JP4074370B2 - 真空成膜装置 - Google Patents
真空成膜装置 Download PDFInfo
- Publication number
- JP4074370B2 JP4074370B2 JP07895898A JP7895898A JP4074370B2 JP 4074370 B2 JP4074370 B2 JP 4074370B2 JP 07895898 A JP07895898 A JP 07895898A JP 7895898 A JP7895898 A JP 7895898A JP 4074370 B2 JP4074370 B2 JP 4074370B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- electron
- plasma beam
- vacuum
- forming apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Physical Vapour Deposition (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07895898A JP4074370B2 (ja) | 1998-03-26 | 1998-03-26 | 真空成膜装置 |
| TW88112473A TW473553B (en) | 1998-03-26 | 1999-07-22 | Vacuum coating forming device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07895898A JP4074370B2 (ja) | 1998-03-26 | 1998-03-26 | 真空成膜装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11269636A JPH11269636A (ja) | 1999-10-05 |
| JPH11269636A5 JPH11269636A5 (enExample) | 2005-07-21 |
| JP4074370B2 true JP4074370B2 (ja) | 2008-04-09 |
Family
ID=13676413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP07895898A Expired - Lifetime JP4074370B2 (ja) | 1998-03-26 | 1998-03-26 | 真空成膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4074370B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014027508A1 (ja) | 2012-08-15 | 2014-02-20 | 中外炉工業株式会社 | プラズマ処理装置 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4287936B2 (ja) * | 1999-02-01 | 2009-07-01 | 中外炉工業株式会社 | 真空成膜装置 |
| JP5350911B2 (ja) * | 2008-07-31 | 2013-11-27 | キヤノンアネルバ株式会社 | プラズマ発生装置及び成膜装置並びに成膜方法及び表示素子の製造方法 |
-
1998
- 1998-03-26 JP JP07895898A patent/JP4074370B2/ja not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014027508A1 (ja) | 2012-08-15 | 2014-02-20 | 中外炉工業株式会社 | プラズマ処理装置 |
| JP2014037572A (ja) * | 2012-08-15 | 2014-02-27 | Chugai Ro Co Ltd | プラズマ処理装置 |
| US8986458B2 (en) | 2012-08-15 | 2015-03-24 | Chugai Ro Co., Ltd. | Plasma processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11269636A (ja) | 1999-10-05 |
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