JP4073320B2 - ポジ型レジスト組成物 - Google Patents
ポジ型レジスト組成物 Download PDFInfo
- Publication number
- JP4073320B2 JP4073320B2 JP2003012628A JP2003012628A JP4073320B2 JP 4073320 B2 JP4073320 B2 JP 4073320B2 JP 2003012628 A JP2003012628 A JP 2003012628A JP 2003012628 A JP2003012628 A JP 2003012628A JP 4073320 B2 JP4073320 B2 JP 4073320B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- acid
- alkyl
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Materials For Photolithography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003012628A JP4073320B2 (ja) | 2003-01-21 | 2003-01-21 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003012628A JP4073320B2 (ja) | 2003-01-21 | 2003-01-21 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004226559A JP2004226559A (ja) | 2004-08-12 |
| JP2004226559A5 JP2004226559A5 (enExample) | 2005-09-22 |
| JP4073320B2 true JP4073320B2 (ja) | 2008-04-09 |
Family
ID=32901181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003012628A Expired - Fee Related JP4073320B2 (ja) | 2003-01-21 | 2003-01-21 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4073320B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4774302B2 (ja) * | 2005-01-24 | 2011-09-14 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| TWI530759B (zh) * | 2005-01-24 | 2016-04-21 | 富士軟片股份有限公司 | 適用於浸漬曝光之正型光阻組成物及使用它之圖案形成方法 |
| JP5140329B2 (ja) * | 2007-06-08 | 2013-02-06 | 富士フイルム株式会社 | レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
| JP5572643B2 (ja) * | 2012-01-23 | 2014-08-13 | 富士フイルム株式会社 | レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
-
2003
- 2003-01-21 JP JP2003012628A patent/JP4073320B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004226559A (ja) | 2004-08-12 |
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