JP3991214B2 - 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 - Google Patents

新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 Download PDF

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JP3991214B2
JP3991214B2 JP2002275029A JP2002275029A JP3991214B2 JP 3991214 B2 JP3991214 B2 JP 3991214B2 JP 2002275029 A JP2002275029 A JP 2002275029A JP 2002275029 A JP2002275029 A JP 2002275029A JP 3991214 B2 JP3991214 B2 JP 3991214B2
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group
bis
acid
diazomethane
carbon atoms
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JP2003192665A (ja
JP2003192665A5 (enExample
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洋一 大澤
克浩 小林
和規 前田
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2002275029A 2001-09-28 2002-09-20 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 Expired - Lifetime JP3991214B2 (ja)

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JP2002275029A JP3991214B2 (ja) 2001-09-28 2002-09-20 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法

Applications Claiming Priority (3)

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JP2001300345 2001-09-28
JP2001-300345 2001-09-28
JP2002275029A JP3991214B2 (ja) 2001-09-28 2002-09-20 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法

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JP2003192665A JP2003192665A (ja) 2003-07-09
JP2003192665A5 JP2003192665A5 (enExample) 2005-05-26
JP3991214B2 true JP3991214B2 (ja) 2007-10-17

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Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4359467B2 (ja) * 2003-08-28 2009-11-04 信越化学工業株式会社 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法。
JP4895526B2 (ja) * 2005-04-20 2012-03-14 和光純薬工業株式会社 チオール化合物を含んでなる弱臭性反応試薬
US8227624B2 (en) 2007-08-07 2012-07-24 Adeka Corporation Aromatic sulfonium salt compound
US8383862B2 (en) 2007-11-01 2013-02-26 Adeka Corporation Salt compound, cationic polymerization initiator and cationically polymerizable composition
JP5635526B2 (ja) 2009-10-26 2014-12-03 株式会社Adeka 芳香族スルホニウム塩化合物
JP5717959B2 (ja) 2009-11-17 2015-05-13 株式会社Adeka 芳香族スルホニウム塩化合物
CN102712599B (zh) 2010-01-13 2016-08-10 株式会社Adeka 新型磺酸衍生物化合物和新型萘二甲酸衍生物化合物
EP2539316B1 (en) 2010-02-24 2019-10-23 Basf Se Latent acids and their use
EP2927216B1 (en) 2012-11-28 2018-10-24 Adeka Corporation Novel sulfonic acid derivative compound, photoacid generator, cationic polymerization initiator, resist composition, and cationically polymerizable composition
EP3253735B1 (en) 2015-02-02 2021-03-31 Basf Se Latent acids and their use

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