JP3816615B2 - 基板検査装置 - Google Patents
基板検査装置 Download PDFInfo
- Publication number
- JP3816615B2 JP3816615B2 JP1530897A JP1530897A JP3816615B2 JP 3816615 B2 JP3816615 B2 JP 3816615B2 JP 1530897 A JP1530897 A JP 1530897A JP 1530897 A JP1530897 A JP 1530897A JP 3816615 B2 JP3816615 B2 JP 3816615B2
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- Prior art keywords
- substrate
- focusing
- image
- signal
- vibration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000007689 inspection Methods 0.000 title claims description 27
- 239000000758 substrate Substances 0.000 claims abstract description 131
- 230000007246 mechanism Effects 0.000 claims abstract description 16
- 238000003384 imaging method Methods 0.000 claims description 23
- 230000003068 static effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 67
- 230000003287 optical effect Effects 0.000 abstract description 16
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000010586 diagram Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Automatic Focus Adjustment (AREA)
- Liquid Crystal (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1530897A JP3816615B2 (ja) | 1997-01-29 | 1997-01-29 | 基板検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1530897A JP3816615B2 (ja) | 1997-01-29 | 1997-01-29 | 基板検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10213522A JPH10213522A (ja) | 1998-08-11 |
| JPH10213522A5 JPH10213522A5 (enExample) | 2004-12-24 |
| JP3816615B2 true JP3816615B2 (ja) | 2006-08-30 |
Family
ID=11885174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1530897A Expired - Fee Related JP3816615B2 (ja) | 1997-01-29 | 1997-01-29 | 基板検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3816615B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4586272B2 (ja) * | 2001-01-12 | 2010-11-24 | ソニー株式会社 | 基板検査装置と基板検査方法、及び液晶表示装置の製造方法 |
| JP2007225431A (ja) * | 2006-02-23 | 2007-09-06 | Mitsubishi Electric Corp | 外観検査装置 |
| JP2008197612A (ja) * | 2007-01-17 | 2008-08-28 | Fuji Electric Holdings Co Ltd | 画像表示装置および画像表示プログラム |
| JP5038191B2 (ja) * | 2008-03-04 | 2012-10-03 | 有限会社共同設計企画 | 電子部品検査方法およびそれに用いられる装置 |
| JP2010025699A (ja) * | 2008-07-17 | 2010-02-04 | Shibaura Mechatronics Corp | 基板の位置認識装置及び撮像認識方法 |
| JP6333403B2 (ja) * | 2014-11-04 | 2018-05-30 | 三菱電機株式会社 | ロープ径計測システム、ロープ径計測装置、ロープ径計測方法およびプログラム |
-
1997
- 1997-01-29 JP JP1530897A patent/JP3816615B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10213522A (ja) | 1998-08-11 |
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