JP3936546B2 - 露光装置及びその装置における基板位置決め方法並びにフラットディスプレイパネルの製造方法 - Google Patents

露光装置及びその装置における基板位置決め方法並びにフラットディスプレイパネルの製造方法 Download PDF

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Publication number
JP3936546B2
JP3936546B2 JP2001101881A JP2001101881A JP3936546B2 JP 3936546 B2 JP3936546 B2 JP 3936546B2 JP 2001101881 A JP2001101881 A JP 2001101881A JP 2001101881 A JP2001101881 A JP 2001101881A JP 3936546 B2 JP3936546 B2 JP 3936546B2
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exposure
mask
chuck
exposure chuck
target substrate
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JP2002296806A (ja
JP2002296806A5 (https=
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敏幸 小塚
亨司 楡井
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001101881A 2001-03-30 2001-03-30 露光装置及びその装置における基板位置決め方法並びにフラットディスプレイパネルの製造方法 Expired - Fee Related JP3936546B2 (ja)

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JP2001101881A JP3936546B2 (ja) 2001-03-30 2001-03-30 露光装置及びその装置における基板位置決め方法並びにフラットディスプレイパネルの製造方法

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JP2001101881A JP3936546B2 (ja) 2001-03-30 2001-03-30 露光装置及びその装置における基板位置決め方法並びにフラットディスプレイパネルの製造方法

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JP2002296806A JP2002296806A (ja) 2002-10-09
JP2002296806A5 JP2002296806A5 (https=) 2004-12-24
JP3936546B2 true JP3936546B2 (ja) 2007-06-27

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103034064A (zh) * 2011-09-29 2013-04-10 上海微电子装备有限公司 一种用于基板预对准以及基板方向检测及调整的装置

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4522142B2 (ja) * 2004-05-18 2010-08-11 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び基板製造方法
JP4699071B2 (ja) * 2005-04-01 2011-06-08 株式会社安川電機 ステージ装置およびその露光装置
US7888664B2 (en) * 2008-03-10 2011-02-15 Eastman Kodak Company Plate pallet alignment system
JP5236362B2 (ja) * 2008-06-17 2013-07-17 株式会社日立ハイテクノロジーズ プロキシミティ露光装置及びプロキシミティ露光装置の基板搬送方法
JP5254073B2 (ja) * 2008-08-21 2013-08-07 Ｎｓｋテクノロジー株式会社 スキャン露光装置およびスキャン露光装置の基板搬送方法
JP5334536B2 (ja) * 2008-11-10 2013-11-06 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置のマスク搬送方法、及び表示用パネル基板の製造方法
JP5334675B2 (ja) * 2009-05-13 2013-11-06 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置のマスクの位置ずれ防止方法、及び表示用パネル基板の製造方法
JP5441800B2 (ja) * 2010-04-08 2014-03-12 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の基板位置決め方法、及び表示用パネル基板の製造方法、並びに光学式変位計を用いた微小角度検出方法
CN121070056A (zh) * 2025-11-06 2025-12-05 彩虹（合肥）液晶玻璃有限公司 基于玻璃基板分段切割制程的直角度控制系统

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103034064A (zh) * 2011-09-29 2013-04-10 上海微电子装备有限公司 一种用于基板预对准以及基板方向检测及调整的装置
CN103034064B (zh) * 2011-09-29 2015-03-25 上海微电子装备有限公司 一种用于基板预对准以及基板方向检测及调整的装置

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