JP3847689B2 - バリウム含有ルテニウム酸ストロンチウム電極を用いた圧電体素子、薄膜キャパシタおよびこれらの製造方法並びに該圧電体素子を用いたインクジェット式記録ヘッド - Google Patents

バリウム含有ルテニウム酸ストロンチウム電極を用いた圧電体素子、薄膜キャパシタおよびこれらの製造方法並びに該圧電体素子を用いたインクジェット式記録ヘッド Download PDF

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JP3847689B2
JP3847689B2 JP2002275749A JP2002275749A JP3847689B2 JP 3847689 B2 JP3847689 B2 JP 3847689B2 JP 2002275749 A JP2002275749 A JP 2002275749A JP 2002275749 A JP2002275749 A JP 2002275749A JP 3847689 B2 JP3847689 B2 JP 3847689B2
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Japan
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thin film
piezoelectric element
lower electrode
electrode
coating
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Japanese (ja)
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JP2004111850A (ja
JP2004111850A5 (enExample
Inventor
信二 襟立
本和 小林
純 久保田
悌互 榊原
久男 鈴木
英敏 宮崎
文生 内田
千恵美 清水
憲二 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Fuji Chemical Co Ltd
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Canon Inc
Fuji Chemical Co Ltd
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Priority to JP2002275749A priority Critical patent/JP3847689B2/ja
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Publication of JP2004111850A5 publication Critical patent/JP2004111850A5/ja
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  • Inorganic Compounds Of Heavy Metals (AREA)
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JP2002275749A 2002-09-20 2002-09-20 バリウム含有ルテニウム酸ストロンチウム電極を用いた圧電体素子、薄膜キャパシタおよびこれらの製造方法並びに該圧電体素子を用いたインクジェット式記録ヘッド Expired - Fee Related JP3847689B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002275749A JP3847689B2 (ja) 2002-09-20 2002-09-20 バリウム含有ルテニウム酸ストロンチウム電極を用いた圧電体素子、薄膜キャパシタおよびこれらの製造方法並びに該圧電体素子を用いたインクジェット式記録ヘッド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002275749A JP3847689B2 (ja) 2002-09-20 2002-09-20 バリウム含有ルテニウム酸ストロンチウム電極を用いた圧電体素子、薄膜キャパシタおよびこれらの製造方法並びに該圧電体素子を用いたインクジェット式記録ヘッド

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JP2004111850A JP2004111850A (ja) 2004-04-08
JP2004111850A5 JP2004111850A5 (enExample) 2005-04-21
JP3847689B2 true JP3847689B2 (ja) 2006-11-22

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8727505B2 (en) 2011-06-30 2014-05-20 Ricoh Company, Ltd. Electromechanical transducer element, droplet discharge head, and droplet discharge device

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3407417B2 (ja) * 1994-08-02 2003-05-19 戸田工業株式会社 球状複合体粒子粉末及びその製造方法
WO2006006406A1 (ja) * 2004-07-13 2006-01-19 Seiko Epson Corporation 強誘電体薄膜形成用組成物、強誘電体薄膜及び強誘電体薄膜の製造方法並びに液体噴射ヘッド
JP4802469B2 (ja) * 2004-09-14 2011-10-26 富士ゼロックス株式会社 液滴吐出装置
WO2007023985A1 (ja) 2005-08-23 2007-03-01 Canon Kabushiki Kaisha 圧電体素子、それを用いた液体吐出ヘッド、および液体吐出装置
JP5328007B2 (ja) * 2007-03-30 2013-10-30 パナソニック株式会社 圧電体素子及びその製造方法
EP1997638B1 (en) 2007-05-30 2012-11-21 Océ-Technologies B.V. Method of forming an array of piezoelectric actuators on a membrane
JP5242238B2 (ja) * 2007-05-30 2013-07-24 オセ−テクノロジーズ・ベー・ヴエー 圧電インクジェットデバイスの製作方法
JP5338239B2 (ja) * 2008-10-06 2013-11-13 セイコーエプソン株式会社 液体噴射ヘッド及び液体噴射装置並びに圧電アクチュエータ
JP5327977B2 (ja) * 2010-04-21 2013-10-30 独立行政法人科学技術振興機構 導電性膜形成用組成物および導電性膜の形成方法
JP6160295B2 (ja) * 2013-06-25 2017-07-12 株式会社リコー 強誘電体膜の成膜方法並びに成膜装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8727505B2 (en) 2011-06-30 2014-05-20 Ricoh Company, Ltd. Electromechanical transducer element, droplet discharge head, and droplet discharge device

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