JP3827910B2 - パターン形成体 - Google Patents

パターン形成体 Download PDF

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Publication number
JP3827910B2
JP3827910B2 JP2000084714A JP2000084714A JP3827910B2 JP 3827910 B2 JP3827910 B2 JP 3827910B2 JP 2000084714 A JP2000084714 A JP 2000084714A JP 2000084714 A JP2000084714 A JP 2000084714A JP 3827910 B2 JP3827910 B2 JP 3827910B2
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JP
Japan
Prior art keywords
photocatalyst
containing layer
wettability
pattern
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000084714A
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English (en)
Japanese (ja)
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JP2001270024A (ja
JP2001270024A5 (https=
Inventor
弘典 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2000084714A priority Critical patent/JP3827910B2/ja
Publication of JP2001270024A publication Critical patent/JP2001270024A/ja
Publication of JP2001270024A5 publication Critical patent/JP2001270024A5/ja
Application granted granted Critical
Publication of JP3827910B2 publication Critical patent/JP3827910B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Catalysts (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
JP2000084714A 2000-03-22 2000-03-22 パターン形成体 Expired - Fee Related JP3827910B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000084714A JP3827910B2 (ja) 2000-03-22 2000-03-22 パターン形成体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000084714A JP3827910B2 (ja) 2000-03-22 2000-03-22 パターン形成体

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006160888A Division JP4348351B2 (ja) 2006-06-09 2006-06-09 パターン形成体

Publications (3)

Publication Number Publication Date
JP2001270024A JP2001270024A (ja) 2001-10-02
JP2001270024A5 JP2001270024A5 (https=) 2005-03-17
JP3827910B2 true JP3827910B2 (ja) 2006-09-27

Family

ID=18601158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000084714A Expired - Fee Related JP3827910B2 (ja) 2000-03-22 2000-03-22 パターン形成体

Country Status (1)

Country Link
JP (1) JP3827910B2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004202329A (ja) * 2002-12-24 2004-07-22 Matsushita Electric Works Ltd 機能性材料及びその製造方法
JP4565829B2 (ja) * 2003-11-21 2010-10-20 大日本印刷株式会社 パターン形成体用塗工液
JP4576556B2 (ja) * 2004-01-13 2010-11-10 独立行政法人物質・材料研究機構 可視光応答型複合酸化物系光触媒
JP4613021B2 (ja) * 2004-03-10 2011-01-12 大日本印刷株式会社 光触媒含有組成物および光触媒含有層
JPWO2005091070A1 (ja) * 2004-03-19 2008-02-07 ダイキン工業株式会社 リソグラフィー用基板表面処理剤
JP4753157B2 (ja) * 2004-10-29 2011-08-24 大日本印刷株式会社 パターン形成体用塗工液およびパターン形成体の製造方法
JP2008184357A (ja) * 2007-01-30 2008-08-14 National Institute Of Advanced Industrial & Technology 酸化物表面の両親媒性化方法

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Publication number Publication date
JP2001270024A (ja) 2001-10-02

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