JP4073253B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4073253B2
JP4073253B2 JP2002158821A JP2002158821A JP4073253B2 JP 4073253 B2 JP4073253 B2 JP 4073253B2 JP 2002158821 A JP2002158821 A JP 2002158821A JP 2002158821 A JP2002158821 A JP 2002158821A JP 4073253 B2 JP4073253 B2 JP 4073253B2
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JP
Japan
Prior art keywords
group
acid
atom
hydrogen atom
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002158821A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004004226A (ja
JP2004004226A5 (enExample
Inventor
一良 水谷
慎一 漢那
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002158821A priority Critical patent/JP4073253B2/ja
Priority to US10/448,041 priority patent/US6939662B2/en
Priority to KR1020030034881A priority patent/KR100955454B1/ko
Priority to EP03012142A priority patent/EP1367440B1/en
Priority to AT03012142T priority patent/ATE525676T1/de
Priority to EP10188666A priority patent/EP2278398A3/en
Priority to EP10188668A priority patent/EP2278400A3/en
Priority to EP10188665A priority patent/EP2278397A3/en
Priority to EP10188667.9A priority patent/EP2278399B1/en
Publication of JP2004004226A publication Critical patent/JP2004004226A/ja
Publication of JP2004004226A5 publication Critical patent/JP2004004226A5/ja
Application granted granted Critical
Publication of JP4073253B2 publication Critical patent/JP4073253B2/ja
Priority to KR1020090108795A priority patent/KR100947853B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002158821A 2002-05-31 2002-05-31 ポジ型レジスト組成物 Expired - Fee Related JP4073253B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2002158821A JP4073253B2 (ja) 2002-05-31 2002-05-31 ポジ型レジスト組成物
KR1020030034881A KR100955454B1 (ko) 2002-05-31 2003-05-30 포지티브 레지스트 조성물
US10/448,041 US6939662B2 (en) 2002-05-31 2003-05-30 Positive-working resist composition
AT03012142T ATE525676T1 (de) 2002-05-31 2003-06-02 Positiv arbeitende resistzusammensetzung
EP10188666A EP2278398A3 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP10188668A EP2278400A3 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP03012142A EP1367440B1 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP10188665A EP2278397A3 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP10188667.9A EP2278399B1 (en) 2002-05-31 2003-06-02 Positive-working resist composition
KR1020090108795A KR100947853B1 (ko) 2002-05-31 2009-11-11 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002158821A JP4073253B2 (ja) 2002-05-31 2002-05-31 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004004226A JP2004004226A (ja) 2004-01-08
JP2004004226A5 JP2004004226A5 (enExample) 2005-09-22
JP4073253B2 true JP4073253B2 (ja) 2008-04-09

Family

ID=30428863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002158821A Expired - Fee Related JP4073253B2 (ja) 2002-05-31 2002-05-31 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4073253B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4079893B2 (ja) * 2004-02-20 2008-04-23 セントラル硝子株式会社 含フッ素環状化合物、含フッ素高分子化合物、それを用いたレジスト材料及びパターン形成方法
ES2392100T3 (es) 2005-06-15 2012-12-04 Nippon Soda Co., Ltd. Polímero de ácido acrílico
JP2008268920A (ja) * 2007-03-28 2008-11-06 Fujifilm Corp ポジ型レジスト組成物およびパターン形成方法
JP5155355B2 (ja) 2010-04-07 2013-03-06 レノボ・シンガポール・プライベート・リミテッド 無線基地局の自律的な負荷調整が可能な無線端末装置
JP6451630B2 (ja) * 2013-07-31 2019-01-16 Jsr株式会社 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物
JP6065942B2 (ja) * 2015-06-12 2017-01-25 信越化学工業株式会社 高分子化合物

Also Published As

Publication number Publication date
JP2004004226A (ja) 2004-01-08

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