JP3887582B2 - スパッタリング装置 - Google Patents

スパッタリング装置 Download PDF

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Publication number
JP3887582B2
JP3887582B2 JP2002182893A JP2002182893A JP3887582B2 JP 3887582 B2 JP3887582 B2 JP 3887582B2 JP 2002182893 A JP2002182893 A JP 2002182893A JP 2002182893 A JP2002182893 A JP 2002182893A JP 3887582 B2 JP3887582 B2 JP 3887582B2
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Japan
Prior art keywords
deposition
plate
sputtering apparatus
plasma
wafer
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Expired - Fee Related
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JP2002182893A
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Japanese (ja)
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JP2004031493A (ja
JP2004031493A5 (https=
Inventor
誠二 中嶋
大輔 末次
崇文 大熊
憲一 山本
隆亮 東田
宗和 西原
祐二 村嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2002182893A priority Critical patent/JP3887582B2/ja
Publication of JP2004031493A publication Critical patent/JP2004031493A/ja
Publication of JP2004031493A5 publication Critical patent/JP2004031493A5/ja
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JP2002182893A 2002-06-24 2002-06-24 スパッタリング装置 Expired - Fee Related JP3887582B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002182893A JP3887582B2 (ja) 2002-06-24 2002-06-24 スパッタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002182893A JP3887582B2 (ja) 2002-06-24 2002-06-24 スパッタリング装置

Publications (3)

Publication Number Publication Date
JP2004031493A JP2004031493A (ja) 2004-01-29
JP2004031493A5 JP2004031493A5 (https=) 2005-10-27
JP3887582B2 true JP3887582B2 (ja) 2007-02-28

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ID=31179267

Family Applications (1)

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JP2002182893A Expired - Fee Related JP3887582B2 (ja) 2002-06-24 2002-06-24 スパッタリング装置

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JP (1) JP3887582B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4720625B2 (ja) * 2006-06-05 2011-07-13 パナソニック株式会社 スパッタリング装置
JP5186297B2 (ja) * 2008-07-07 2013-04-17 株式会社アルバック スパッタリング装置
KR101073557B1 (ko) 2009-11-24 2011-10-14 삼성모바일디스플레이주식회사 스퍼터링 장치
JP5982678B2 (ja) * 2012-07-27 2016-08-31 株式会社ユーテック プラズマｃｖｄ装置及び磁気記録媒体の製造方法
WO2018216226A1 (ja) * 2017-05-26 2018-11-29 アドバンストマテリアルテクノロジーズ株式会社 成膜装置及び成膜方法

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Publication number Publication date
JP2004031493A (ja) 2004-01-29

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