JP4022315B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP4022315B2
JP4022315B2 JP17180998A JP17180998A JP4022315B2 JP 4022315 B2 JP4022315 B2 JP 4022315B2 JP 17180998 A JP17180998 A JP 17180998A JP 17180998 A JP17180998 A JP 17180998A JP 4022315 B2 JP4022315 B2 JP 4022315B2
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JP
Japan
Prior art keywords
substrate
air
processing unit
lower cover
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17180998A
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English (en)
Japanese (ja)
Other versions
JP2000012427A (ja
JP2000012427A5 (enExample
Inventor
幸治 木▲崎▼
由雄 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP17180998A priority Critical patent/JP4022315B2/ja
Publication of JP2000012427A publication Critical patent/JP2000012427A/ja
Publication of JP2000012427A5 publication Critical patent/JP2000012427A5/ja
Application granted granted Critical
Publication of JP4022315B2 publication Critical patent/JP4022315B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Solid Materials (AREA)
JP17180998A 1998-06-18 1998-06-18 基板処理装置 Expired - Fee Related JP4022315B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17180998A JP4022315B2 (ja) 1998-06-18 1998-06-18 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17180998A JP4022315B2 (ja) 1998-06-18 1998-06-18 基板処理装置

Publications (3)

Publication Number Publication Date
JP2000012427A JP2000012427A (ja) 2000-01-14
JP2000012427A5 JP2000012427A5 (enExample) 2005-10-06
JP4022315B2 true JP4022315B2 (ja) 2007-12-19

Family

ID=15930136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17180998A Expired - Fee Related JP4022315B2 (ja) 1998-06-18 1998-06-18 基板処理装置

Country Status (1)

Country Link
JP (1) JP4022315B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3703703B2 (ja) * 2000-10-04 2005-10-05 大日本スクリーン製造株式会社 基板処理装置
JP4282493B2 (ja) 2004-01-15 2009-06-24 株式会社東芝 膜形成方法及び基板処理装置
JP2008051473A (ja) * 2006-08-28 2008-03-06 Denso Corp 被乾燥物の乾燥方法および乾燥装置
JPWO2010089936A1 (ja) * 2009-02-04 2012-08-09 シャープ株式会社 インク乾燥装置
KR101512560B1 (ko) * 2012-08-31 2015-04-15 가부시키가이샤 스크린 홀딩스 기판처리장치
JP6872328B2 (ja) * 2016-09-06 2021-05-19 株式会社Ｓｃｒｅｅｎホールディングス 減圧乾燥装置、減圧乾燥システム、減圧乾燥方法

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Publication number Publication date
JP2000012427A (ja) 2000-01-14

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