JP4002959B2 - 基板ドーム回転機構 - Google Patents

基板ドーム回転機構 Download PDF

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Publication number
JP4002959B2
JP4002959B2 JP2004187285A JP2004187285A JP4002959B2 JP 4002959 B2 JP4002959 B2 JP 4002959B2 JP 2004187285 A JP2004187285 A JP 2004187285A JP 2004187285 A JP2004187285 A JP 2004187285A JP 4002959 B2 JP4002959 B2 JP 4002959B2
Authority
JP
Japan
Prior art keywords
dome
substrate
side gear
vacuum apparatus
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004187285A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006009082A5 (enExample
JP2006009082A (ja
Inventor
豊 布施
辰弥 阿部
昌行 瀧本
弘之 小室
一仁 青名端
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Shinku Co Ltd
Original Assignee
Showa Shinku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Shinku Co Ltd filed Critical Showa Shinku Co Ltd
Priority to JP2004187285A priority Critical patent/JP4002959B2/ja
Priority to KR1020067022026A priority patent/KR100855174B1/ko
Priority to PCT/JP2005/000851 priority patent/WO2006001095A1/ja
Priority to CN2005800131933A priority patent/CN1946873B/zh
Publication of JP2006009082A publication Critical patent/JP2006009082A/ja
Publication of JP2006009082A5 publication Critical patent/JP2006009082A5/ja
Application granted granted Critical
Publication of JP4002959B2 publication Critical patent/JP4002959B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2004187285A 2004-06-25 2004-06-25 基板ドーム回転機構 Expired - Fee Related JP4002959B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004187285A JP4002959B2 (ja) 2004-06-25 2004-06-25 基板ドーム回転機構
KR1020067022026A KR100855174B1 (ko) 2004-06-25 2005-01-24 기판 돔을 포함하는 진공 장치, 그 조립 및 분해 방법, 및 기판 돔을 포함하는 진공장치에서의 성막 방법
PCT/JP2005/000851 WO2006001095A1 (ja) 2004-06-25 2005-01-24 基板ドーム回転機構
CN2005800131933A CN1946873B (zh) 2004-06-25 2005-01-24 基板拱顶转动机构

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004187285A JP4002959B2 (ja) 2004-06-25 2004-06-25 基板ドーム回転機構

Publications (3)

Publication Number Publication Date
JP2006009082A JP2006009082A (ja) 2006-01-12
JP2006009082A5 JP2006009082A5 (enExample) 2007-02-15
JP4002959B2 true JP4002959B2 (ja) 2007-11-07

Family

ID=35776645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004187285A Expired - Fee Related JP4002959B2 (ja) 2004-06-25 2004-06-25 基板ドーム回転機構

Country Status (4)

Country Link
JP (1) JP4002959B2 (enExample)
KR (1) KR100855174B1 (enExample)
CN (1) CN1946873B (enExample)
WO (1) WO2006001095A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008138276A (ja) * 2006-12-05 2008-06-19 Tsukishima Kikai Co Ltd 真空成膜装置
CN104651795B (zh) * 2015-03-10 2017-01-11 丹阳市鼎新机械设备有限公司 一种镜片真空镀膜机用旋转台
JP6019310B1 (ja) * 2015-04-16 2016-11-02 ナルックス株式会社 蒸着装置及び蒸着装置による成膜工程を含む製造方法
EP3840012A1 (en) * 2019-12-20 2021-06-23 Essilor International Optimized crucible assembly and method for physical vapor deposition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2853267B2 (ja) * 1990-05-25 1999-02-03 本田技研工業株式会社 ３組の遊星歯車列を用いた一体遊星歯車変速機
JPH0754286Y2 (ja) * 1990-06-27 1995-12-18 関西日本電気株式会社 蒸着用プラネタ
KR960013625B1 (ko) * 1992-12-22 1996-10-10 재단법인 한국전자통신연구소 진공 열증착장치
JPH0835065A (ja) * 1994-07-22 1996-02-06 Murata Mfg Co Ltd 真空成膜装置
WO1998020521A1 (de) * 1996-11-01 1998-05-14 THEVA DüNNSCHICHTTECHNIK GMBH Vorrichtung zur herstellung oxidischer dünnschichten
JP4482972B2 (ja) * 1999-09-08 2010-06-16 株式会社昭和真空 光学薄膜製造装置

Also Published As

Publication number Publication date
KR100855174B1 (ko) 2008-08-29
CN1946873B (zh) 2010-09-29
CN1946873A (zh) 2007-04-11
WO2006001095A1 (ja) 2006-01-05
KR20070024518A (ko) 2007-03-02
JP2006009082A (ja) 2006-01-12

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