CN1946873B - 基板拱顶转动机构 - Google Patents

基板拱顶转动机构 Download PDF

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Publication number
CN1946873B
CN1946873B CN2005800131933A CN200580013193A CN1946873B CN 1946873 B CN1946873 B CN 1946873B CN 2005800131933 A CN2005800131933 A CN 2005800131933A CN 200580013193 A CN200580013193 A CN 200580013193A CN 1946873 B CN1946873 B CN 1946873B
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CN
China
Prior art keywords
substrate
vault
side gear
dome
rotating mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2005800131933A
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English (en)
Chinese (zh)
Other versions
CN1946873A (zh
Inventor
布施丰
阿部辰弥
泷本昌行
小室弘之
青名端一仁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Shinku Co Ltd
Original Assignee
Showa Shinku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Shinku Co Ltd filed Critical Showa Shinku Co Ltd
Publication of CN1946873A publication Critical patent/CN1946873A/zh
Application granted granted Critical
Publication of CN1946873B publication Critical patent/CN1946873B/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CN2005800131933A 2004-06-25 2005-01-24 基板拱顶转动机构 Expired - Fee Related CN1946873B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP187285/2004 2004-06-25
JP2004187285A JP4002959B2 (ja) 2004-06-25 2004-06-25 基板ドーム回転機構
PCT/JP2005/000851 WO2006001095A1 (ja) 2004-06-25 2005-01-24 基板ドーム回転機構

Publications (2)

Publication Number Publication Date
CN1946873A CN1946873A (zh) 2007-04-11
CN1946873B true CN1946873B (zh) 2010-09-29

Family

ID=35776645

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800131933A Expired - Fee Related CN1946873B (zh) 2004-06-25 2005-01-24 基板拱顶转动机构

Country Status (4)

Country Link
JP (1) JP4002959B2 (enExample)
KR (1) KR100855174B1 (enExample)
CN (1) CN1946873B (enExample)
WO (1) WO2006001095A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008138276A (ja) * 2006-12-05 2008-06-19 Tsukishima Kikai Co Ltd 真空成膜装置
CN104651795B (zh) * 2015-03-10 2017-01-11 丹阳市鼎新机械设备有限公司 一种镜片真空镀膜机用旋转台
JP6019310B1 (ja) * 2015-04-16 2016-11-02 ナルックス株式会社 蒸着装置及び蒸着装置による成膜工程を含む製造方法
EP3840012A1 (en) * 2019-12-20 2021-06-23 Essilor International Optimized crucible assembly and method for physical vapor deposition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2853267B2 (ja) * 1990-05-25 1999-02-03 本田技研工業株式会社 ３組の遊星歯車列を用いた一体遊星歯車変速機
JPH0754286Y2 (ja) * 1990-06-27 1995-12-18 関西日本電気株式会社 蒸着用プラネタ
KR960013625B1 (ko) * 1992-12-22 1996-10-10 재단법인 한국전자통신연구소 진공 열증착장치
JPH0835065A (ja) * 1994-07-22 1996-02-06 Murata Mfg Co Ltd 真空成膜装置
WO1998020521A1 (de) * 1996-11-01 1998-05-14 THEVA DüNNSCHICHTTECHNIK GMBH Vorrichtung zur herstellung oxidischer dünnschichten
JP4482972B2 (ja) * 1999-09-08 2010-06-16 株式会社昭和真空 光学薄膜製造装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2001-73136A 2001.03.21
JP特开平8-35065A 1996.02.06

Also Published As

Publication number Publication date
KR100855174B1 (ko) 2008-08-29
CN1946873A (zh) 2007-04-11
WO2006001095A1 (ja) 2006-01-05
JP4002959B2 (ja) 2007-11-07
KR20070024518A (ko) 2007-03-02
JP2006009082A (ja) 2006-01-12

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100929

Termination date: 20140124