JP2003163154A5 - - Google Patents

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Publication number
JP2003163154A5
JP2003163154A5 JP2001362725A JP2001362725A JP2003163154A5 JP 2003163154 A5 JP2003163154 A5 JP 2003163154A5 JP 2001362725 A JP2001362725 A JP 2001362725A JP 2001362725 A JP2001362725 A JP 2001362725A JP 2003163154 A5 JP2003163154 A5 JP 2003163154A5
Authority
JP
Japan
Prior art keywords
stage
stages
actuator
predetermined direction
stage apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001362725A
Other languages
English (en)
Japanese (ja)
Other versions
JP3963426B2 (ja
JP2003163154A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001362725A priority Critical patent/JP3963426B2/ja
Priority claimed from JP2001362725A external-priority patent/JP3963426B2/ja
Priority to US10/290,529 priority patent/US6891599B2/en
Publication of JP2003163154A publication Critical patent/JP2003163154A/ja
Publication of JP2003163154A5 publication Critical patent/JP2003163154A5/ja
Application granted granted Critical
Publication of JP3963426B2 publication Critical patent/JP3963426B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001362725A 2001-11-28 2001-11-28 ステージ装置および露光装置 Expired - Fee Related JP3963426B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001362725A JP3963426B2 (ja) 2001-11-28 2001-11-28 ステージ装置および露光装置
US10/290,529 US6891599B2 (en) 2001-11-28 2002-11-08 Stage apparatus and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001362725A JP3963426B2 (ja) 2001-11-28 2001-11-28 ステージ装置および露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007112698A Division JP4366412B2 (ja) 2007-04-23 2007-04-23 ステージ装置および露光装置

Publications (3)

Publication Number Publication Date
JP2003163154A JP2003163154A (ja) 2003-06-06
JP2003163154A5 true JP2003163154A5 (enExample) 2005-07-07
JP3963426B2 JP3963426B2 (ja) 2007-08-22

Family

ID=19173179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001362725A Expired - Fee Related JP3963426B2 (ja) 2001-11-28 2001-11-28 ステージ装置および露光装置

Country Status (2)

Country Link
US (1) US6891599B2 (enExample)
JP (1) JP3963426B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
US7006199B2 (en) * 2004-03-10 2006-02-28 Asml Netherlands B.V. Lithographic positioning device and device manufacturing method
US7783369B2 (en) 2004-08-25 2010-08-24 Thk Co., Ltd. Remote maintenance system
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
US7782446B2 (en) * 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
JP4820842B2 (ja) * 2007-05-30 2011-11-24 エーエスエムエル ネザーランズ ビー．ブイ． ステージシステムおよびそのようなステージシステムを備えるリソグラフィ装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3620969A1 (de) * 1985-06-24 1987-01-02 Canon Kk Praezisionszufuehrmechanismus
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
EP0772800B1 (en) * 1995-05-30 2000-05-10 Asm Lithography B.V. Lithographic device with a three-dimensionally positionable mask holder
JP3387715B2 (ja) 1995-11-24 2003-03-17 キヤノン株式会社 多相リニアモータ制御装置
EP0762255B1 (en) * 1995-09-04 1999-03-17 Canon Kabushiki Kaisha Drive control apparatus
JP3815750B2 (ja) 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
JP3221823B2 (ja) * 1995-11-24 2001-10-22 キヤノン株式会社 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
JP3266515B2 (ja) * 1996-08-02 2002-03-18 キヤノン株式会社 露光装置、デバイス製造方法およびステージ装置
JP3531894B2 (ja) * 1996-09-13 2004-05-31 キヤノン株式会社 投影露光装置
JP3890136B2 (ja) * 1997-03-25 2007-03-07 キヤノン株式会社 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置
JP3535749B2 (ja) * 1997-12-10 2004-06-07 キヤノン株式会社 ステージ装置、露光装置、並びにデバイス製造方法

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