JP3812051B2 - 反射屈折投影光学系 - Google Patents
反射屈折投影光学系 Download PDFInfo
- Publication number
- JP3812051B2 JP3812051B2 JP12792697A JP12792697A JP3812051B2 JP 3812051 B2 JP3812051 B2 JP 3812051B2 JP 12792697 A JP12792697 A JP 12792697A JP 12792697 A JP12792697 A JP 12792697A JP 3812051 B2 JP3812051 B2 JP 3812051B2
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- projection optical
- beam splitter
- catadioptric projection
- catadioptric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12792697A JP3812051B2 (ja) | 1997-04-30 | 1997-04-30 | 反射屈折投影光学系 |
| US09/070,536 US6208473B1 (en) | 1997-04-30 | 1998-04-30 | Catadioptric projection lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12792697A JP3812051B2 (ja) | 1997-04-30 | 1997-04-30 | 反射屈折投影光学系 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10308344A JPH10308344A (ja) | 1998-11-17 |
| JPH10308344A5 JPH10308344A5 (enExample) | 2005-03-17 |
| JP3812051B2 true JP3812051B2 (ja) | 2006-08-23 |
Family
ID=14972058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12792697A Expired - Fee Related JP3812051B2 (ja) | 1997-04-30 | 1997-04-30 | 反射屈折投影光学系 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6208473B1 (enExample) |
| JP (1) | JP3812051B2 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| KR100783669B1 (ko) * | 2000-04-25 | 2007-12-07 | 에이에스엠엘 유에스, 인크. | 바이어스에 의해 유도된 레티클 회절을 제거한 광학 축소시스템 |
| DE10104177A1 (de) * | 2001-01-24 | 2002-08-01 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| US7136220B2 (en) * | 2001-08-21 | 2006-11-14 | Carl Zeiss Smt Ag | Catadioptric reduction lens |
| JP2005504337A (ja) * | 2001-09-20 | 2005-02-10 | カール・ツァイス・エスエムティー・アーゲー | 反射屈折縮小レンズ |
| GB2402230B (en) * | 2003-05-30 | 2006-05-03 | Xsil Technology Ltd | Focusing an optical beam to two foci |
| JP2007271724A (ja) * | 2006-03-30 | 2007-10-18 | Fujinon Corp | オートフォーカスアダプタ |
| US8064148B2 (en) | 2008-04-15 | 2011-11-22 | Asml Holding N.V. | High numerical aperture catadioptric objectives without obscuration and applications thereof |
| US12298240B2 (en) * | 2020-07-02 | 2025-05-13 | Konica Minolta, Inc. | Optical system for measuring optical characteristics and device for measuring optical characteristics |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3917399A (en) * | 1974-10-02 | 1975-11-04 | Tropel | Catadioptric projection printer |
| US5241423A (en) | 1990-07-11 | 1993-08-31 | International Business Machines Corporation | High resolution reduction catadioptric relay lens |
| US5591958A (en) * | 1993-06-14 | 1997-01-07 | Nikon Corporation | Scanning exposure method and apparatus |
| JP3635684B2 (ja) * | 1994-08-23 | 2005-04-06 | 株式会社ニコン | 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置 |
| JP3747951B2 (ja) * | 1994-11-07 | 2006-02-22 | 株式会社ニコン | 反射屈折光学系 |
| JP3395801B2 (ja) * | 1994-04-28 | 2003-04-14 | 株式会社ニコン | 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法 |
| DE4417489A1 (de) | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
| DE19616922A1 (de) * | 1996-04-27 | 1997-10-30 | Zeiss Carl Fa | Hochauflösendes lichtstarkes Objektiv |
| US5969882A (en) * | 1997-04-01 | 1999-10-19 | Nikon Corporation | Catadioptric optical system |
-
1997
- 1997-04-30 JP JP12792697A patent/JP3812051B2/ja not_active Expired - Fee Related
-
1998
- 1998-04-30 US US09/070,536 patent/US6208473B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6208473B1 (en) | 2001-03-27 |
| JPH10308344A (ja) | 1998-11-17 |
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