JP2004152902A5 - - Google Patents

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Publication number
JP2004152902A5
JP2004152902A5 JP2002314926A JP2002314926A JP2004152902A5 JP 2004152902 A5 JP2004152902 A5 JP 2004152902A5 JP 2002314926 A JP2002314926 A JP 2002314926A JP 2002314926 A JP2002314926 A JP 2002314926A JP 2004152902 A5 JP2004152902 A5 JP 2004152902A5
Authority
JP
Japan
Prior art keywords
movable
distance
reference plane
reaction force
positioning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002314926A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004152902A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002314926A priority Critical patent/JP2004152902A/ja
Priority claimed from JP2002314926A external-priority patent/JP2004152902A/ja
Priority to US10/694,083 priority patent/US6965426B2/en
Publication of JP2004152902A publication Critical patent/JP2004152902A/ja
Publication of JP2004152902A5 publication Critical patent/JP2004152902A5/ja
Pending legal-status Critical Current

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JP2002314926A 2002-10-29 2002-10-29 位置決め装置 Pending JP2004152902A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002314926A JP2004152902A (ja) 2002-10-29 2002-10-29 位置決め装置
US10/694,083 US6965426B2 (en) 2002-10-29 2003-10-28 Positioning system and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002314926A JP2004152902A (ja) 2002-10-29 2002-10-29 位置決め装置

Publications (2)

Publication Number Publication Date
JP2004152902A JP2004152902A (ja) 2004-05-27
JP2004152902A5 true JP2004152902A5 (enExample) 2005-09-22

Family

ID=32459107

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002314926A Pending JP2004152902A (ja) 2002-10-29 2002-10-29 位置決め装置

Country Status (2)

Country Link
US (1) US6965426B2 (enExample)
JP (1) JP2004152902A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7221433B2 (en) * 2004-01-28 2007-05-22 Nikon Corporation Stage assembly including a reaction assembly having a connector assembly
JP2005268268A (ja) * 2004-03-16 2005-09-29 Canon Inc 電子ビーム露光装置
JP4617119B2 (ja) * 2004-08-30 2011-01-19 キヤノン株式会社 駆動装置、露光装置及びデバイス製造方法
US7456935B2 (en) * 2005-04-05 2008-11-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
US20070152391A1 (en) * 2005-12-29 2007-07-05 Chitayat Anwar K Error corrected positioning stage
CN110868007B (zh) * 2019-11-27 2020-12-01 大连佳峰自动化股份有限公司 一种直线电机的减振机构

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH066248B2 (ja) 1985-10-14 1994-01-26 オムロン株式会社 Ｘｙステ−ジ
US6151100A (en) * 1996-12-12 2000-11-21 Canon Kabushiki Kaisha Positioning system
JP3810039B2 (ja) * 1998-05-06 2006-08-16 キヤノン株式会社 ステージ装置
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6958808B2 (en) * 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly

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