JP3907165B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP3907165B2
JP3907165B2 JP2001339364A JP2001339364A JP3907165B2 JP 3907165 B2 JP3907165 B2 JP 3907165B2 JP 2001339364 A JP2001339364 A JP 2001339364A JP 2001339364 A JP2001339364 A JP 2001339364A JP 3907165 B2 JP3907165 B2 JP 3907165B2
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JP
Japan
Prior art keywords
group
acid
compound
general formula
resin
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Expired - Fee Related
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JP2001339364A
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English (en)
Japanese (ja)
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JP2003140348A (ja
JP2003140348A5 (enExample
Inventor
文之 西山
亨 藤森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2001339364A priority Critical patent/JP3907165B2/ja
Publication of JP2003140348A publication Critical patent/JP2003140348A/ja
Publication of JP2003140348A5 publication Critical patent/JP2003140348A5/ja
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Publication of JP3907165B2 publication Critical patent/JP3907165B2/ja
Anticipated expiration legal-status Critical
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2001339364A 2001-11-05 2001-11-05 ポジ型レジスト組成物 Expired - Fee Related JP3907165B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001339364A JP3907165B2 (ja) 2001-11-05 2001-11-05 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001339364A JP3907165B2 (ja) 2001-11-05 2001-11-05 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003140348A JP2003140348A (ja) 2003-05-14
JP2003140348A5 JP2003140348A5 (enExample) 2005-04-07
JP3907165B2 true JP3907165B2 (ja) 2007-04-18

Family

ID=19153720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001339364A Expired - Fee Related JP3907165B2 (ja) 2001-11-05 2001-11-05 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3907165B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102781911B (zh) 2010-02-24 2015-07-22 巴斯夫欧洲公司 潜酸及其用途
JP6035887B2 (ja) * 2011-06-21 2016-11-30 セントラル硝子株式会社 ポジ型レジスト組成物
US8900797B2 (en) * 2012-09-26 2014-12-02 Az Electronic Materials (Luxembourg) S.A.R.L. Developable bottom anti-reflective coating
US20180282466A1 (en) * 2014-10-31 2018-10-04 Horiba Stec, Co., Ltd. Polymer material for self-assembly, self-assembled film, method of producing self-assembled film, and projection and depression pattern
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도

Also Published As

Publication number Publication date
JP2003140348A (ja) 2003-05-14

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