JP4073320B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4073320B2
JP4073320B2 JP2003012628A JP2003012628A JP4073320B2 JP 4073320 B2 JP4073320 B2 JP 4073320B2 JP 2003012628 A JP2003012628 A JP 2003012628A JP 2003012628 A JP2003012628 A JP 2003012628A JP 4073320 B2 JP4073320 B2 JP 4073320B2
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Japan
Prior art keywords
group
resin
acid
alkyl
atom
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JP2003012628A
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Japanese (ja)
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JP2004226559A5 (enExample
JP2004226559A (ja
Inventor
一良 水谷
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2003012628A priority Critical patent/JP4073320B2/ja
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JP2003012628A 2003-01-21 2003-01-21 ポジ型レジスト組成物 Expired - Fee Related JP4073320B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003012628A JP4073320B2 (ja) 2003-01-21 2003-01-21 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003012628A JP4073320B2 (ja) 2003-01-21 2003-01-21 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004226559A JP2004226559A (ja) 2004-08-12
JP2004226559A5 JP2004226559A5 (enExample) 2005-09-22
JP4073320B2 true JP4073320B2 (ja) 2008-04-09

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ID=32901181

Family Applications (1)

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JP2003012628A Expired - Fee Related JP4073320B2 (ja) 2003-01-21 2003-01-21 ポジ型レジスト組成物

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JP (1) JP4073320B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4774302B2 (ja) * 2005-01-24 2011-09-14 富士フイルム株式会社 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
TWI530759B (zh) * 2005-01-24 2016-04-21 富士軟片股份有限公司 適用於浸漬曝光之正型光阻組成物及使用它之圖案形成方法
JP5140329B2 (ja) * 2007-06-08 2013-02-06 富士フイルム株式会社 レジスト組成物及び該レジスト組成物を用いたパターン形成方法
JP5572643B2 (ja) * 2012-01-23 2014-08-13 富士フイルム株式会社 レジスト組成物及び該レジスト組成物を用いたパターン形成方法

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Publication number Publication date
JP2004226559A (ja) 2004-08-12

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