JP3835786B2 - ポジ型レジスト液 - Google Patents

ポジ型レジスト液 Download PDF

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Publication number
JP3835786B2
JP3835786B2 JP32378398A JP32378398A JP3835786B2 JP 3835786 B2 JP3835786 B2 JP 3835786B2 JP 32378398 A JP32378398 A JP 32378398A JP 32378398 A JP32378398 A JP 32378398A JP 3835786 B2 JP3835786 B2 JP 3835786B2
Authority
JP
Japan
Prior art keywords
group
acid
positive resist
resin
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32378398A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000147774A (ja
JP2000147774A5 (enExample
Inventor
健一郎 佐藤
邦彦 児玉
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP32378398A priority Critical patent/JP3835786B2/ja
Priority to US09/438,789 priority patent/US6420082B1/en
Priority to KR1019990050397A priority patent/KR100553942B1/ko
Publication of JP2000147774A publication Critical patent/JP2000147774A/ja
Publication of JP2000147774A5 publication Critical patent/JP2000147774A5/ja
Application granted granted Critical
Publication of JP3835786B2 publication Critical patent/JP3835786B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP32378398A 1998-11-13 1998-11-13 ポジ型レジスト液 Expired - Fee Related JP3835786B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP32378398A JP3835786B2 (ja) 1998-11-13 1998-11-13 ポジ型レジスト液
US09/438,789 US6420082B1 (en) 1998-11-13 1999-11-12 Positive resist fluid and positive resist composition
KR1019990050397A KR100553942B1 (ko) 1998-11-13 1999-11-13 포지티브형 레지스트액 및 포지티브형 레지스트 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32378398A JP3835786B2 (ja) 1998-11-13 1998-11-13 ポジ型レジスト液

Publications (3)

Publication Number Publication Date
JP2000147774A JP2000147774A (ja) 2000-05-26
JP2000147774A5 JP2000147774A5 (enExample) 2005-02-24
JP3835786B2 true JP3835786B2 (ja) 2006-10-18

Family

ID=18158577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32378398A Expired - Fee Related JP3835786B2 (ja) 1998-11-13 1998-11-13 ポジ型レジスト液

Country Status (1)

Country Link
JP (1) JP3835786B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001188386A (ja) * 1999-10-22 2001-07-10 Sekisui Chem Co Ltd 荷電制御樹脂、電子写真用トナー用樹脂組成物及び電子写真用トナー
JP4579117B2 (ja) * 2005-09-26 2010-11-10 富士フイルム株式会社 ポジ型感光性組成物、該ポジ型感光性組成物に用いられる化合物、該ポジ型感光性組成物に用いられる樹脂及び該ポジ型感光性組成物を用いたパターン形成方法
WO2007125845A1 (ja) * 2006-04-28 2007-11-08 National University Corporation Yokohama National University スルホンイミド型モノマー及びその重合体
JP2009256595A (ja) * 2008-03-26 2009-11-05 Fujifilm Corp 水不溶性色材分散体、水不溶性色材含有物の製造方法、水不溶性色材の微粒子、水不溶性色材用分散剤、並びにこれらを用いた記録液、インクセット、印画物、画像形成方法、及び画像形成装置
EP2554580B1 (en) * 2008-04-24 2015-01-14 3M Innovative Properties Company Proton conducting materials
JP5588706B2 (ja) * 2010-03-12 2014-09-10 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたレジスト膜及びパターン形成方法
JPWO2021065549A1 (enExample) * 2019-09-30 2021-04-08

Also Published As

Publication number Publication date
JP2000147774A (ja) 2000-05-26

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