JP2004004226A5 - - Google Patents
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- Publication number
- JP2004004226A5 JP2004004226A5 JP2002158821A JP2002158821A JP2004004226A5 JP 2004004226 A5 JP2004004226 A5 JP 2004004226A5 JP 2002158821 A JP2002158821 A JP 2002158821A JP 2002158821 A JP2002158821 A JP 2002158821A JP 2004004226 A5 JP2004004226 A5 JP 2004004226A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- hydrogen atom
- acid
- general formula
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 11
- 239000002253 acid Substances 0.000 claims 6
- 229910052731 fluorine Inorganic materials 0.000 claims 5
- 125000001153 fluoro group Chemical group F* 0.000 claims 5
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002158821A JP4073253B2 (ja) | 2002-05-31 | 2002-05-31 | ポジ型レジスト組成物 |
| KR1020030034881A KR100955454B1 (ko) | 2002-05-31 | 2003-05-30 | 포지티브 레지스트 조성물 |
| US10/448,041 US6939662B2 (en) | 2002-05-31 | 2003-05-30 | Positive-working resist composition |
| AT03012142T ATE525676T1 (de) | 2002-05-31 | 2003-06-02 | Positiv arbeitende resistzusammensetzung |
| EP10188666A EP2278398A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188668A EP2278400A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP03012142A EP1367440B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188665A EP2278397A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188667.9A EP2278399B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| KR1020090108795A KR100947853B1 (ko) | 2002-05-31 | 2009-11-11 | 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002158821A JP4073253B2 (ja) | 2002-05-31 | 2002-05-31 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004004226A JP2004004226A (ja) | 2004-01-08 |
| JP2004004226A5 true JP2004004226A5 (enExample) | 2005-09-22 |
| JP4073253B2 JP4073253B2 (ja) | 2008-04-09 |
Family
ID=30428863
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002158821A Expired - Fee Related JP4073253B2 (ja) | 2002-05-31 | 2002-05-31 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4073253B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4079893B2 (ja) * | 2004-02-20 | 2008-04-23 | セントラル硝子株式会社 | 含フッ素環状化合物、含フッ素高分子化合物、それを用いたレジスト材料及びパターン形成方法 |
| ES2392100T3 (es) | 2005-06-15 | 2012-12-04 | Nippon Soda Co., Ltd. | Polímero de ácido acrílico |
| JP2008268920A (ja) * | 2007-03-28 | 2008-11-06 | Fujifilm Corp | ポジ型レジスト組成物およびパターン形成方法 |
| JP5155355B2 (ja) | 2010-04-07 | 2013-03-06 | レノボ・シンガポール・プライベート・リミテッド | 無線基地局の自律的な負荷調整が可能な無線端末装置 |
| JP6451630B2 (ja) * | 2013-07-31 | 2019-01-16 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物 |
| JP6065942B2 (ja) * | 2015-06-12 | 2017-01-25 | 信越化学工業株式会社 | 高分子化合物 |
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2002
- 2002-05-31 JP JP2002158821A patent/JP4073253B2/ja not_active Expired - Fee Related