JP3963426B2 - ステージ装置および露光装置 - Google Patents

ステージ装置および露光装置 Download PDF

Info

Publication number
JP3963426B2
JP3963426B2 JP2001362725A JP2001362725A JP3963426B2 JP 3963426 B2 JP3963426 B2 JP 3963426B2 JP 2001362725 A JP2001362725 A JP 2001362725A JP 2001362725 A JP2001362725 A JP 2001362725A JP 3963426 B2 JP3963426 B2 JP 3963426B2
Authority
JP
Japan
Prior art keywords
stage
top plate
exposure
linear motor
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001362725A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003163154A5 (enExample
JP2003163154A (ja
Inventor
和徳 岩本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001362725A priority Critical patent/JP3963426B2/ja
Priority to US10/290,529 priority patent/US6891599B2/en
Publication of JP2003163154A publication Critical patent/JP2003163154A/ja
Publication of JP2003163154A5 publication Critical patent/JP2003163154A5/ja
Application granted granted Critical
Publication of JP3963426B2 publication Critical patent/JP3963426B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Linear Motors (AREA)
JP2001362725A 2001-11-28 2001-11-28 ステージ装置および露光装置 Expired - Fee Related JP3963426B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001362725A JP3963426B2 (ja) 2001-11-28 2001-11-28 ステージ装置および露光装置
US10/290,529 US6891599B2 (en) 2001-11-28 2002-11-08 Stage apparatus and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001362725A JP3963426B2 (ja) 2001-11-28 2001-11-28 ステージ装置および露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007112698A Division JP4366412B2 (ja) 2007-04-23 2007-04-23 ステージ装置および露光装置

Publications (3)

Publication Number Publication Date
JP2003163154A JP2003163154A (ja) 2003-06-06
JP2003163154A5 JP2003163154A5 (enExample) 2005-07-07
JP3963426B2 true JP3963426B2 (ja) 2007-08-22

Family

ID=19173179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001362725A Expired - Fee Related JP3963426B2 (ja) 2001-11-28 2001-11-28 ステージ装置および露光装置

Country Status (2)

Country Link
US (1) US6891599B2 (enExample)
JP (1) JP3963426B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
US7006199B2 (en) * 2004-03-10 2006-02-28 Asml Netherlands B.V. Lithographic positioning device and device manufacturing method
US7783369B2 (en) 2004-08-25 2010-08-24 Thk Co., Ltd. Remote maintenance system
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
US7782446B2 (en) * 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
JP4820842B2 (ja) * 2007-05-30 2011-11-24 エーエスエムエル ネザーランズ ビー．ブイ． ステージシステムおよびそのようなステージシステムを備えるリソグラフィ装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3620969A1 (de) * 1985-06-24 1987-01-02 Canon Kk Praezisionszufuehrmechanismus
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
EP0772800B1 (en) * 1995-05-30 2000-05-10 Asm Lithography B.V. Lithographic device with a three-dimensionally positionable mask holder
JP3387715B2 (ja) 1995-11-24 2003-03-17 キヤノン株式会社 多相リニアモータ制御装置
EP0762255B1 (en) * 1995-09-04 1999-03-17 Canon Kabushiki Kaisha Drive control apparatus
JP3815750B2 (ja) 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
JP3221823B2 (ja) * 1995-11-24 2001-10-22 キヤノン株式会社 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
JP3266515B2 (ja) * 1996-08-02 2002-03-18 キヤノン株式会社 露光装置、デバイス製造方法およびステージ装置
JP3531894B2 (ja) * 1996-09-13 2004-05-31 キヤノン株式会社 投影露光装置
JP3890136B2 (ja) * 1997-03-25 2007-03-07 キヤノン株式会社 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置
JP3535749B2 (ja) * 1997-12-10 2004-06-07 キヤノン株式会社 ステージ装置、露光装置、並びにデバイス製造方法

Also Published As

Publication number Publication date
US20030098961A1 (en) 2003-05-29
JP2003163154A (ja) 2003-06-06
US6891599B2 (en) 2005-05-10

Similar Documents

Publication Publication Date Title
JP4474020B2 (ja) 移動装置及び露光装置
JP3849932B2 (ja) 移動ステージ装置
US7063192B2 (en) Active vibration suppression apparatus, control method therefor, and exposure apparatus having active vibration suppression apparatus
US6859257B2 (en) Stage system
JP2001304332A (ja) 能動制振装置
US6917046B2 (en) Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method
JP3728180B2 (ja) 干渉計搭載ステージ
JP3833148B2 (ja) 位置決め装置及びその制御方法、露光装置、デバイスの製造方法、半導体製造工場、露光装置の保守方法
US6990386B2 (en) Moving mechanism and stage system in exposure apparatus
JP3963426B2 (ja) ステージ装置および露光装置
JP2002075855A (ja) 自重補償装置およびこれを用いたステージ装置並びに露光装置およびそれを用いたデバイス製造方法
JP4366412B2 (ja) ステージ装置および露光装置
JP3962669B2 (ja) 移動装置及び露光装置並びにデバイスの製造方法
JP4323751B2 (ja) 移動位置決め装置及びそれを備える露光装置
JP4040660B2 (ja) 走査露光装置
EP1418017A2 (en) Positioning apparatus, charged particle beam exposure apparatus, and semiconductor device manufacturing method
JP4011919B2 (ja) 移動装置及び露光装置並びに半導体デバイスの製造方法
JP2004096813A (ja) ムービングコイル型多相リニアモータおよびその駆動方法、多相リニアモータおよびその駆動方法、駆動装置、ならびにこれらを備えた露光装置
JP4065505B2 (ja) 移動体制御装置、移動体制御方法、露光装置並びに露光方法
JP2001297965A (ja) ステージ装置及びこれを用いた露光装置並びにデバイス製造方法
JP2001313247A (ja) ステージ装置及びこれを用いた露光装置並びにデバイス製造方法
JP2001297968A (ja) ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2002025881A (ja) 移動荷重補償装置及び露光装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041105

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041105

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060620

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070221

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070420

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070516

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070521

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110601

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120601

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120601

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130601

Year of fee payment: 6

LAPS Cancellation because of no payment of annual fees