JPH10326013A5 - - Google Patents

Info

Publication number
JPH10326013A5
JPH10326013A5 JP1997082854A JP8285497A JPH10326013A5 JP H10326013 A5 JPH10326013 A5 JP H10326013A5 JP 1997082854 A JP1997082854 A JP 1997082854A JP 8285497 A JP8285497 A JP 8285497A JP H10326013 A5 JPH10326013 A5 JP H10326013A5
Authority
JP
Japan
Prior art keywords
group
alkyl group
positive photoresist
deep ultraviolet
photoresist composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997082854A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10326013A (ja
JP3791718B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP08285497A priority Critical patent/JP3791718B2/ja
Priority claimed from JP08285497A external-priority patent/JP3791718B2/ja
Priority to KR10-1998-0010768A priority patent/KR100479275B1/ko
Priority to US09/048,787 priority patent/US6242153B1/en
Publication of JPH10326013A publication Critical patent/JPH10326013A/ja
Publication of JPH10326013A5 publication Critical patent/JPH10326013A5/ja
Application granted granted Critical
Publication of JP3791718B2 publication Critical patent/JP3791718B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP08285497A 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Fee Related JP3791718B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP08285497A JP3791718B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物
KR10-1998-0010768A KR100479275B1 (ko) 1997-03-27 1998-03-27 원자외선노광용포지티브포토레지스트조성물
US09/048,787 US6242153B1 (en) 1997-03-27 1998-03-27 Positive photoresist composition for far ultraviolet ray exposure

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7564397 1997-03-27
JP9-75643 1997-03-27
JP08285497A JP3791718B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JPH10326013A JPH10326013A (ja) 1998-12-08
JPH10326013A5 true JPH10326013A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2004-10-07
JP3791718B2 JP3791718B2 (ja) 2006-06-28

Family

ID=26416791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08285497A Expired - Fee Related JP3791718B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3791718B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4667273B2 (ja) * 2005-03-04 2011-04-06 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
TWI471699B (zh) * 2005-03-04 2015-02-01 Fujifilm Corp 正型光阻組成物及使用它之圖案形成方法
JP5598351B2 (ja) * 2010-02-16 2014-10-01 信越化学工業株式会社 電子線用又はｅｕｖ用化学増幅ポジ型レジスト組成物及びパターン形成方法

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