JP3982950B2 - ポジ型感光性樹脂組成物 - Google Patents

ポジ型感光性樹脂組成物 Download PDF

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Publication number
JP3982950B2
JP3982950B2 JP18680999A JP18680999A JP3982950B2 JP 3982950 B2 JP3982950 B2 JP 3982950B2 JP 18680999 A JP18680999 A JP 18680999A JP 18680999 A JP18680999 A JP 18680999A JP 3982950 B2 JP3982950 B2 JP 3982950B2
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JP
Japan
Prior art keywords
group
atom
acid
resin
positive photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP18680999A
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English (en)
Japanese (ja)
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JP2000267287A5 (enExample
JP2000267287A (ja
Inventor
邦彦 児玉
健一郎 佐藤
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP18680999A priority Critical patent/JP3982950B2/ja
Priority to KR1019990030510A priority patent/KR100574257B1/ko
Priority to US09/361,568 priority patent/US6291130B1/en
Priority to US09/606,681 priority patent/US6517991B1/en
Publication of JP2000267287A publication Critical patent/JP2000267287A/ja
Priority to US10/176,067 priority patent/US6818377B2/en
Publication of JP2000267287A5 publication Critical patent/JP2000267287A5/ja
Application granted granted Critical
Publication of JP3982950B2 publication Critical patent/JP3982950B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP18680999A 1998-07-27 1999-06-30 ポジ型感光性樹脂組成物 Expired - Fee Related JP3982950B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP18680999A JP3982950B2 (ja) 1998-09-17 1999-06-30 ポジ型感光性樹脂組成物
KR1019990030510A KR100574257B1 (ko) 1998-07-27 1999-07-27 포지티브 감광성 조성물
US09/361,568 US6291130B1 (en) 1998-07-27 1999-07-27 Positive photosensitive composition
US09/606,681 US6517991B1 (en) 1998-07-27 2000-06-30 Positive photosensitive composition
US10/176,067 US6818377B2 (en) 1998-07-27 2002-06-21 Positive photosensitive composition

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP26339298 1998-09-17
JP10-263392 1999-01-13
JP11-6662 1999-01-13
JP666299 1999-01-13
JP18680999A JP3982950B2 (ja) 1998-09-17 1999-06-30 ポジ型感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JP2000267287A JP2000267287A (ja) 2000-09-29
JP2000267287A5 JP2000267287A5 (enExample) 2005-07-07
JP3982950B2 true JP3982950B2 (ja) 2007-09-26

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ID=27277267

Family Applications (1)

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JP18680999A Expired - Fee Related JP3982950B2 (ja) 1998-07-27 1999-06-30 ポジ型感光性樹脂組成物

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JP (1) JP3982950B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8841060B2 (en) 2011-06-30 2014-09-23 Fujifilm Corporation Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4576737B2 (ja) * 2000-06-09 2010-11-10 Ｊｓｒ株式会社 感放射線性樹脂組成物
US6936398B2 (en) 2001-05-09 2005-08-30 Massachusetts Institute Of Technology Resist with reduced line edge roughness
JP4574067B2 (ja) * 2001-06-08 2010-11-04 ルネサスエレクトロニクス株式会社 レジスト組成物
US7192681B2 (en) * 2001-07-05 2007-03-20 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JP4512340B2 (ja) * 2003-10-20 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2011051989A (ja) * 2004-04-23 2011-03-17 Sumitomo Chemical Co Ltd 化学増幅型ポジ型レジスト組成物及び（メタ）アクリル酸誘導体とその製法
JP4533660B2 (ja) * 2004-05-14 2010-09-01 富士フイルム株式会社 ポジ型感光性組成物及びそれを用いたパターン形成方法
WO2007094474A1 (ja) 2006-02-17 2007-08-23 Kuraray Co., Ltd. 第３級アルコール誘導体、高分子化合物およびフォトレジスト組成物
JP5191759B2 (ja) * 2008-02-22 2013-05-08 株式会社クラレ 新規なアクリル酸エステル誘導体およびその製造方法
WO2009144801A1 (ja) * 2008-05-29 2009-12-03 富士通株式会社 ジチアン誘導体、重合体、レジスト組成物、並びに、前記レジスト組成物を用いた半導体の製造方法
JP5793388B2 (ja) * 2011-09-30 2015-10-14 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜及びパターン形成方法
JP5757851B2 (ja) * 2011-11-25 2015-08-05 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜及びパターン形成方法、及び電子デバイスの製造方法
JP5775804B2 (ja) * 2011-12-06 2015-09-09 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
JP2013130654A (ja) * 2011-12-20 2013-07-04 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜及びパターン形成方法、並びに電子デバイスの製造方法及び電子デバイス
JP2013137338A (ja) * 2011-12-27 2013-07-11 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜及びパターン形成方法、並びに電子デバイスの製造方法及び電子デバイス
JP6036545B2 (ja) * 2012-12-21 2016-11-30 Jsr株式会社 フォトレジスト組成物、レジストパターン形成方法、重合体及び化合物
JP6273689B2 (ja) * 2013-03-29 2018-02-07 Jsr株式会社 感放射線性樹脂組成物、レジストパターン形成方法、重合体、化合物及びその製造方法
JP6223807B2 (ja) 2013-12-12 2017-11-01 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、電子デバイスの製造方法、電子デバイス
JP6492821B2 (ja) * 2015-03-17 2019-04-03 Jsr株式会社 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物
WO2020129476A1 (ja) * 2018-12-21 2020-06-25 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8841060B2 (en) 2011-06-30 2014-09-23 Fujifilm Corporation Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device

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Publication number Publication date
JP2000267287A (ja) 2000-09-29

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