルボン酸官能性シリカの調製
エタノール(105ml)、脱イオン水(105ml)およびn‐ドデシルアミン(10g)から成る混合物を調製し、次いで均等になるまで室温で激しく撹拌した。この混合物に、オルトケイ酸テトラエチル(20.4g)および3‐(トリエチオキシシリル)プロピオニトリル(3-(triethyoxysilyl)propionitrile)(23.1g)を段階的に30分間添加し、24時間撹拌を続けた。この時間の後に、沈殿物をろ過し、脱イオン水(500ml)およびエタノール(500ml)で洗浄し、次いで室温で24時間乾燥した。前記固形物をエタノール(200ml)の還流下で3時間加熱することにより、n‐ドデシルアミンの抽出を実施した。この還流を3回繰り返した。次いで、この固形物をろ過し、真空炉内において80℃で一晩中乾燥した。この固形物を50%v/v硫酸水溶液(5g当り150ml)中において120℃まで3時間加熱することによって、ニトリル官能基の加水分解を実施した。この固形物を、真空炉中において80℃で一晩中乾燥する前に、中性のpHが得られるまで、過剰量の脱イオン水でろ過し、そして洗浄した。BET多孔度計でシリカを分析した結果、これは40オングストロームの平均細孔幅を有することが判明した。
メソ多孔性カルボン酸官能性シリカ(0.1g)、bppm(0.05g、0.11ミリモル)および4‐ジメチルアミノピリジン(DMAP)(3.0mg)をジクロロメタン(2.5ml)に入れて撹拌した懸濁液に、ジイソプロピルカルボジイミド(DIC)(17μl、0.11ミリモル)を添加した。生じた懸濁液を一晩中室温で撹拌した。この混合物をろ過し、そして得られた固形物をジクロロメタン(5ml)で洗浄し、メタノール(5ml)で洗浄し、そして再度ジクロロメタン(5ml)で洗浄した。この固形物を真空下で乾燥して、配位子担持シリカを無色の固形物として得た。
配位子担持シリカ(0.1g)および[Rh(cod)2]BF4(44mg、0.1ミリモル)をジクロロメタン(2.5ml)に入れた混合物を窒素の下で1時間撹拌した。次いで、この混合物をろ過し、そして得られた固形物をジクロロメタン(2.5ml)で洗浄し、メタノール(5ml)で洗浄し、そして再度ジクロロメタン(2.5ml)で洗浄した。この固形物を真空下で乾燥して、Rh配位子担持シリカを黄色固形物として得た。配位子(I)の係留および金属(II)の挿入を以下に示す。
下記の手順に従ってイタコン酸ジメチルを水素化した。
実施例1のパート(a)の方法に従って調製された有機官能シリカを、下記の手順に従ってフェロセニル‐ビス(ホスフィン)配位子と反応させた。
酢酸パラジウムと反応した実施例3の繋がれた配位子を用いて、下記の手順に従ってヘック反応を実施した。
ドデシルアミン(10g)、脱イオン水(105ml)および変性(5%MeOH)エタノール(105ml)の混合物を調製し、そして均一になるまで30分間撹拌した。これに、メシチレン(19.5g)を添加し、そして、この濁った生成エマルションを更に30分間撹拌した。その後、4‐トリエトキシシリルブチロニトリル(11.5g)およびプロピルトリメトキシシラン(8.5g)の新しく調製された混合物を連続的に撹拌しながら添加した。更に60分後に、テトラエチルオルトシリケート(20.8g)を上記混合物に添加し、そして生じたスラリーを24時間撹拌した。その後、沈殿物をろ過し、脱イオン水(500ml)およびエタノール(500ml)で洗浄し、次いで、室温で24時間乾燥した。ニトリル官能基の鋳型抽出と加水分解を、実施例1のパート(a)で示されたように実施して、プロピルトリメトキシシランを使用しないで調製されたシリカ物質の窒素量の7.2%に比較して、3.6%の窒素量を有する白色の固体を得た。
Claims (9)
- BET多孔度計で測定したとき20〜500オングストロームの平均細孔幅を有するメソ多孔性有機官能シリカと、この有機官能シリカと反応できる官能基を有するキラルまたは非キラルのモノ−、ビ−、トリ−、またはテトラ−歯状配位子との反応生成物を含む、繋がれた配位子であって、ここで前記有機官能シリカは、
一般式Si ( OR ) 4 のケイ酸アルキル(式中、各Rは同一または異なり、そして1〜4個の炭素原子を有するアルキル基または置換アルキル基である)と、
一般式(Y) a Si ( Z−X ) b の有機官能シラン(式中、Yはハロゲンまたは1〜3個の炭素原子を有するアルコキシ基であり;Zはアルキレン、アリーレンまたはアルキル−アリーレン基であって、任意に酸素、窒素、リンまたは硫黄から選択される少なくとも1種のヘテロ原子を含有し;Xはハロゲン化物、ヒドロキシル、カルボニル、カルボキシル、無水物、カルベン、メタクリル、エポキシド、ビニル、ニトリル、メルカプト、アミン、イミン、アミドおよびイミドから選択される官能基であり;a=3または2、b=1または2、そしてa+b=4である)から調製される、
前記繋がれた配位子。 - 前記有機官能シランは有機官能シランを連結分子と反応させることによって調製され、この連結分子は前記有機官能シランと反応できる官能基および官能基含有配位子と反応できる官能基を含有し、またこの連結分子は、C1〜C10のアルキル、アルコキシ、アルキル−アリール、アリール、フェノキシまたはアニリドの化合物を含む群から選択され、前記化合物は、ハロゲン化物、ヒドロキシル、カルボニル、カルボキシル、無水物、カルベン、メタクリル、エポキシド、ビニル、ニトリル、メルカプト、イソシアネート、アミン、イミン、アミドおよびイミドから選択される官能基を含有する、請求項1記載の繋がれた配位子。
- 前記有機官能シリカは、ケイ酸アルキルと、有機官能シランと、官能基含有配位子と反応できる官能基を持たないシランと、から調製される、請求項1記載の繋がれた配位子。
- 前記有機官能シリカの官能基は、前記有機官能シリカと前記官能基含有配位子との反応が行われる前に化学変換によって変化する、請求項1記載の繋がれた配位子。
- a)選択的に鋳型化合物の存在下で、
一般式Si ( OR ) 4 のケイ酸アルキル(式中、各Rは同一または異なり、そして1〜4個の炭素原子を有するアルキル基または置換アルキル基である)、
一般式(Y) a Si ( Z−X ) b の有機官能シラン(式中、Yはハロゲンまたは1〜3個の炭素原子を有するアルコキシ基であり;Zはアルキレン、アリーレンまたはアルキル−アリーレン基であって、任意に酸素、窒素、リンまたは硫黄から選択される少なくとも1種のヘテロ原子を含有し;Xはハロゲン化物、ヒドロキシル、カルボニル、カルボキシル、無水物、カルベン、メタクリル、エポキシド、ビニル、ニトリル、メルカプト、アミン、イミン、アミドおよびイミドから選択される官能基であり;a=3または2、b=1または2、そしてa+b=4である)、および
水、の反応によって有機官能シリカを生成させ、
b)存在する場合、前記鋳型化合物を除去し、そして
c)前記有機官能シリカと反応できる官能基を有するキラルまたは非キラルのモノ−、ビ−、トリ−、またはテトラ−歯状配位子と前記有機官能シリカを反応させる、
以上の工程を含む、繋がれた配位子を調製する方法。 - 請求項1〜4いずれかに記載の繋がれた配位子と触媒的に活性な金属の供給源との反応生成物を含む担持された触媒。
- 前記触媒的に活性な金属はSc、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Mn、Tc、Re、Fe、Ru、Co、Rh、Ir、Ni、Pd、Pt、Cu、Ag、Al、Ge、SbおよびSnを含む群から選択される、請求項6記載の触媒。
- a)選択的に鋳型化合物の存在下で
一般式Si ( OR ) 4 のケイ酸アルキル(式中、各Rは同一または異なり、そして1〜4個の炭素原子を有するアルキル基または置換アルキル基である)、
一般式(Y) a Si ( Z−X ) b の有機官能シラン(式中、Yはハロゲンまたは1〜3個の炭素原子を有するアルコキシ基であり;Zはアルキレン、アリーレンまたはアルキル−アリーレン基であって、任意に酸素、窒素、リンまたは硫黄から選択される少なくとも1種のヘテロ原子を含有し;Xはハロゲン化物、ヒドロキシル、カルボニル、カルボキシル、無水物、カルベン、メタクリル、エポキシド、ビニル、ニトリル、メルカプト、アミン、イミン、アミドおよびイミドから選択される官能基であり;a=3または2、b=1または2、そしてa+b=4である)、および
水、の反応によって有機官能シリカを生成させ、
b)存在する場合、前記鋳型化合物を除去し、
c)前記有機官能シリカと反応できる官能基を有するキラルまたは非キラルのモノ−、ビ−、トリ−、またはテトラ−歯状配位子と前記有機官能シリカを反応させて、繋がれた配位子を調製し、そして
d)金属化合物と前記繋がれた配位子との間の化学反応を実施する、
以上の工程を含む、担持された触媒の調製方法。 - 水素化反応、ジヒドロキシル化反応、加水分解反応、複分解反応、炭素−炭素結合生成反応、ヒドロアミノ化反応、エポキシ化反応、アジリジン化反応、シクロ付加反応、ヘテロ−ディールス−アルダー反応、ヘテロ−エン反応、クライゼン転位反応、カルボニル還元反応、シグマトロピー転位反応、π−結合への求核剤の付加反応、カルボニル基への求核剤の付加反応、および開環反応のための、請求項8記載の担持された触媒の使用方法。
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US8563459B2 (en) | 2009-05-01 | 2013-10-22 | Gelest Technology, Inc. | Fixed-bed hydrosilylation catalyst complexes and related methods |
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US20050164296A1 (en) | 2005-07-28 |
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