JP3791718B2 - 遠紫外線露光用ポジ型フォトレジスト組成物 - Google Patents

遠紫外線露光用ポジ型フォトレジスト組成物 Download PDF

Info

Publication number
JP3791718B2
JP3791718B2 JP08285497A JP8285497A JP3791718B2 JP 3791718 B2 JP3791718 B2 JP 3791718B2 JP 08285497 A JP08285497 A JP 08285497A JP 8285497 A JP8285497 A JP 8285497A JP 3791718 B2 JP3791718 B2 JP 3791718B2
Authority
JP
Japan
Prior art keywords
group
alkyl group
general formula
monomer
positive photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP08285497A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10326013A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
JPH10326013A (ja
Inventor
健一郎 佐藤
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP08285497A priority Critical patent/JP3791718B2/ja
Priority to KR10-1998-0010768A priority patent/KR100479275B1/ko
Priority to US09/048,787 priority patent/US6242153B1/en
Publication of JPH10326013A publication Critical patent/JPH10326013A/ja
Publication of JPH10326013A5 publication Critical patent/JPH10326013A5/ja
Application granted granted Critical
Publication of JP3791718B2 publication Critical patent/JP3791718B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Materials For Photolithography (AREA)
JP08285497A 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Fee Related JP3791718B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP08285497A JP3791718B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物
KR10-1998-0010768A KR100479275B1 (ko) 1997-03-27 1998-03-27 원자외선노광용포지티브포토레지스트조성물
US09/048,787 US6242153B1 (en) 1997-03-27 1998-03-27 Positive photoresist composition for far ultraviolet ray exposure

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7564397 1997-03-27
JP9-75643 1997-03-27
JP08285497A JP3791718B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JPH10326013A JPH10326013A (ja) 1998-12-08
JPH10326013A5 JPH10326013A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2004-10-07
JP3791718B2 true JP3791718B2 (ja) 2006-06-28

Family

ID=26416791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08285497A Expired - Fee Related JP3791718B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3791718B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4667273B2 (ja) * 2005-03-04 2011-04-06 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
TWI471699B (zh) * 2005-03-04 2015-02-01 Fujifilm Corp 正型光阻組成物及使用它之圖案形成方法
JP5598351B2 (ja) * 2010-02-16 2014-10-01 信越化学工業株式会社 電子線用又はeuv用化学増幅ポジ型レジスト組成物及びパターン形成方法

Also Published As

Publication number Publication date
JPH10326013A (ja) 1998-12-08

Similar Documents

Publication Publication Date Title
KR100797488B1 (ko) 포지티브 감광성 조성물
JP3847454B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物及びパターン形成方法
KR100479275B1 (ko) 원자외선노광용포지티브포토레지스트조성물
KR100522487B1 (ko) 포지티브형 포토레지스트 조성물
US6103449A (en) Negative working photoresist composition
JP3865890B2 (ja) ポジ型感光性組成物
JP3832780B2 (ja) ポジ型フォトレジスト組成物
JP3844322B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3865863B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JPH11109630A (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3645365B2 (ja) 遠紫外線露光用感光性樹脂組成物
JP3912761B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3791718B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JPH1130864A (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3835786B2 (ja) ポジ型レジスト液
KR20000076995A (ko) 원자외선 노광용 포지티브 포토레지스트 조성물
JP3890357B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3791715B2 (ja) ポジ型フォトレジスト組成物
JP3976108B2 (ja) パターン形成方法
JPH10207067A (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3797506B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3862247B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP3841378B2 (ja) ポジ型レジスト組成物
JP3813749B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JPH11184090A (ja) 遠紫外線露光用ポジ型フォトレジスト組成物

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050810

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050817

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051014

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060118

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060223

TRDD Decision of grant or rejection written
RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20060324

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060329

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060330

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090414

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090414

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090414

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100414

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110414

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees