JP2003112933A5 - - Google Patents
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- Publication number
- JP2003112933A5 JP2003112933A5 JP2001309953A JP2001309953A JP2003112933A5 JP 2003112933 A5 JP2003112933 A5 JP 2003112933A5 JP 2001309953 A JP2001309953 A JP 2001309953A JP 2001309953 A JP2001309953 A JP 2001309953A JP 2003112933 A5 JP2003112933 A5 JP 2003112933A5
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- glass body
- hydrogen
- synthetic quartz
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001309953A JP4066632B2 (ja) | 2001-10-05 | 2001-10-05 | 合成石英ガラス光学体およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001309953A JP4066632B2 (ja) | 2001-10-05 | 2001-10-05 | 合成石英ガラス光学体およびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003112933A JP2003112933A (ja) | 2003-04-18 |
| JP2003112933A5 true JP2003112933A5 (enExample) | 2005-06-02 |
| JP4066632B2 JP4066632B2 (ja) | 2008-03-26 |
Family
ID=19129016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001309953A Expired - Fee Related JP4066632B2 (ja) | 2001-10-05 | 2001-10-05 | 合成石英ガラス光学体およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4066632B2 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5106090B2 (ja) * | 2007-12-26 | 2012-12-26 | 信越石英株式会社 | 光触媒用シリカガラス及びその製造方法 |
| US8268740B2 (en) * | 2008-02-07 | 2012-09-18 | Corning Incorporated | Halide free glasses having low OH, OD concentrations |
| US9067814B2 (en) * | 2009-01-19 | 2015-06-30 | Shin-Etsu Chemical Co., Ltd. | Method of producing synthetic quartz glass for excimer laser |
| JP5609050B2 (ja) * | 2009-09-18 | 2014-10-22 | 住友電気工業株式会社 | 合成石英ガラス母材の製造方法及び合成石英ガラス母材 |
| EP2495220B1 (en) | 2009-10-30 | 2016-07-06 | Asahi Glass Company, Limited | Optical member for deep ultraviolet and process for producing same |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| WO2017103123A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| JP2017216389A (ja) * | 2016-06-01 | 2017-12-07 | 信越石英株式会社 | 紫外線ｓｍｄ型ｌｅｄ素子の気密封止用シリカガラス部材 |
| JP6789011B2 (ja) * | 2016-07-01 | 2020-11-25 | 信越石英株式会社 | 紫外線ｌｅｄ用石英ガラス部材の製造方法 |
| KR102337364B1 (ko) * | 2016-06-01 | 2021-12-09 | 신에쯔 세끼에이 가부시키가이샤 | 자외선ｓｍｄ형 ｌｅｄ소자의 기밀봉지용 석영유리 부재 및 자외선ｌｅｄ용 석영유리 부재의 제조방법 |
-
2001
- 2001-10-05 JP JP2001309953A patent/JP4066632B2/ja not_active Expired - Fee Related
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