JP4066632B2 - 合成石英ガラス光学体およびその製造方法 - Google Patents

合成石英ガラス光学体およびその製造方法 Download PDF

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Publication number
JP4066632B2
JP4066632B2 JP2001309953A JP2001309953A JP4066632B2 JP 4066632 B2 JP4066632 B2 JP 4066632B2 JP 2001309953 A JP2001309953 A JP 2001309953A JP 2001309953 A JP2001309953 A JP 2001309953A JP 4066632 B2 JP4066632 B2 JP 4066632B2
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JP
Japan
Prior art keywords
quartz glass
hydrogen
glass body
synthetic quartz
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001309953A
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English (en)
Japanese (ja)
Other versions
JP2003112933A5 (enExample
JP2003112933A (ja
Inventor
康臣 岩橋
順亮 生田
信也 菊川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP2001309953A priority Critical patent/JP4066632B2/ja
Publication of JP2003112933A publication Critical patent/JP2003112933A/ja
Publication of JP2003112933A5 publication Critical patent/JP2003112933A5/ja
Application granted granted Critical
Publication of JP4066632B2 publication Critical patent/JP4066632B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2001309953A 2001-10-05 2001-10-05 合成石英ガラス光学体およびその製造方法 Expired - Fee Related JP4066632B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001309953A JP4066632B2 (ja) 2001-10-05 2001-10-05 合成石英ガラス光学体およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001309953A JP4066632B2 (ja) 2001-10-05 2001-10-05 合成石英ガラス光学体およびその製造方法

Publications (3)

Publication Number Publication Date
JP2003112933A JP2003112933A (ja) 2003-04-18
JP2003112933A5 JP2003112933A5 (enExample) 2005-06-02
JP4066632B2 true JP4066632B2 (ja) 2008-03-26

Family

ID=19129016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001309953A Expired - Fee Related JP4066632B2 (ja) 2001-10-05 2001-10-05 合成石英ガラス光学体およびその製造方法

Country Status (1)

Country Link
JP (1) JP4066632B2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5106090B2 (ja) * 2007-12-26 2012-12-26 信越石英株式会社 光触媒用シリカガラス及びその製造方法
US8268740B2 (en) * 2008-02-07 2012-09-18 Corning Incorporated Halide free glasses having low OH, OD concentrations
US9067814B2 (en) * 2009-01-19 2015-06-30 Shin-Etsu Chemical Co., Ltd. Method of producing synthetic quartz glass for excimer laser
JP5609050B2 (ja) * 2009-09-18 2014-10-22 住友電気工業株式会社 合成石英ガラス母材の製造方法及び合成石英ガラス母材
EP2495220B1 (en) 2009-10-30 2016-07-06 Asahi Glass Company, Limited Optical member for deep ultraviolet and process for producing same
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
WO2017103131A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
WO2017103160A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
WO2017103123A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
TWI840318B (zh) 2015-12-18 2024-05-01 德商何瑞斯廓格拉斯公司 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途
US10730780B2 (en) 2015-12-18 2020-08-04 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
JP2017216389A (ja) * 2016-06-01 2017-12-07 信越石英株式会社 紫外線ｓｍｄ型ｌｅｄ素子の気密封止用シリカガラス部材
JP6789011B2 (ja) * 2016-07-01 2020-11-25 信越石英株式会社 紫外線ｌｅｄ用石英ガラス部材の製造方法
KR102337364B1 (ko) * 2016-06-01 2021-12-09 신에쯔 세끼에이 가부시키가이샤 자외선ｓｍｄ형 ｌｅｄ소자의 기밀봉지용 석영유리 부재 및 자외선ｌｅｄ용 석영유리 부재의 제조방법

Also Published As

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JP2003112933A (ja) 2003-04-18

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