JP3945799B2 - パターン形成体の製造方法 - Google Patents

パターン形成体の製造方法 Download PDF

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Publication number
JP3945799B2
JP3945799B2 JP2000087089A JP2000087089A JP3945799B2 JP 3945799 B2 JP3945799 B2 JP 3945799B2 JP 2000087089 A JP2000087089 A JP 2000087089A JP 2000087089 A JP2000087089 A JP 2000087089A JP 3945799 B2 JP3945799 B2 JP 3945799B2
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JP
Japan
Prior art keywords
photocatalyst
containing layer
layer
pattern
wettability
Prior art date
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Expired - Fee Related
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JP2000087089A
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English (en)
Japanese (ja)
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JP2001272774A (ja
JP2001272774A5 (https=
Inventor
弘典 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Priority to JP2000087089A priority Critical patent/JP3945799B2/ja
Publication of JP2001272774A publication Critical patent/JP2001272774A/ja
Publication of JP2001272774A5 publication Critical patent/JP2001272774A5/ja
Application granted granted Critical
Publication of JP3945799B2 publication Critical patent/JP3945799B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2000087089A 2000-03-23 2000-03-23 パターン形成体の製造方法 Expired - Fee Related JP3945799B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000087089A JP3945799B2 (ja) 2000-03-23 2000-03-23 パターン形成体の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000087089A JP3945799B2 (ja) 2000-03-23 2000-03-23 パターン形成体の製造方法

Publications (3)

Publication Number Publication Date
JP2001272774A JP2001272774A (ja) 2001-10-05
JP2001272774A5 JP2001272774A5 (https=) 2005-03-17
JP3945799B2 true JP3945799B2 (ja) 2007-07-18

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ID=18603155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000087089A Expired - Fee Related JP3945799B2 (ja) 2000-03-23 2000-03-23 パターン形成体の製造方法

Country Status (1)

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JP (1) JP3945799B2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7749684B2 (en) 2002-08-28 2010-07-06 Dai Nippon Printing Co., Ltd. Method for manufacturing conductive pattern forming body
JP4184022B2 (ja) * 2002-10-01 2008-11-19 大日本印刷株式会社 機能性素子
JP4300012B2 (ja) * 2002-10-16 2009-07-22 大日本印刷株式会社 多層配線基板
JP4245329B2 (ja) * 2002-10-31 2009-03-25 大日本印刷株式会社 機能性素子の製造方法
JP4332360B2 (ja) * 2003-02-28 2009-09-16 大日本印刷株式会社 濡れ性パターン形成用塗工液およびパターン形成体の製造方法
JP4602971B2 (ja) * 2004-02-20 2010-12-22 日本曹達株式会社 光感応性基体及びパターニング方法
JP2006162754A (ja) * 2004-12-03 2006-06-22 Dainippon Printing Co Ltd パターン形成体およびその製造方法

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Publication number Publication date
JP2001272774A (ja) 2001-10-05

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