JP4025076B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP4025076B2
JP4025076B2 JP2002003900A JP2002003900A JP4025076B2 JP 4025076 B2 JP4025076 B2 JP 4025076B2 JP 2002003900 A JP2002003900 A JP 2002003900A JP 2002003900 A JP2002003900 A JP 2002003900A JP 4025076 B2 JP4025076 B2 JP 4025076B2
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Japan
Prior art keywords
group
substituted
acid
atom
carbon atoms
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Expired - Fee Related
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JP2002003900A
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English (en)
Japanese (ja)
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JP2003207886A5 (enrdf_load_stackoverflow
JP2003207886A (ja
Inventor
元 中尾
邦彦 児玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002003900A priority Critical patent/JP4025076B2/ja
Priority to US10/338,737 priority patent/US7214465B2/en
Publication of JP2003207886A publication Critical patent/JP2003207886A/ja
Publication of JP2003207886A5 publication Critical patent/JP2003207886A5/ja
Application granted granted Critical
Publication of JP4025076B2 publication Critical patent/JP4025076B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002003900A 2002-01-10 2002-01-10 ポジ型感光性組成物 Expired - Fee Related JP4025076B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002003900A JP4025076B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物
US10/338,737 US7214465B2 (en) 2002-01-10 2003-01-09 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002003900A JP4025076B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2003207886A JP2003207886A (ja) 2003-07-25
JP2003207886A5 JP2003207886A5 (enrdf_load_stackoverflow) 2005-04-07
JP4025076B2 true JP4025076B2 (ja) 2007-12-19

Family

ID=27643368

Family Applications (1)

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JP2002003900A Expired - Fee Related JP4025076B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物

Country Status (1)

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JP (1) JP4025076B2 (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4617950B2 (ja) * 2004-03-23 2011-01-26 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP4796792B2 (ja) 2005-06-28 2011-10-19 富士フイルム株式会社 ポジ型感光性組成物及びそれを用いたパターン形成方法
JP5538095B2 (ja) * 2010-06-29 2014-07-02 富士フイルム株式会社 感活性光線性又は感放射線性組成物、並びに、この組成物を用いたレジスト膜及びパターン形成方法
JP5743622B2 (ja) * 2011-03-16 2015-07-01 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法
JP5846889B2 (ja) * 2011-12-14 2016-01-20 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、化合物
US10527934B2 (en) * 2012-10-31 2020-01-07 Rohm And Haas Electronic Materials Llc Photoresists comprising ionic compound
WO2016181722A1 (ja) * 2015-05-14 2016-11-17 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、感活性光線性又は感放射線性樹脂組成物
JP7519205B2 (ja) * 2019-04-24 2024-07-19 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7587401B2 (ja) * 2019-12-12 2024-11-20 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法並びにカルボン酸塩及びカルボン酸発生剤
JP7677200B2 (ja) * 2021-04-14 2025-05-15 信越化学工業株式会社 レジスト材料及びパターン形成方法

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Publication number Publication date
JP2003207886A (ja) 2003-07-25

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