JP4026349B2 - 光学薄膜の作製方法 - Google Patents

光学薄膜の作製方法 Download PDF

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Publication number
JP4026349B2
JP4026349B2 JP2001321299A JP2001321299A JP4026349B2 JP 4026349 B2 JP4026349 B2 JP 4026349B2 JP 2001321299 A JP2001321299 A JP 2001321299A JP 2001321299 A JP2001321299 A JP 2001321299A JP 4026349 B2 JP4026349 B2 JP 4026349B2
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Japan
Prior art keywords
optical
thin film
layer
substrate
optical thin
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Expired - Fee Related
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JP2001321299A
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Japanese (ja)
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JP2002194529A (ja
JP2002194529A5 (enExample
Inventor
賢郎 宮村
和彦 御手洗
悟 高木
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AGC Inc
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Asahi Glass Co Ltd
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Publication of JP2002194529A5 publication Critical patent/JP2002194529A5/ja
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JP2001321299A 2000-10-20 2001-10-19 光学薄膜の作製方法 Expired - Fee Related JP4026349B2 (ja)

Priority Applications (1)

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JP2001321299A JP4026349B2 (ja) 2000-10-20 2001-10-19 光学薄膜の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-321654 2000-10-20
JP2000321654 2000-10-20
JP2001321299A JP4026349B2 (ja) 2000-10-20 2001-10-19 光学薄膜の作製方法

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JP2002194529A JP2002194529A (ja) 2002-07-10
JP2002194529A5 JP2002194529A5 (enExample) 2005-06-16
JP4026349B2 true JP4026349B2 (ja) 2007-12-26

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JP2001321299A Expired - Fee Related JP4026349B2 (ja) 2000-10-20 2001-10-19 光学薄膜の作製方法

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4198086B2 (ja) 2003-06-25 2008-12-17 オリンパス株式会社 蛍光観察用装置
JP4862295B2 (ja) * 2005-06-27 2012-01-25 パナソニック電工株式会社 有機ｅｌ素子の製造方法及び製造装置
JP4735291B2 (ja) * 2006-01-31 2011-07-27 株式会社昭和真空 成膜方法
JP2010209413A (ja) * 2009-03-10 2010-09-24 Central Glass Co Ltd 酸化タンタル薄膜及び薄膜積層体
JP5743266B2 (ja) 2010-08-06 2015-07-01 キヤノンアネルバ株式会社 成膜装置及びキャリブレーション方法
JP7550297B2 (ja) * 2020-07-22 2024-09-12 アプライド マテリアルズ インコーポレイテッド ドープされた非晶質光学装置膜及びドーパント原子の組み込みを介した堆積

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JP2002194529A (ja) 2002-07-10

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