JP2001270024A5 - - Google Patents

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Publication number
JP2001270024A5
JP2001270024A5 JP2000084714A JP2000084714A JP2001270024A5 JP 2001270024 A5 JP2001270024 A5 JP 2001270024A5 JP 2000084714 A JP2000084714 A JP 2000084714A JP 2000084714 A JP2000084714 A JP 2000084714A JP 2001270024 A5 JP2001270024 A5 JP 2001270024A5
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JP
Japan
Prior art keywords
photocatalyst
containing layer
pattern
wettability
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000084714A
Other languages
English (en)
Japanese (ja)
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JP2001270024A (ja
JP3827910B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000084714A priority Critical patent/JP3827910B2/ja
Priority claimed from JP2000084714A external-priority patent/JP3827910B2/ja
Publication of JP2001270024A publication Critical patent/JP2001270024A/ja
Publication of JP2001270024A5 publication Critical patent/JP2001270024A5/ja
Application granted granted Critical
Publication of JP3827910B2 publication Critical patent/JP3827910B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000084714A 2000-03-22 2000-03-22 パターン形成体 Expired - Fee Related JP3827910B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000084714A JP3827910B2 (ja) 2000-03-22 2000-03-22 パターン形成体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000084714A JP3827910B2 (ja) 2000-03-22 2000-03-22 パターン形成体

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006160888A Division JP4348351B2 (ja) 2006-06-09 2006-06-09 パターン形成体

Publications (3)

Publication Number Publication Date
JP2001270024A JP2001270024A (ja) 2001-10-02
JP2001270024A5 true JP2001270024A5 (https=) 2005-03-17
JP3827910B2 JP3827910B2 (ja) 2006-09-27

Family

ID=18601158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000084714A Expired - Fee Related JP3827910B2 (ja) 2000-03-22 2000-03-22 パターン形成体

Country Status (1)

Country Link
JP (1) JP3827910B2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004202329A (ja) * 2002-12-24 2004-07-22 Matsushita Electric Works Ltd 機能性材料及びその製造方法
JP4565829B2 (ja) * 2003-11-21 2010-10-20 大日本印刷株式会社 パターン形成体用塗工液
JP4576556B2 (ja) * 2004-01-13 2010-11-10 独立行政法人物質・材料研究機構 可視光応答型複合酸化物系光触媒
JP4613021B2 (ja) * 2004-03-10 2011-01-12 大日本印刷株式会社 光触媒含有組成物および光触媒含有層
JPWO2005091070A1 (ja) * 2004-03-19 2008-02-07 ダイキン工業株式会社 リソグラフィー用基板表面処理剤
JP4753157B2 (ja) * 2004-10-29 2011-08-24 大日本印刷株式会社 パターン形成体用塗工液およびパターン形成体の製造方法
JP2008184357A (ja) * 2007-01-30 2008-08-14 National Institute Of Advanced Industrial & Technology 酸化物表面の両親媒性化方法

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