JP3965761B2 - 試料作製装置および試料作製方法 - Google Patents

試料作製装置および試料作製方法 Download PDF

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Publication number
JP3965761B2
JP3965761B2 JP05771898A JP5771898A JP3965761B2 JP 3965761 B2 JP3965761 B2 JP 3965761B2 JP 05771898 A JP05771898 A JP 05771898A JP 5771898 A JP5771898 A JP 5771898A JP 3965761 B2 JP3965761 B2 JP 3965761B2
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sample
stage
piece
sample preparation
extracted
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Japanese (ja)
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JPH11258130A (ja
JPH11258130A5 (enExample
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馨 梅村
聡 富松
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Hitachi Ltd
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Hitachi Ltd
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  • Sampling And Sample Adjustment (AREA)
JP05771898A 1998-03-10 1998-03-10 試料作製装置および試料作製方法 Expired - Lifetime JP3965761B2 (ja)

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JP05771898A JP3965761B2 (ja) 1998-03-10 1998-03-10 試料作製装置および試料作製方法

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JP05771898A JP3965761B2 (ja) 1998-03-10 1998-03-10 試料作製装置および試料作製方法

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JPH11258130A JPH11258130A (ja) 1999-09-24
JPH11258130A5 JPH11258130A5 (enExample) 2005-09-02
JP3965761B2 true JP3965761B2 (ja) 2007-08-29

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3901983A1 (en) * 2020-04-07 2021-10-27 Jeol Ltd. Charged particle beam system

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6452174B1 (en) 1999-12-13 2002-09-17 Mitsubishi Denki Kabushiki Kaisha Charged particle beam apparatus and method of controlling same
JP3597761B2 (ja) 2000-07-18 2004-12-08 株式会社日立製作所 イオンビーム装置及び試料加工方法
US7084399B2 (en) 2000-07-18 2006-08-01 Hitachi, Ltd. Ion beam apparatus and sample processing method
JP4178741B2 (ja) 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
JP2003156418A (ja) 2001-11-26 2003-05-30 Mitsubishi Electric Corp 分析用試料の作製方法および分析方法並びにその分析用試料
JP3980948B2 (ja) 2002-06-25 2007-09-26 株式会社日立ハイテクノロジーズ 不良解析方法及び不良解析システム
JP4564760B2 (ja) * 2003-01-31 2010-10-20 キヤノン株式会社 物体運搬方法、物体運搬装置
WO2004068538A2 (en) * 2003-01-31 2004-08-12 Canon Kabushiki Kaisha Object-moving method, object-moving apparatus and production process using the method
US7053383B2 (en) * 2003-11-11 2006-05-30 Omniprobe, Inc. Method and apparatus for rapid sample preparation in a focused ion beam microscope
US7381968B2 (en) 2004-04-16 2008-06-03 Hitachi High-Technologies Corporation Charged particle beam apparatus and specimen holder
JP4847711B2 (ja) * 2004-04-16 2011-12-28 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5243048B2 (ja) * 2008-01-08 2013-07-24 株式会社日立ハイテクノロジーズ 集束イオンビームによる試料加工方法及び装置
JP4811448B2 (ja) * 2008-10-31 2011-11-09 株式会社日立製作所 イオンビーム装置
JP4877318B2 (ja) * 2008-12-19 2012-02-15 株式会社日立製作所 検査・解析方法および試料作製装置
JP5142160B2 (ja) * 2010-12-21 2013-02-13 独立行政法人理化学研究所 ３次元フォトニック結晶の製造方法
KR102383571B1 (ko) * 2014-06-30 2022-04-06 가부시키가이샤 히다치 하이테크 사이언스 자동 시료 제작 장치
JP6730008B2 (ja) * 2015-06-16 2020-07-29 アオイ電子株式会社 微小試料台、その製造方法および微小試料の取付方法
WO2017134764A1 (ja) 2016-02-03 2017-08-10 株式会社日立ハイテクノロジーズ 試料ホルダ、イオンミリング装置、試料加工方法、試料観察方法、及び試料加工・観察方法
TWI759169B (zh) * 2021-04-15 2022-03-21 閎康科技股份有限公司 樣品分析方法及樣品製備方法
CN116223222B (zh) * 2023-03-31 2025-10-28 中铝材料应用研究院有限公司 用于扫描电镜的便携式原位拉伸装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3901983A1 (en) * 2020-04-07 2021-10-27 Jeol Ltd. Charged particle beam system

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JPH11258130A (ja) 1999-09-24

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