JP4116335B2 - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

Info

Publication number
JP4116335B2
JP4116335B2 JP2002167393A JP2002167393A JP4116335B2 JP 4116335 B2 JP4116335 B2 JP 4116335B2 JP 2002167393 A JP2002167393 A JP 2002167393A JP 2002167393 A JP2002167393 A JP 2002167393A JP 4116335 B2 JP4116335 B2 JP 4116335B2
Authority
JP
Japan
Prior art keywords
group
acid
atom
substituent
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002167393A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004012898A5 (enrdf_load_stackoverflow
JP2004012898A (ja
Inventor
慎一 漢那
一良 水谷
知也 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2002167393A priority Critical patent/JP4116335B2/ja
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to EP04019923A priority patent/EP1480079A3/en
Priority to US10/455,459 priority patent/US7214467B2/en
Priority to EP03012226A priority patent/EP1376232A1/en
Priority to TW092115358A priority patent/TWI284779B/zh
Priority to KR1020030036576A priority patent/KR100945003B1/ko
Publication of JP2004012898A publication Critical patent/JP2004012898A/ja
Publication of JP2004012898A5 publication Critical patent/JP2004012898A5/ja
Application granted granted Critical
Publication of JP4116335B2 publication Critical patent/JP4116335B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002167393A 2002-06-07 2002-06-07 感光性樹脂組成物 Expired - Fee Related JP4116335B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2002167393A JP4116335B2 (ja) 2002-06-07 2002-06-07 感光性樹脂組成物
US10/455,459 US7214467B2 (en) 2002-06-07 2003-06-06 Photosensitive resin composition
EP03012226A EP1376232A1 (en) 2002-06-07 2003-06-06 Photosensitive resin composition
TW092115358A TWI284779B (en) 2002-06-07 2003-06-06 Photosensitive resin composition
EP04019923A EP1480079A3 (en) 2002-06-07 2003-06-06 Photosensitive resin composition
KR1020030036576A KR100945003B1 (ko) 2002-06-07 2003-06-07 감광성 수지 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002167393A JP4116335B2 (ja) 2002-06-07 2002-06-07 感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JP2004012898A JP2004012898A (ja) 2004-01-15
JP2004012898A5 JP2004012898A5 (enrdf_load_stackoverflow) 2005-09-22
JP4116335B2 true JP4116335B2 (ja) 2008-07-09

Family

ID=30434652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002167393A Expired - Fee Related JP4116335B2 (ja) 2002-06-07 2002-06-07 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JP4116335B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009011364A1 (ja) * 2007-07-18 2009-01-22 Asahi Glass Company, Limited 電子線、ｘ線またはｅｕｖ光を用いたリソグラフィー法に用いられるレジスト組成物
JP5846889B2 (ja) * 2011-12-14 2016-01-20 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、化合物
JP2015057376A (ja) * 2013-05-20 2015-03-26 東洋合成工業株式会社 有機塩の合成と精製
JP6706530B2 (ja) * 2016-03-31 2020-06-10 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法
JP7467148B2 (ja) * 2019-02-18 2024-04-15 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法
CN112011008A (zh) * 2019-05-31 2020-12-01 罗门哈斯电子材料有限责任公司 抗蚀剂组合物、其制造方法及包含其的制品
WO2024181177A1 (ja) * 2023-02-28 2024-09-06 日本ゼオン株式会社 共重合体、ポジ型レジスト組成物、およびレジストパターン形成方法

Also Published As

Publication number Publication date
JP2004012898A (ja) 2004-01-15

Similar Documents

Publication Publication Date Title
JP4116340B2 (ja) 感光性樹脂組成物
EP1367440B1 (en) Positive-working resist composition
JP3949479B2 (ja) ポジ型レジスト組成物
JP3909829B2 (ja) ポジ型レジスト組成物
JP4007581B2 (ja) ポジ型レジスト組成物
JP2005070316A (ja) ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4092153B2 (ja) ポジ型レジスト組成物
JP4056345B2 (ja) ポジ型レジスト組成物
JP4018454B2 (ja) ポジ型レジスト組成物
JP4007582B2 (ja) ポジ型レジスト組成物
JP4116335B2 (ja) 感光性樹脂組成物
JP4166598B2 (ja) ポジ型レジスト組成物
JP2003057826A (ja) 感光性樹脂組成物
JP3841400B2 (ja) ポジ型レジスト組成物
JP2005049695A (ja) ポジ型レジスト組成物
JP2004069981A (ja) ポジ型レジスト組成物
JP4073253B2 (ja) ポジ型レジスト組成物
JP2004029542A (ja) ポジ型レジスト組成物
JP4073337B2 (ja) 感光性樹脂組成物
JP2004318045A (ja) ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP3955489B2 (ja) ポジ型レジスト組成物
JP2004302200A (ja) ポジ型レジスト組成物
JP4116339B2 (ja) 感光性樹脂組成物
JP4178007B2 (ja) ポジ型レジスト組成物
JP4084965B2 (ja) ポジ型レジスト組成物

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050413

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050413

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20060324

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20061124

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20071011

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A132

Effective date: 20071107

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20071108

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20071115

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20071122

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071228

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080326

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080417

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110425

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110425

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120425

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130425

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130425

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140425

Year of fee payment: 6

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees