JP3968862B2 - 照度計、照度計測方法及び露光装置 - Google Patents

照度計、照度計測方法及び露光装置 Download PDF

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Publication number
JP3968862B2
JP3968862B2 JP07486198A JP7486198A JP3968862B2 JP 3968862 B2 JP3968862 B2 JP 3968862B2 JP 07486198 A JP07486198 A JP 07486198A JP 7486198 A JP7486198 A JP 7486198A JP 3968862 B2 JP3968862 B2 JP 3968862B2
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JP
Japan
Prior art keywords
illuminance
exposure
illuminometer
illumination light
exposure apparatus
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Expired - Lifetime
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JP07486198A
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English (en)
Japanese (ja)
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JPH11260706A (ja
JPH11260706A5 (enExample
Inventor
弘明 鳴嶋
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Nikon Corp
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Nikon Corp
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Priority to JP07486198A priority Critical patent/JP3968862B2/ja
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Publication of JPH11260706A5 publication Critical patent/JPH11260706A5/ja
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  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP07486198A 1998-03-09 1998-03-09 照度計、照度計測方法及び露光装置 Expired - Lifetime JP3968862B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP07486198A JP3968862B2 (ja) 1998-03-09 1998-03-09 照度計、照度計測方法及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07486198A JP3968862B2 (ja) 1998-03-09 1998-03-09 照度計、照度計測方法及び露光装置

Publications (3)

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JPH11260706A JPH11260706A (ja) 1999-09-24
JPH11260706A5 JPH11260706A5 (enExample) 2005-10-20
JP3968862B2 true JP3968862B2 (ja) 2007-08-29

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JP07486198A Expired - Lifetime JP3968862B2 (ja) 1998-03-09 1998-03-09 照度計、照度計測方法及び露光装置

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100936085B1 (ko) * 2002-02-06 2010-01-12 싸이버옵틱스 쎄미콘덕터 인코퍼레이티드 무선 기판형 센서

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6549277B1 (en) 1999-09-28 2003-04-15 Nikon Corporation Illuminance meter, illuminance measuring method and exposure apparatus
JP2001338868A (ja) * 2000-03-24 2001-12-07 Nikon Corp 照度計測装置及び露光装置
US7151366B2 (en) * 2002-12-03 2006-12-19 Sensarray Corporation Integrated process condition sensing wafer and data analysis system
US7135852B2 (en) 2002-12-03 2006-11-14 Sensarray Corporation Integrated process condition sensing wafer and data analysis system
JP2007528611A (ja) * 2004-03-09 2007-10-11 サイバーオプティクス セミコンダクタ インコーポレイテッド 改良型の基板状無線センサ
JP4622568B2 (ja) * 2005-02-14 2011-02-02 株式会社ニコン 露光方法、露光装置、反射板、反射率計測センサの校正方法及びマイクロデバイスの製造方法
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
TWI439813B (zh) 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100936085B1 (ko) * 2002-02-06 2010-01-12 싸이버옵틱스 쎄미콘덕터 인코퍼레이티드 무선 기판형 센서

Also Published As

Publication number Publication date
JPH11260706A (ja) 1999-09-24

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