JP2004111480A5 - - Google Patents
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- Publication number
- JP2004111480A5 JP2004111480A5 JP2002268999A JP2002268999A JP2004111480A5 JP 2004111480 A5 JP2004111480 A5 JP 2004111480A5 JP 2002268999 A JP2002268999 A JP 2002268999A JP 2002268999 A JP2002268999 A JP 2002268999A JP 2004111480 A5 JP2004111480 A5 JP 2004111480A5
- Authority
- JP
- Japan
- Prior art keywords
- photocatalyst
- containing layer
- pattern
- forming body
- pattern forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011941 photocatalyst Substances 0.000 claims 33
- 238000004519 manufacturing process Methods 0.000 claims 15
- 239000000758 substrate Substances 0.000 claims 11
- 239000000463 material Substances 0.000 claims 9
- 230000007261 regionalization Effects 0.000 claims 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims 1
- 229910006404 SnO 2 Inorganic materials 0.000 claims 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 1
- 239000011230 binding agent Substances 0.000 claims 1
- 229910000416 bismuth oxide Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229920000548 poly(silane) polymer Polymers 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 1
- 229910001887 tin oxide Inorganic materials 0.000 claims 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002268999A JP4324355B2 (ja) | 2002-09-13 | 2002-09-13 | パターン形成体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002268999A JP4324355B2 (ja) | 2002-09-13 | 2002-09-13 | パターン形成体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004111480A JP2004111480A (ja) | 2004-04-08 |
| JP2004111480A5 true JP2004111480A5 (https=) | 2005-10-20 |
| JP4324355B2 JP4324355B2 (ja) | 2009-09-02 |
Family
ID=32267061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002268999A Expired - Fee Related JP4324355B2 (ja) | 2002-09-13 | 2002-09-13 | パターン形成体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4324355B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5254589B2 (ja) * | 2006-10-17 | 2013-08-07 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US8937013B2 (en) | 2006-10-17 | 2015-01-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor |
-
2002
- 2002-09-13 JP JP2002268999A patent/JP4324355B2/ja not_active Expired - Fee Related
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