JP2004226559A5 - - Google Patents
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- Publication number
- JP2004226559A5 JP2004226559A5 JP2003012628A JP2003012628A JP2004226559A5 JP 2004226559 A5 JP2004226559 A5 JP 2004226559A5 JP 2003012628 A JP2003012628 A JP 2003012628A JP 2003012628 A JP2003012628 A JP 2003012628A JP 2004226559 A5 JP2004226559 A5 JP 2004226559A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- hydrogen atom
- different
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011347 resin Substances 0.000 claims 15
- 229920005989 resin Polymers 0.000 claims 15
- 125000000217 alkyl group Chemical group 0.000 claims 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims 7
- 125000003118 aryl group Chemical group 0.000 claims 6
- 239000002253 acid Substances 0.000 claims 5
- 229910052731 fluorine Inorganic materials 0.000 claims 5
- 125000005843 halogen group Chemical group 0.000 claims 5
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 5
- 125000003710 aryl alkyl group Chemical group 0.000 claims 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims 4
- 125000001153 fluoro group Chemical group F* 0.000 claims 4
- 125000003342 alkenyl group Chemical group 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000002252 acyl group Chemical group 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 2
- 125000004450 alkenylene group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 125000002993 cycloalkylene group Chemical group 0.000 claims 2
- 125000001188 haloalkyl group Chemical group 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000004849 alkoxymethyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- 125000003368 amide group Chemical group 0.000 claims 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims 1
- 150000001721 carbon Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 125000002950 monocyclic group Chemical group 0.000 claims 1
- 125000003367 polycyclic group Chemical group 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 150000008027 tertiary esters Chemical class 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003012628A JP4073320B2 (ja) | 2003-01-21 | 2003-01-21 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003012628A JP4073320B2 (ja) | 2003-01-21 | 2003-01-21 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004226559A JP2004226559A (ja) | 2004-08-12 |
| JP2004226559A5 true JP2004226559A5 (enExample) | 2005-09-22 |
| JP4073320B2 JP4073320B2 (ja) | 2008-04-09 |
Family
ID=32901181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003012628A Expired - Fee Related JP4073320B2 (ja) | 2003-01-21 | 2003-01-21 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4073320B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4774302B2 (ja) * | 2005-01-24 | 2011-09-14 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| TWI530759B (zh) * | 2005-01-24 | 2016-04-21 | 富士軟片股份有限公司 | 適用於浸漬曝光之正型光阻組成物及使用它之圖案形成方法 |
| JP5140329B2 (ja) * | 2007-06-08 | 2013-02-06 | 富士フイルム株式会社 | レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
| JP5572643B2 (ja) * | 2012-01-23 | 2014-08-13 | 富士フイルム株式会社 | レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
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2003
- 2003-01-21 JP JP2003012628A patent/JP4073320B2/ja not_active Expired - Fee Related